Method of forming a metal oxide nanostructured thin film

US12416614B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12416614-B2
Application numberUS-202519207191-A
CountryUS
Kind codeB2
Filing dateMay 13, 2025
Priority dateJan 5, 2018
Publication dateSep 16, 2025
Grant dateSep 16, 2025

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A hydrogen gas sensor with a substrate and a zinc oxide nanostructured thin film deposited on the substrate, wherein the zinc oxide nanostructured thin film has a lattice structure with a weight ratio of low binding energy O 2− ions to medium binding energy oxygen vacancies in a range of 0.1 to 1.0, and a method of fabricating a gas sensor by thermally oxidizing a metal thin film under low oxygen partial pressure. Various combinations of embodiments of the hydrogen gas sensor and the method of fabricating the gas sensor are provided.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method of forming a metal oxide nanostructured thin film, comprising: depositing a metal thin film on a substrate; and thermally oxidizing and annealing the metal thin film at a temperature of 200 to 1,000° C. in a tube furnace in a flow of a gaseous mixture consisting of H 2 , H 2 O and O 2 having an oxygen partial pressure in a range of 10-60 to 10-1 atm to form the metal oxide nanostructured thin film on the substrate, thereby fabricating the metal oxide nanostructured thin film; wherein the metal is Zn and the metal oxide nanostructured thin film is a zinc oxide nanostructured thin film; and wherein the zinc oxide nanostructured thin film is porous having first pores with an average pore size of 1 to 20 nm and second pores with an average pore size of 4 to 12 Å. 2. The method of claim 1 , wherein the zinc oxide nanostructured thin film has a thickness in a range of 10 to 1,000 nm. 3. The method of claim 1 , wherein the substrate is a glass substrate or a silicon wafer substrate. 4. The method of claim 1 , wherein the zinc oxide nanostructured thin film has a lattice structure with a weight ratio of low binding energy O 2− ions to medium binding energy oxygen vacancies in a range of 0.1 to 1.0. 5. The method of claim 1 , wherein the metal oxide nanostructured thin film is a hydrogen gas sensor. 6. The method of claim 5 , wherein a temperature of the gaseous mixture is in a range of 10 to 100° C. before the thermally oxidizing. 7. The method of claim 5 , wherein a temperature of the gaseous mixture is in a range of 80 to 100° C. before the thermally oxidizing, and wherein the zinc oxide nanostructured thin film has a sheet-like morphology. 8. The method of claim 1 , wherein a ratio of a partial pressure of hydrogen gas to a partial pressure of water vapor in the gaseous mixture is in a range of 1:100 to 1:2000, and wherein the gaseous mixture has an oxygen partial pressure in a range of 10 −20 to 10 −15 atm. 9. The method of claim 1 , wherein the metal thin film is thermally oxidized in the flow of the gaseous mixture for 2 to 6 hours.

Assignees

Inventors

Classifications

  • G01N27/127Primary

    comprising nanoparticles · CPC title

  • Composition or fabrication of the electrodes and coatings thereon, e.g. catalysts · CPC title

  • using oxygen-containing compounds, e.g. water, carbon dioxide · CPC title

  • G01N33/005Primary

    H2 · CPC title

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What does patent US12416614B2 cover?
A hydrogen gas sensor with a substrate and a zinc oxide nanostructured thin film deposited on the substrate, wherein the zinc oxide nanostructured thin film has a lattice structure with a weight ratio of low binding energy O 2− ions to medium binding energy oxygen vacancies in a range of 0.1 to 1.0, and a method of fabricating a gas sensor by thermally oxidizing a metal thin film under low oxy…
Who is the assignee on this patent?
Univ King Fahd Pet & Minerals
What technology area does this patent fall under?
Primary CPC classification G01N27/127. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Sep 16 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).