Integrated photonic responsive material sensor

Patent metadata

Field	Value
Publication number	US-12339338-B2
Application number	US-202318165894-A
Country	US
Kind code	B2
Filing date	Feb 7, 2023
Priority date	Feb 7, 2023
Publication date	Jun 24, 2025
Grant date	Jun 24, 2025

Abstract

Systems for an integrated photonic responsive material sensor are described herein. In certain embodiments, a system includes a carrier wafer that includes a cavity formed in the carrier wafer. The carrier wafer also includes a responsive waveguide coupled to the cavity, the responsive waveguide formed from responsive material responsive to a force by shifting a resonance frequency of point defects in the responsive material in response to the force, wherein a pump light is directed to the responsive waveguide to prepare the responsive waveguide to absorb a probe light when exposed to a radio frequency at the point defect resonance frequency. Additionally, the system includes components coupled to the carrier wafer, wherein the components include a probe light source that generates the probe light, wherein the components are positioned in relation to the carrier wafer to couple the probe light into the cavity.

First claim

What is claimed is:

1. A system comprising:
a carrier wafer comprising:
at least one cavity formed in the carrier wafer;
a responsive waveguide coupled to the at least one cavity, the responsive waveguide formed from responsive material that is responsive to a force by shifting a resonance frequency of point defects in the responsive material in response to the force, wherein a pump light is directed to the responsive waveguide to prepare the responsive waveguide to absorb a probe light when exposed to a radio frequency at the resonance frequency of the point defects; and

one or more components coupled to the carrier wafer, wherein the one or more components comprises a probe light source that generates the probe light, wherein the one or more components are positioned in relation to the carrier wafer to couple the probe light into the at least one cavity.

2. The system of claim 1 , wherein the carrier wafer further comprises:
a diffractor configured to direct the pump light into the responsive waveguide to excite the point defects in the responsive waveguide; and
a pump waveguide coupled to the diffractor.

3. The system of claim 2 , wherein the one or more components comprises: a pump light source that generates the pump light, wherein the one or more components are positioned in relation to the carrier wafer to couple the pump light into the pump waveguide.

4. The system of claim 1 , wherein the one or more components comprises:
a pump light source that generates the pump light;
a pump waveguide coupled to receive the pump light from the pump light source; and
a diffractor configured to direct the pump light into the responsive waveguide.

5. The system of claim 1 , wherein the one or more components further comprises:
a microwave signal antenna configured to generate a microwave field of varying frequencies that engages the responsive waveguide; and
at least one sensor to measure an intensity of the probe light that is output from the at least one cavity, the at least one sensor providing a sensor output signal of the intensity of the probe light.

6. The system of claim 1 , wherein the carrier wafer further comprises a microwave signal antenna configured to generate a microwave field of varying frequencies that engages the responsive waveguide.

7. The system of claim 1 , wherein multiple components of the one or more components are mounted on an additional wafer, wherein the additional wafer is coupled to the carrier wafer.

8. The system of claim 7 , wherein the probe light source and a pump light source are mounted on the additional wafer.

9. The system of claim 7 , wherein a detector is mounted on the additional wafer.

10. A system comprising:
a carrier wafer comprising:
at least one cavity formed in a wafer; and
a responsive waveguide coupled to the at least one cavity, the responsive waveguide formed from responsive material that is responsive to a force by shifting a resonance frequency of point defects in the responsive material in response to the force, wherein a pump light is directed to the responsive waveguide to prepare the responsive waveguide to absorb a probe light when exposed to a radio frequency at the resonance frequency of the point defects; and

a laser generation wafer comprising:
a probe light gain medium that generates the probe light; and
a pump light gain medium that generates the pump light;
wherein the laser generation wafer is positioned in relation to the carrier wafer such that the probe light is coupled into the at least one cavity.

11. The system of claim 10 , wherein the carrier wafer further comprises:
a diffractor configured to direct the pump light into the responsive waveguide to excite the point defects in the responsive waveguide; and
a pump waveguide coupled to the diffractor.

12. The system of claim 10 , wherein the pump light is coupled to an optical component for delivery onto the responsive waveguide.

13. The system of claim 10 , further comprising:
a microwave signal antenna coupled to the carrier wafer configured to generate a microwave field of varying frequencies that engages the responsive waveguide; and
at least one detector to measure an intensity of the probe light that is output from the at least one cavity, the at least one detector providing a sensor output signal of the intensity of the probe light.

14. The system of claim 10 , wherein the carrier wafer comprises a microwave signal antenna configured to generate a microwave field of varying frequencies that engages the responsive waveguide.

15. The system of claim 10 , wherein the laser generation wafer further comprises at least one detector to measure an intensity of the probe light that is output from the at least one cavity, the at least one detector providing a sensor output signal of the intensity of the probe light.

16. A system comprising:
a carrier wafer comprising:
at least one cavity formed in a wafer;
a responsive waveguide coupled to the at least one cavity, the responsive waveguide formed from responsive material that is responsive to a force by shifting a resonance frequency of point defects in the responsive material in response to the force, wherein a pump light is directed to the responsive waveguide to prepare the responsive waveguide to absorb a probe light when exposed to a radio frequency at the resonance frequency of the point defects;

a probe light source that generates the probe light, wherein the probe light source is positioned in relation to the carrier wafer to introduce the probe light into the at least one cavity; and
a pump light source that generates the pump light, wherein the pump light source is positioned in relation to the carrier wafer to introduce the pump light into a pump light cavity configured to direct the pump light to the responsive waveguide.

17. The system of claim 16 , wherein the carrier wafer further comprises the pump light cavity; and
a diffractor configured to direct the pump light into the responsive waveguide to excite the point defects in the responsive waveguide.

18. The system of claim 16 , further comprising:
a microwave signal antenna configured to generate a microwave field of varying frequencies that engages the responsive waveguide; and
at least one detector configured to measure an intensity of the probe light that is output from the at least one cavity, the at least one detector providing a sensor output signal of the intensity of the probe light.

19. The system of claim 18 , wherein the carrier wafer comprises the microwave signal antenna.

20. The system of claim 18 , wherein the microwave signal antenna is coupled to the carrier wafer.

Assignees

• Honeywell Int Inc

Inventors

• Solmeyer Neal Eldrich
• Puckett Matthew Wade
• Robbins Matthew
• Wu Jianfeng
• Salit Mary

Classifications

• G01R33/26 Primary

  using optical pumping · CPC title

• G01R33/345 Primary

  of waveguide type (G01R33/343 takes precedence) · CPC title