Transparent article with a body and metal oxide disposed directly on the body, facilitating deposition of an electrically conductive and transparent ultra-thin metal film of a noble metal, and method of forming the same

Patent metadata

Field	Value
Publication number	US-12351899-B2
Application number	US-202217752958-A
Country	US
Kind code	B2
Filing date	May 25, 2022
Priority date	May 28, 2021
Publication date	Jul 8, 2025
Grant date	Jul 8, 2025

Abstract

An article comprising: (i) a body, the body comprising a material and a transmittance greater than or equal to 90% throughout an electromagnetic radiation wavelength range of 250 nm to 800 nm; and (ii) cupric oxide (CuO) in direct contact with the material of the body, the cupric oxide (CuO) comprising a thickness that is less than or equal to 1.3 nm. Also disclosed is the article further comprising: an ultra-thin metal film disposed directly on the cupric oxide (CuO). The article demonstrates a transmittance greater than or equal to 65% throughout an electromagnetic radiation wavelength range of 300 nm to 1400 nm. The ultra-thin metal film can be silver (Ag), gold (Au), copper (Cu), or platinum (Pt). The ultra-thin metal film comprises a thickness within a range of 1 nm to 5 nm. The article at the ultra-thin metal film has a sheet resistance of less than or equal to 2100 Ω/□. Additionally, a method of forming the article.

First claim

What is claimed is:

1. An article comprising:
a body, the body comprising a material and a transmittance greater than or equal to 90% throughout an electromagnetic radiation wavelength range of 250 nm to 800 nm, wherein the material of the body is an alkaline earth aluminosilicate glass, a borosilicate glass, calcium fluoride (CaF 2 ), magnesium fluoride (MgF 2 ), fused quartz, doped fused silica. undoped fused silica, or combinations thereof; and
cupric oxide (CuO) in direct contact with the material of the body, the cupric oxide (CuO) comprising a thickness that is less than or equal to 1.0 nm.

2. The article of claim 1 , wherein the thickness of the cupric oxide (CuO) is from 0.4 nm to 0.9 nm.

3. The article of claim 1 , wherein the thickness of the cupric oxide (CuO) is within a range of 0.4 nm to 0.7 nm.

4. The article of claim 1 , wherein the article is free of a layer of metallic copper (Cu) disposed between the cupric oxide (CuO) and the body.

5. The article of claim 1 , wherein the article comprises a transmittance greater than or equal to 90% throughout an electromagnetic radiation wavelength range of 350 nm to 800 nm.

6. The article of claim 1 further comprising:
an ultra-thin metal film disposed directly on the cupric oxide (CuO);
wherein, the article comprises a transmittance greater than or equal to 65% throughout an electromagnetic radiation wavelength range of 300 nm to 1400 nm;
wherein, the ultra-thin metal film comprises one or more of silver (Ag), gold (Au), copper (Cu), or platinum (Pt);
wherein, the ultra-thin metal film comprises a thickness within a range of 1 nm to 5 nm; and
wherein the article at the ultra-thin metal film has a sheet resistance of less than or equal to 10 8 Ω/□, as measured with a probe station connected to a multimeter using a four-point method at four different sets of positions on the ultra-thin metal film and then averaged.

7. An article comprising:
a body, a material of the body is an alkaline earth aluminosilicate glass, a borosilicate glass, calcium fluoride (CaF 2 ), magnesium fluoride (MgF 2 ), fused quartz, doped fused silica, undoped fused silica, or combinations thereof;
cupric oxide (CuO) in direct contact with the material of the body, the cupric oxide (CuO) comprising a thickness that is less than or equal to 1.0 nm; and
an ultra-thin metal film disposed directly on the cupric oxide (CuO), the ultra-thin metal film comprising a thickness within a range of 1 nm to 5 nm;
wherein the article comprises a transmittance greater than or equal to 65% throughout an electromagnetic radiation wavelength range of 300 nm to 1400 nm; and
wherein the article at the ultra-thin metal film has a sheet resistance of less than or equal to 10 8 Ω/□, as measured with a probe station connected to a multimeter using a four-point method at four different sets of positions on the ultra-thin metal film and then averaged.

8. The article of claim 7 , wherein the thickness of the cupric oxide (CuO) is from 0.4 nm to 0.9 nm.

9. The article of claim 7 , wherein the thickness of the cupric oxide (CuO) is within a range of 0.4 nm to 0.7 nm.

10. The article of claim 7 , wherein the ultra-thin metal film comprises one or more of silver (Ag), gold (Au), copper (Cu), or platinum (Pt).

