Matched tcr joule heater designs for electrostatic chucks

US12387964B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12387964-B2
Application numberUS-202016921661-A
CountryUS
Kind codeB2
Filing dateJul 6, 2020
Priority dateNov 23, 2015
Publication dateAug 12, 2025
Grant dateAug 12, 2025

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method of forming a substrate support in a substrate processing system includes forming at least one ceramic layer and arranging a plurality of thermal elements adjacent to the ceramic layer in one or more thermal zones. Each of the thermal zones includes at least one of the thermal elements and each of the thermal elements includes a first resistive material having a positive thermal coefficient of resistance (TCR) and a second resistive material having a negative TCR. The second resistive material is electrically connected to the first resistive material. At least one of the first resistive material and the second resistive material of each of the thermal elements is electrically connected to a power supply to receive power and each of the thermal elements heats a respective one of the thermal zones based on the received power.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of forming a substrate support in a substrate processing system, the method comprising: forming a first ceramic layer of green sheets; forming a bus layer on the first ceramic layer, and forming first vias in the first ceramic layer to connect the bus layer to power supply and power return lines; arranging a plurality of thermal elements on the first ceramic layer in one or more thermal zones, wherein each of the one or more thermal zones includes at least one of the plurality of thermal elements, wherein each of the plurality of thermal elements includes a first resistive material having a positive thermal coefficient of resistance (TCR), and a second resistive material having a negative TCR, wherein the second resistive material is electrically connected to the first resistive material, and a dielectric layer is formed between the first resistive material and the second resistive material; and forming a second ceramic layer of green sheets on the plurality of thermal elements, wherein a plurality of second vias are formed through the second resistive material and the dielectric layer to connect the bus layer to the first resistive material, wherein at least one of the first resistive material and the second resistive material of each of the plurality of thermal elements is electrically connected to a power supply via an independent pair of the power supply and power return lines, to selectively receive power from the power supply independent of other ones of the plurality of thermal elements, wherein, for each of the plurality of thermal elements, a corresponding one of multiple diodes is serially connected between the power supply line corresponding to the thermal element and the at least one of the first resistive material and the second resistive material, and wherein each of the plurality of thermal elements heats a respective one of the one or more thermal zones based on the received power. 2. The method of claim 1 , wherein forming a heating layer including the plurality of thermal elements includes depositing a metallized layer on a surface of the first ceramic layer. 3. The method of claim 1 , wherein respective absolute values of the positive TCR and the negative TCR are equal. 4. The method claim 1 , wherein a sum of the positive TCR and the negative TCR is zero. 5. The method of claim 1 , further comprising connecting the first resistive material and the second resistive material in series. 6. The method of claim 1 , further comprising connecting the first resistive material and the second resistive material in parallel. 7. The method of claim 1 , further comprising arranging the first resistive material above the second resistive material. 8. The method of claim 7 , further comprising arranging the first resistive material directly above the second resistive material. 9. The method of claim 7 , further comprising laterally offsetting the first resistive material from the second resistive material. 10. The method claim 1 , further comprising arranging the first resistive material to be coplanar with the second resistive material. 11. The method of claim 10 , further comprising interweaving the first resistive material and the second resistive material. 12. The method of claim 11 , wherein the first resistive material and the second resistive material are interwoven to form at least one of an “S”-shape, a spiral shape, and a “U”-shape. 13. The method of claim 11 , wherein the first resistive material and the second resistive material include alternately interlocking fingers.

Assignees

Inventors

Classifications

  • mainly by conduction · CPC title

  • H10P72/72Primary

    using electrostatic chucks · CPC title

  • H10P72/722Primary

    Details of electrostatic chucks · CPC title

  • characterised by the mechanical construction of the susceptor, stage or support · CPC title

  • Heaters using heating elements having a positive temperature coefficient · CPC title

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What does patent US12387964B2 cover?
A method of forming a substrate support in a substrate processing system includes forming at least one ceramic layer and arranging a plurality of thermal elements adjacent to the ceramic layer in one or more thermal zones. Each of the thermal zones includes at least one of the thermal elements and each of the thermal elements includes a first resistive material having a positive thermal coeffic…
Who is the assignee on this patent?
Lam Res Corp
What technology area does this patent fall under?
Primary CPC classification H10P72/0432. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Aug 12 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).