Dilute chemical solution production device

US12403433B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12403433-B2
Application numberUS-202017436653-A
CountryUS
Kind codeB2
Filing dateFeb 18, 2020
Priority dateMar 28, 2019
Publication dateSep 2, 2025
Grant dateSep 2, 2025

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Dilute chemical solution production device ( 1 ) has a plunger pump and a chemical solution supply pipe ( 3 ) that supply a chemical solution S from a chemical solution reservoir. The end of the chemical solution supply pipe ( 3 ) serves as an injection point 11 for the chemical solution (S). The chemical solution supply pipe ( 3 ) is inserted to an approximately central position in the radial direction of an ultrapure water passage ( 12 ), which is a first pipe, via a bore-through joint ( 13 ). Conductivity meter ( 14 ) as a conductivity measuring meter is provided on the downstream side of the bore-through joint ( 13 ), which serves as the injection point ( 11 ), and is connected to a controller so that the plunger pump ( 4 ) can be controlled in accordance with the measured value of the conductivity meter ( 14 ).

First claim

Opening claim text (preview).

The invention claimed is: 1. A dilute chemical solution production device that produces a dilute chemical solution of a second liquid by adding the second liquid to a first liquid, the dilute chemical solution production device comprising: a first pipe that flows the first liquid; an undiluted solution tank that stores the second liquid; a second pipe that connects the undiluted solution tank and the first pipe; a pump that adds the second liquid into the first pipe through the second pipe; a conductivity measuring meter provided on a downstream side of a connection site between the first pipe and the second pipe with respect to a flow direction of the first liquid; and a controller that controls the pump based on a measured value of the conductivity measuring meter, wherein the first pipe is provided with a first bent portion and a second bent portion, the first bent portion is disposed in a vicinity of the connection site with the second pipe, and the second bent portion is disposed between the first bent portion and the conductivity meter, and a distance between the first bent portion and the second bent portion is 20 to 50 cm. 2. The dilute chemical solution production device according to claim 1 , wherein a tip of the second pipe is connected in a state of being inserted to an approximately central position with respect to an inner diameter of the first pipe. 3. The dilute chemical solution production device according to claim 2 , wherein a distance between the connection site of the second pipe in the first pipe and the conductivity measuring meter is 30 to 70 cm. 4. The dilute chemical solution production device according to claim 2 , wherein the first liquid is ultrapure water and the second liquid contains ammonia. 5. The dilute chemical solution production device according to claim 1 , wherein a distance between the connection site of the second pipe in the first pipe and the conductivity measuring meter is 30 to 70 cm. 6. The dilute chemical solution production device according to claim 5 , wherein the first liquid is ultrapure water and the second liquid contains ammonia. 7. The dilute chemical solution production device according to claim 1 , wherein the first liquid is ultrapure water and the second liquid contains ammonia.

Assignees

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Classifications

  • using mainly spraying means, e.g. nozzles · CPC title

  • Grinding, lapping or polishing of wafers, substrates or parts of devices · CPC title

  • Electronic devices, e.g. PCBs or semiconductors · CPC title

  • Water-soluble compounds · CPC title

  • Electrical conductivity or dielectric constant of the mixture · CPC title

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What does patent US12403433B2 cover?
Dilute chemical solution production device ( 1 ) has a plunger pump and a chemical solution supply pipe ( 3 ) that supply a chemical solution S from a chemical solution reservoir. The end of the chemical solution supply pipe ( 3 ) serves as an injection point 11 for the chemical solution (S). The chemical solution supply pipe ( 3 ) is inserted to an approximately central position in the radia…
Who is the assignee on this patent?
Kurita Water Ind Ltd
What technology area does this patent fall under?
Primary CPC classification B01F35/2202. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Sep 02 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 6 related publications on this page (citations in our corpus or others sharing the same primary CPC).