Vapor chamber

US12345473B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12345473-B2
Application numberUS-202217886346-A
CountryUS
Kind codeB2
Filing dateAug 11, 2022
Priority dateDec 8, 2021
Publication dateJul 1, 2025
Grant dateJul 1, 2025

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  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A vapor chamber includes a first cover, a second cover, a sealing ring and a sealing plug. The first cover has a thermal contact surface. The second cover is coupled with the first cover so as to form an interior space together, and the second cover has a vent hole. The sealing ring has a channel and at least one opening. The opening is in fluid communication with the channel, the sealing ring is clamped between the first cover and the second cover, and the vent hole is in fluid communication with the interior space via the channel and the opening. The vent hole and the channel are plugged with the sealing plug so as to seal the interior space.

First claim

Opening claim text (preview).

What is claimed is: 1. A vapor chamber, comprising: a first cover, having a thermal contact surface; a second cover, wherein the second cover is coupled with the first cover so as to form an interior space together, and the second cover has a vent hole; a sealing ring, having a channel, at least one opening, a support portion, and a first protrusion portion, the at least one opening is in fluid communication with the channel, the sealing ring is clamped between the first cover and the second cover, the vent hole is in fluid communication with the interior space via the channel and the at least one opening, the support portion has a first support end surface, a second support end surface and a first recess, the first support end surface and the second support end surface of the support portion are respectively in contact with the first cover and the second cover, and the first recess is recessed inwards from the second support end surface; and a sealing plug, wherein the vent hole and the channel are plugged with the sealing plug so as to seal the interior space. 2. The vapor chamber according to claim 1 , wherein the vent hole and the channel are plugged with the sealing plug via in an interference fit manner. 3. The vapor chamber according to claim 1 , wherein the sealing plug has a top end surface, a bottom end surface and an annular inclined guide surface, the bottom end surface faces away from the top end surface, the annular inclined guide surface is connected to the bottom end surface, a diameter of the bottom end surface is smaller than a diameter of the top end surface, the diameter of the top end surface is greater than a diameter of the vent hole and a diameter of the channel, the diameter of the bottom end surface is smaller than or equal to the diameter of the vent hole and the diameter of the channel, and the vent hole and the channel are plugged with the sealing plug via an interference fit manner. 4. The vapor chamber according to claim 3 , wherein the second cover has an outer surface and an inner surface located opposite to each other, a part of the inner surface faces the interior space, another part of the inner surface is in contact with the first cover, and the top end surface is non-coplanar with the outer surface. 5. The vapor chamber according to claim 1 , wherein the second cover has an outer surface and an inner surface located opposite to each other, a part of the inner surface faces the interior space, another part of the inner surface is in contact with the first cover, the sealing plug has a top end surface, and the top end surface is coplanar with the outer surface. 6. The vapor chamber according to claim 1 , further comprising a sealing pillar, wherein the first cover has an inner surface facing away from the thermal contact surface, the sealing pillar protrudes from the inner surface and is partially located in the vent hole, the sealing plug is in a ring shape, and the sealing plug surrounds the sealing pillar and is clamped between the sealing pillar and the sealing ring. 7. The vapor chamber according to claim 1 , wherein a thickness of the sealing ring is larger than a thickness of the second cover. 8. The vapor chamber according to claim 1 , wherein the support portion has a first inner bottom surface and a first annular inner side surface forming the first recess, the first inner bottom surface faces away from the first cover, the first annular inner side surface is connected to a periphery of the first inner bottom surface, the first protrusion portion protrudes from the first inner bottom surface and is spaced apart from the first annular inner side surface by a first gap, and the channel penetrates through the first protrusion portion and the support portion along a longitudinal axis of the first protrusion portion. 9. The vapor chamber according to claim 8 , wherein the sealing plug comprises a main body and a second protrusion, the main body has a top end surface, a bottom end surface and a second recess, the bottom end surface faces away from the top end surface and faces the first cover, the second recess is recessed inwards from the bottom end surface, the main body has a second inner bottom surface and a second annular inner side surface forming the second recess, the second inner bottom surface faces the first cover, the second annular inner side surface is connected to a periphery of the second inner bottom surface, the second protrusion protrudes from the second inner bottom surface and is spaced apart from the second annular inner side surface by a second gap, the channel is plugged with the second protrusion, the first gap is plugged with a part of the main body, and the second gap is plugged with a part of the first protrusion portion. 10. The vapor chamber according to claim 9 , wherein the sealing plug has an annular inclined guide surface, the annular inclined guide surface is connected to the bottom end surface, a diameter of the bottom end surface is smaller than a diameter of the top end surface, the diameter of the top end surface is larger than a diameter of the vent hole and a diameter of the channel, the diameter of the bottom end surface is smaller than or equal to the diameter of the vent hole and the diameter of the channel, the vent hole, the channel and the first gap are plugged with the main body and the second protrusion of the sealing plug in an interference fit manner. 11. The vapor chamber according to claim 1 , wherein the first cover comprises a plate, a frame and a plurality of support pillars, the frame is connected to the plate, and the plurality of support pillars are connected to the plate and surrounded by the frame. 12. The vapor chamber according to claim 11 , wherein the frame and the plurality of support pillars are welded to the plate.

Assignees

Inventors

Classifications

  • for cooling by change of state · CPC title

  • with means to remove contaminants, e.g. getters · CPC title

  • Energy storage using batteries · CPC title

  • Means for filling or sealing heat pipes · CPC title

  • the conduits having a particular shape, e.g. non-circular cross-section, annular (F28D15/0241, F28D15/0266 take precedence) · CPC title

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Frequently asked questions

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What does patent US12345473B2 cover?
A vapor chamber includes a first cover, a second cover, a sealing ring and a sealing plug. The first cover has a thermal contact surface. The second cover is coupled with the first cover so as to form an interior space together, and the second cover has a vent hole. The sealing ring has a channel and at least one opening. The opening is in fluid communication with the channel, the sealing ring …
Who is the assignee on this patent?
Cooler Master Co Ltd
What technology area does this patent fall under?
Primary CPC classification F28D15/0258. Mapped technology areas include Mechanical Engineering.
When was this patent published?
Publication date Tue Jul 01 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).