Pressure sensor chip, pressure transmitter, and method for manufacturing pressure sensor chip
US-2018275001-A1 · Sep 27, 2018 · US
Strain gauge
US12411000B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12411000-B2 |
| Application number | US-202117907567-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 26, 2021 |
| Priority date | Mar 30, 2020 |
| Publication date | Sep 9, 2025 |
| Grant date | Sep 9, 2025 |
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- Title
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- Abstract
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Abstract
Official abstract text for this publication.
A strain gauge includes a flexible resin substrate and a resistor formed of a film that includes Cr, CrN, and Cr2N, the resistor being situated on or above the substrate. A film thickness of the resistor is greater than or equal to 100 nm and less than or equal to 700 nm.
First claim
Opening claim text (preview).
The invention claimed is: 1. A strain gauge comprising: a flexible resin substrate; and a resistor formed of a film that includes a composite film of Cr, CrN, and Cr 2 N, the resistor being situated on or above the substrate, wherein a film thickness of the resistor is greater than or equal to 100 nm and less than or equal to 700 nm, and each of a creep amount and a creep recovery amount of a weighing instrument including the strain gauge is within ±0.0735% when measured with the weighing instrument according to International Organization of Legal Metrology (OIML) R60. 2. The strain gauge according to claim 1 , wherein the film thickness of the resistor is greater than or equal to 150 nm and less than or equal to 500 nm. 3. The strain gauge according to claim 2 , wherein the film thickness of the resistor is greater than or equal to 250 nm and less than or equal to 400 nm. 4. The strain gauge according to claim 1 , wherein a film thickness of the substrate is greater than or equal to 10 μm and less than or equal to 130 μm. 5. The strain gauge according to claim 4 , wherein the film thickness of the substrate is greater than or equal to 10 μm and less than or equal to 100 μm. 6. The strain gauge according to claim 5 , wherein the film thickness of the substrate is greater than or equal to 30 μm and less than or equal to 70 μm. 7. The strain gauge according to claim 1 , wherein a material of the substrate is polyimide. 8. The strain gauge according to claim 1 , wherein a gauge factor is 10 or more. 9. The strain gauge according to claim 1 , wherein CrN and Cr 2 N included in the resistor are at 20% by weight or less. 10. The strain gauge according to claim 1 , wherein a percentage of Cr 2 N in the CrN and Cr 2 N is greater than or equal to 80% by weight and less than 90% by weight.
Assignees
Inventors
Classifications
of the semi-conductor type · CPC title
Measuring circuits therefor · CPC title
constructional details of the strain gauges (adjustable resistors H01C10/00) · CPC title
- G01B7/20Primary
formed by printed-circuit technique · CPC title
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- What does patent US12411000B2 cover?
- A strain gauge includes a flexible resin substrate and a resistor formed of a film that includes Cr, CrN, and Cr2N, the resistor being situated on or above the substrate. A film thickness of the resistor is greater than or equal to 100 nm and less than or equal to 700 nm.
- Who is the assignee on this patent?
- Minebea Mitsumi Inc
- What technology area does this patent fall under?
- Primary CPC classification G01B7/20. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Sep 09 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).