Mask for deposition, apparatus for manufacturing display apparatus having the same, and method of manufacturing display apparatus with manufacturing display apparatus having mask for deposition

US10083997B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10083997-B2
Application numberUS-201715406869-A
CountryUS
Kind codeB2
Filing dateJan 16, 2017
Priority dateFeb 29, 2016
Publication dateSep 25, 2018
Grant dateSep 25, 2018

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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A deposition mask includes a deposition pattern through which a deposition material passes and a distal end extended in a length direction of the deposition mask from the deposition pattern. The distal end includes a dummy pattern between a clamping groove and the deposition pattern in the length direction. The clamping groove and the dummy pattern are provided in plural along a second direction crossing the length direction. In the length direction of the deposition mask, the number of clamping grooves and dummy patterns correspond to each other, the clamping grooves respectively overlap a corresponding dummy pattern, a distal end area at which clamping grooves overlap the corresponding dummy pattern defines a second area of the distal end, and a distal end area at which the clamping grooves do not overlap the corresponding dummy pattern defines a first area of the distal end to which a clamp is applied.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of manufacturing a display apparatus having a pattern on a substrate, the method comprising: inserting the substrate and a deposition mask assembly into an inside of a deposition chamber; aligning the substrate and the deposition mask frame assembly with each other; and depositing on the substrate a deposition material for forming the pattern, by ejecting the deposition material from a deposition source and passing the ejected deposition material through the deposition mask frame assembly to the substrate, wherein the deposition mask frame assembly comprises: a frame comprising an opening at a center portion thereof; a deposition mask which is installed on the frame to face the substrate, a length of the deposition mask extended in a first direction; and a support of which a length thereof extends in a second direction crossing the first direction and across the opening of the frame, the support overlapping a portion of the deposition mask and supporting the deposition mask which is installed on the frame, wherein the deposition mask is extendable along the first direction thereof by a force applied thereto by a clamp attached to the deposition mask, the deposition mask comprising: a deposition pattern unit comprising a plurality of deposition pattern holes, through which the ejected deposition material passes to the substrate; and a distal end to which the clamp is attached, the distal end extended in the first direction of the deposition mask from the deposition pattern unit to a distal edge of the deposition mask, the distal end comprising: a clamping groove open at the distal edge of the deposition mask; and a dummy pattern unit disposed between the clamping groove and the deposition pattern unit in the first direction of the deposition mask, and wherein the clamping groove and the dummy pattern unit are provided in plural along the second direction; and in the first direction of the deposition mask,  a portion of each clamping groove overlaps a corresponding dummy pattern unit,  in the second direction of the deposition mask, the number of the clamping grooves and the number of the dummy pattern units correspond to each other,  an area of the distal end at which the portion of the distal end does not overlap the corresponding dummy pattern unit defines a first area of the distal end to which a clamp is applied, and  an area of the distal end at which the portion of each clamping groove overlaps the corresponding dummy pattern unit defines a second area of the distal end. 2. The method of claim 1 , wherein the dummy pattern unit comprises a plurality of dummy pattern holes, and a shape of one of the plurality of dummy pattern holes corresponds to a shape of one of the plurality of the deposition pattern holes. 3. The method of claim 1 , wherein the dummy pattern unit comprises a plurality of dummy pattern holes, and a shape of one of the plurality of dummy pattern holes is different from a shape of one of the plurality of the deposition pattern holes. 4. The method of claim 1 , wherein in the length direction of the deposition mask, the dummy pattern unit comprises a first dummy pattern unit and a second dummy pattern unit spaced apart from each other, each of the first and second dummy pattern units comprising a plurality of dummy pattern holes. 5. The method of claim 1 , wherein the deposition mask frame assembly further comprises a welding portion which couples the frame and the deposition mask to each other, and the welding portion is disposed at the distal end of the deposition mask. 6. The method of claim 5 , wherein in the first direction of the deposition mask, the welding portion is disposed between the pattern unit and the dummy pattern unit.

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What does patent US10083997B2 cover?
A deposition mask includes a deposition pattern through which a deposition material passes and a distal end extended in a length direction of the deposition mask from the deposition pattern. The distal end includes a dummy pattern between a clamping groove and the deposition pattern in the length direction. The clamping groove and the dummy pattern are provided in plural along a second directio…
Who is the assignee on this patent?
Samsung Display Co Ltd
What technology area does this patent fall under?
Primary CPC classification H01L27/1288. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Sep 25 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).