11. The article of claim 7 , wherein the ultra-thin metal film comprises one or more of silver (Ag) or gold (Au).

12. The article of claim 7 , wherein the thickness of the ultra-thin metal film is from greater than or equal to 1 nm to less than or equal to 2 nm.

13. The article of claim 7 , wherein
the ultra-thin metal film comprises silver (Ag); and
the transmittance of the article is greater than or equal to 75% throughout an electromagnetic radiation range of 300 nm to 1400 nm.

14. The article of claim 7 , wherein
the ultra-thin metal film comprises silver (Ag); and
the transmittance of the article is greater than or equal to 75% throughout an electromagnetic radiation range of 300 nm to 1200 nm.

15. The article of claim 7 , wherein
the ultra-thin metal film comprises gold (Au); and
the transmittance of the article is greater than or equal to 65% throughout an electromagnetic radiation range of 300 nm to 1400 nm.

16. The article of claim 7 , wherein
the ultra-thin metal film comprises gold (Au); and
the transmittance of the article is greater than or equal to 70% throughout an electromagnetic radiation range of 300 nm to 1400 nm.

17. A method of manufacturing an article comprising:
applying cupric oxide (CuO) onto a body via a physical vapor deposition technique, the body comprising a material, and thus forming an article with the cupric oxide (CuO) in direct contact with the material of the body;
wherein, the cupric oxide (CuO) has a thickness that is less than or equal to 1.0 nm;
wherein, the article comprises a transmittance greater than or equal to 90% throughout an electromagnetic radiation wavelength range of 300 nm to 800 nm, and
wherein the material of the body is an alkaline earth aluminosilicate glass, a borosilicate glass, calcium fluoride (CaF 2 ), magnesium fluoride (MgF 2 ), fused quartz, doped fused silica, undoped fused silica, or combinations thereof.

18. The method of claim 17 further comprising:
applying an ultra-thin metal film directly on the cupric oxide (CuO) via a physical vapor deposition or thermal evaporation technique, thus forming a new article;
wherein, the ultra-thin metal film comprises one or more of silver (Ag), gold (Au), copper (Cu), or platinum (Pt);
wherein, the new article at the ultra-thin metal film has a sheet resistance of less than or equal to 2100 Ω/□, as measured with a probe station connected to a multimeter using a four-point method at four different sets of positions on the ultra-thin metal film and then averaged; and
wherein the new article comprises a transmittance of greater than or equal to 65% throughout an electromagnetic radiation wavelength range of 300 nm to 1400 nm.

19. An article comprising:
a body comprising a material;
cupric oxide (CuO) in direct contact with the material of the body, the cupric oxide (CuO) comprising a thickness that is less than or equal to 1.0 nm;
an ultra-thin metal film comprising a metal disposed directly on the cupric oxide (CuO), the ultra-thin metal film further comprising a thickness within a range of 1 nm to 5 nm; and
a second film comprising the same metal as the ultra-thin metal film disposed on the substrate but not contacting the ultra-thin metal film, the second film further comprising a thickness that is greater than the thickness of the ultra-thin metal film;
wherein, the article is at the ultra-thin metal film has a sheet resistance of less than or equal to 10 8 Ω/□, as measured with a probe station connected to a multimeter using a four-point method at four different sets of positions on the ultra-thin metal film and then averaged.

20. The article of claim 19 further comprising:
a layer of an electrically conductive ionic gel contiguously disposed over both the ultra-thin metal film and the second film.

21. The article of claim 19 , wherein the ultra-thin metal film comprises a contiguous perimeter and spaced ribbons extending between, and contiguous with, opposing sides of the contiguous perimeter.

22. The article of claim 1 , wherein the material of the body comprises an alkaline earth aluminosilicate glass or a boroaluminosilicate glass.

23. The article of claim 6 , wherein the sheet resistan

Assignees

• Corning Inc
• Fundacio Inst De Ciencies Fotòniques Icfo
• Inst Catalana De Recercai I Estudis Avancats
• Fundacio Inst De Ciencies Fotòniques
• Inst Catalana De Recerca I Estudis Avanats Icrea

Inventors

• Maniyara Rinu Abraham
• Cercós Daniel Martínez
• Mazumder Prantik
• Paulillo Bruno
• Pruneri Valerio

Classifications

• C23C14/35

  by application of a magnetic field, e.g. magnetron sputtering {(C23C14/3457 takes precedence)} · CPC title

• C23C14/185

  by cathodic sputtering · CPC title

• G01N21/31

  Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry {(G01N21/72 takes precedence)} · CPC title

• H01B5/14

  comprising conductive layers or films on insulating-supports · CPC title

• G01N21/8422

  Investigating thin films, e.g. matrix isolation method · CPC title