Mask, mask assembly, and apparatus for manufacturing display apparatus
US-2022384769-A1 · Dec 1, 2022 · US
Mask, mask assembly, and apparatus for manufacturing display apparatus
US12378655B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12378655-B2 |
| Application number | US-202418407349-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 8, 2024 |
| Priority date | May 25, 2021 |
| Publication date | Aug 5, 2025 |
| Grant date | Aug 5, 2025 |
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- Title
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- Abstract
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Abstract
Official abstract text for this publication.
A mask including: a deposition pattern portion including a plurality of deposition holes that are configured to have deposition material pass therethrough; and a dummy pattern portion outside the deposition pattern portion, wherein the dummy pattern portion includes an auxetic structure having a negative Poisson's ratio.
First claim
Opening claim text (preview).
What is claimed is: 1. A mask assembly comprising: a mask frame including an opening; and a mask on the mask frame and including a plurality of deposition pattern portions arranged along a first direction and a dummy pattern portion, wherein a deposition pattern portion from among the plurality of deposition pattern portions overlaps the opening, and the dummy pattern portion is outside the deposition pattern portion, wherein the dummy pattern portion includes an auxetic structure having a negative Poisson's ratio, and is arranged between two adjacent deposition pattern portions from among the plurality of deposition pattern portions, wherein the dummy pattern portion includes a plurality of dummy holes, wherein the deposition pattern portions include a first deposition hole and a second deposition hole having different planar shapes from each other, and the second deposition hole is adjacent to one of the plurality of dummy holes of the dummy pattern portion in the first direction, and wherein the second deposition hole has a shape corresponding to a shape of one of the plurality of dummy holes such that a width between the second deposition hole and the one of the plurality of dummy holes is constant in a plan view. 2. The mask assembly of claim 1 , wherein the plurality of dummy holes have shapes different from those of the first deposition hole and the second deposition hole in a plan view. 3. The mask assembly of claim 1 , wherein the dummy pattern portion entirely surrounds the deposition pattern portion in a plan view. 4. The mask assembly of claim 1 , wherein the dummy pattern portion partially surrounds the deposition pattern portion in a plan view.
Assignees
Inventors
Classifications
Manufacture or treatment specially adapted for the organic devices covered by this subclass · CPC title
Dummy elements, i.e. elements having non-functional features · CPC title
Masking devices (stencils B05C17/06; masking devices for which the means for applying liquids or other fluent material is spraying or is not important B05B12/20) · CPC title
using selective deposition, e.g. using a mask · CPC title
- C23C14/042Primary
using masks · CPC title
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Frequently asked questions
Answers are generated from the same data shown on this page.
- What does patent US12378655B2 cover?
- A mask including: a deposition pattern portion including a plurality of deposition holes that are configured to have deposition material pass therethrough; and a dummy pattern portion outside the deposition pattern portion, wherein the dummy pattern portion includes an auxetic structure having a negative Poisson's ratio.
- Who is the assignee on this patent?
- Samsung Display Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification C23C14/042. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Aug 05 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 6 related publications on this page (citations in our corpus or others sharing the same primary CPC).