Piezoelectric microelectromechanical system microphone sensitivity improvement by anchor engineering

US12358782B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12358782-B2
Application numberUS-202217674213-A
CountryUS
Kind codeB2
Filing dateFeb 17, 2022
Priority dateFeb 19, 2021
Publication dateJul 15, 2025
Grant dateJul 15, 2025

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A piezoelectric microelectromechanical system microphone comprises a support substrate, a piezoelectric element configured to deform and generate an electrical potential responsive to impingement of sound waves on the piezoelectric element, the piezoelectric element attached to the support substrate about a portion of a perimeter of the piezoelectric element, a sensing electrode disposed on the piezoelectric element and configured to sense the electrical potential, and slits defined in the piezoelectric element about the perimeter of the piezoelectric element, the slits defining a plurality of partial anchors securing the piezoelectric element to the support substrate to improve sensitivity of the piezoelectric microelectromechanical system microphone.

First claim

Opening claim text (preview).

What is claimed is: 1. A piezoelectric microelectromechanical system microphone comprising: a support substrate; a piezoelectric element configured to deform and generate an electrical potential responsive to impingement of sound waves on the piezoelectric element, the piezoelectric element attached to the support substrate about a portion of a perimeter of the piezoelectric element; a sensing electrode disposed on the piezoelectric element and configured to sense the electrical potential; and slits defined in the piezoelectric element about the perimeter of the piezoelectric element, the slits defining a plurality of partial anchors securing the piezoelectric element to the support substrate to improve sensitivity of the piezoelectric microelectromechanical system microphone. 2. The piezoelectric microelectromechanical system microphone of claim 1 wherein the piezoelectric element has a diaphragm structure. 3. The piezoelectric microelectromechanical system microphone of claim 2 wherein the piezoelectric element is circular. 4. The piezoelectric microelectromechanical system microphone of claim 3 wherein the slits define at least three partial anchors. 5. The piezoelectric microelectromechanical system microphone of claim 3 wherein the slits are arcuate in shape. 6. The piezoelectric microelectromechanical system microphone of claim 5 wherein the plurality of partial anchors each extends over an arc length between 0° and 360°/N, where N is a total number of partial anchors in the piezoelectric microelectromechanical system microphone. 7. The piezoelectric microelectromechanical system microphone of claim 2 wherein the sensing electrode includes an inner sensing electrode disposed proximate a center of the diaphragm structure and an outer sensing electrode disposed proximate the perimeter of the diaphragm structure. 8. The piezoelectric microelectromechanical system microphone of claim 7 wherein the slits are defined in a region of the piezoelectric element surrounding the outer sensing electrode. 9. The piezoelectric microelectromechanical system microphone of claim 7 wherein the piezoelectric element is free of vent holes within a region inside a perimeter defined by the outer sensing electrode. 10. The piezoelectric microelectromechanical system microphone of claim 7 wherein the inner sensing electrode includes a first upper sensing electrode disposed on an upper surface of the piezoelectric element and a first lower sensing electrode disposed on a lower surface of the piezoelectric element. 11. The piezoelectric microelectromechanical system microphone of claim 10 wherein the outer sensing electrode includes a second upper sensing electrode disposed on the upper surface of the piezoelectric element and a second lower sensing electrode disposed on the lower surface of the piezoelectric element. 12. The piezoelectric microelectromechanical system microphone of claim 11 wherein the piezoelectric element includes an upper film of piezoelectric material and a lower film of piezoelectric material, an inner middle sensing electrode disposed between the upper film and lower film proximate the center of the diaphragm structure, and an outer middle sensing electrode disposed proximate the perimeter of the diaphragm structure. 13. The piezoelectric microelectromechanical system microphone of claim 1 wherein the slits are between 1 μm and 5 μm wide. 14. An electronics device module including the piezoelectric microelectromechanical system microphone of claim 1 . 15. An electronic device including the electronic device module of claim 14 . 16. A telephone including the electronic device module of claim 14 .

Assignees

Inventors

Classifications

  • Transducers for transforming electrical into mechanical energy or vice versa (dynamo-electric machines H02K99/00; electrostatic machines H02N1/00; piezoelectric devices H10N30/00) · CPC title

  • H04R17/02Primary

    Microphones · CPC title

  • Mems transducers or their use · CPC title

  • Microphones or microspeakers · CPC title

  • B81B3/0051Primary

    For defining the movement, i.e. structures that guide or limit the movement of an element (mechanical arrangements for preventing or damping vibration or shock H01H3/60) · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US12358782B2 cover?
A piezoelectric microelectromechanical system microphone comprises a support substrate, a piezoelectric element configured to deform and generate an electrical potential responsive to impingement of sound waves on the piezoelectric element, the piezoelectric element attached to the support substrate about a portion of a perimeter of the piezoelectric element, a sensing electrode disposed on the…
Who is the assignee on this patent?
Skyworks Solutions Inc
What technology area does this patent fall under?
Primary CPC classification H04R17/02. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jul 15 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).