Abrasive elements with precisely shaped features, abrasive articles fabricated therefrom and methods of making thereof

US12370649B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12370649-B2
Application numberUS-202017430774-A
CountryUS
Kind codeB2
Filing dateFeb 11, 2020
Priority dateFeb 13, 2019
Publication dateJul 29, 2025
Grant dateJul 29, 2025

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

An abrasive article includes a plurality of abrasive features disposed on one or more abrasive elements. Each of the one or more abrasive elements includes a base having a first major surface from which the plurality of abrasive features extends. A first set of the plurality of abrasive features (i) has an average height, H 1avg , (ii) a standard deviation of less than 10% of H 1avg , and (iii) comprises between 5 and 130 abrasive features.

First claim

Opening claim text (preview).

What is claimed is: 1. An abrasive article comprising: a plurality of abrasive features disposed on one or more abrasive elements, each of the one or more abrasive elements comprising a base having a first major surface from which the plurality of abrasive features extend; wherein a first set of the plurality of abrasive features (i) has an average height, H 1avg , (ii) has a standard deviation of less than 10% of H 1avg , and (iii) comprises between 5 and 130 abrasive features; wherein a second set of the plurality of abrasive features has (i) an average height, H 2avg , and (ii) a standard deviation of less than 10% of H 2avg , wherein H 1ave is at least 5 microns greater than H 2avg ; wherein cross sectional areas of each of the plurality of features of the second set of plurality of abrasive features (i) taken in a plane that is parallel to the first major surface of the bases, and (ii) at a position along the second set of abrasive features that is 50% or less of the H 2avg , cumulatively, is at least 5% of the cumulative projected areas of the of the one or more abrasive elements. 2. The abrasive article of claim 1 , wherein the second set of the plurality of abrasive features comprises at least 100 abrasive features. 3. The abrasive article of claim 1 , the plurality of abrasive features of the first set of plurality of abrasive features and their respective abrasive element bases, as a collective, are monolithic. 4. The abrasive article of claim 1 , wherein the first set of plurality of abrasive features are precisely shaped features. 5. The abrasive article of claim 1 , wherein an areal density of the first set of plurality of abrasive features is between 0.01 to 0.30/cm 2 . 6. The abrasive article of claim 1 , wherein an areal density of the second set of plurality of abrasive features is between 0.2 to 33.0/cm 2 . 7. The abrasive article of claim 1 , wherein the one or more abrasive elements comprise a carbide ceramic. 8. The abrasive article of claim 7 , wherein carbide ceramic is silicon carbide, boron carbide, zirconium carbide, titanium carbide, tungsten carbide or combinations thereof. 9. The abrasive article of claim 1 , wherein the one or more abrasive elements are at least 99% by weight silicon carbide, based on the total weight of the base and the plurality of abrasive features. 10. The abrasive article of claim 1 , wherein a porosity of the abrasive elements is less than 3%. 11. The abrasive article of claim 1 , further comprising a chemical vapor deposited or physical vapor deposited coating disposed on the plurality of abrasive features. 12. The abrasive article of claim 1 , further comprising a carrier plate having a first major surface; wherein the one or more abrasive elements are coupled to the first major surface of the carrier plate. 13. A method of conditioning a polishing pad, the method comprising: performing a CMP operation using a polishing pad; and contacting a working surface of the polishing pad with a working surface of the abrasive article of claim 1 .

Assignees

Inventors

Classifications

  • of semiconductor materials · CPC title

  • Devices or means for dressing, cleaning or otherwise conditioning lapping tools · CPC title

  • characterised by the shape of the lapping pad surface, e.g. grooved · CPC title

  • characterised by the composition or properties of the plate materials · CPC title

  • B24D11/00Primary

    Constructional features of flexible abrasive materials; Special features in the manufacture of such materials · CPC title

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Frequently asked questions

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What does patent US12370649B2 cover?
An abrasive article includes a plurality of abrasive features disposed on one or more abrasive elements. Each of the one or more abrasive elements includes a base having a first major surface from which the plurality of abrasive features extends. A first set of the plurality of abrasive features (i) has an average height, H 1avg , (ii) a standard deviation of less than 10% of H 1avg , and (iii)…
Who is the assignee on this patent?
3M Innovative Properties Company
What technology area does this patent fall under?
Primary CPC classification B24D11/00. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Jul 29 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).