Methods and devices for growing oxide crystals in oxygen atmosphere

US12416096B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12416096-B2
Application numberUS-202318494746-A
CountryUS
Kind codeB2
Filing dateOct 25, 2023
Priority dateAug 21, 2019
Publication dateSep 16, 2025
Grant dateSep 16, 2025

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present disclosure discloses a method for growing a crystal in oxygen atmosphere. The method may include compensating a weight of a reactant, introducing a flowing gas, improving a volume ratio of oxygen during a cooling process, providing a heater in a temperature field, and optimizing parameters. According to the method, problems may be solved, for example, cracking and component deviation of the crystal during a crystal growth process, and without oxygen-free vacancy. The method for growing the crystal may have excellent repeatability and crystal performance consistency.

First claim

Opening claim text (preview).

What is claimed is: 1. A crystal, a formula of the crystal being (A 1-b B b ) 3 (P 1-q Q q ) 5 O 12 , wherein: A consists of at least one of Gd, Lu, La, Yb, Sc, or Y; B consists of at least one of Na, K, V, Mn, Fe, Co, Ni, Ti, Ge, Zr, or Hf; P consists of at least one of Al, Ga, In, or Sc; Q consists of Al; b=0.2˜0.9; and q=0˜1. 2. The crystal of claim 1 , wherein b=0.3˜0.8. 3. The crystal of claim 1 , wherein b=0.4˜0.7. 4. The crystal of claim 1 , wherein b=0.5˜0.6. 5. The crystal of claim 1 , wherein b=0.52˜0.58. 6. The crystal of claim 1 , wherein b=0.54˜0.56. 7. The crystal of claim 1 , wherein q=0.2˜0.9. 8. The crystal of claim 1 , wherein q=0.3˜0.8. 9. The crystal of claim 1 , wherein q=0.4˜0.7. 10. The crystal of claim 1 , wherein q=0.5˜0.6. 11. The crystal of claim 1 , wherein q=0.52˜0.58. 12. The crystal of claim 1 , wherein q=0.54˜0.56. 13. A method for growing a crystal, wherein: a formula of the crystal is (A 1-b B b ) 3 (P 1-q Q q ) 5 O 12 , wherein: A consists of at least one of Gd, Lu, La, Yb, Sc, or Y; B consists of at least one of Na, K, Zn, V, Mn, Fe, Co, Ni, Ti, Ge, Zr, or Hf; P consists of at least one of Al, Ga, In, or Sc; Q consists of Al; b=0.2˜0.9; and q=0˜1; and the method comprises: weighing reactants based on a molar ratio of the reactants according to a reaction equation for generating the crystal; placing the reactants into a crystal growth device; introducing a flowing gas into the crystal growth device after sealing the crystal growth device; and operating the crystal growth device to execute a crystal growth operation based on Czochralski technique. 14. The method of claim 13 , wherein P consists of Ga, and a weight range of a reactant containing Ga is 0.01%˜10% in excess of a theoretical weight value of the reactant consisting of Ga calculated according to the reaction equation.

Assignees

Inventors

Classifications

  • Compounds of rare earth metals · CPC title

  • adding crystallising materials or reactants forming it in situ to the melt · CPC title

  • C01B33/20Primary

    Silicates (persilicates C01B15/14 {; containing aluminium C01B33/26}) · CPC title

  • containing elements as dopants · CPC title

  • Compounds containing silicon, fluorine, and other elements · CPC title

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What does patent US12416096B2 cover?
The present disclosure discloses a method for growing a crystal in oxygen atmosphere. The method may include compensating a weight of a reactant, introducing a flowing gas, improving a volume ratio of oxygen during a cooling process, providing a heater in a temperature field, and optimizing parameters. According to the method, problems may be solved, for example, cracking and component deviatio…
Who is the assignee on this patent?
Meishan Boya Advanced Mat Co Ltd
What technology area does this patent fall under?
Primary CPC classification C01B33/20. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Sep 16 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).