Plasma preclean system for cluster tool

Patent metadata

Field	Value
Publication number	US-12334318-B2
Application number	US-202217836657-A
Country	US
Kind code	B2
Filing date	Jun 9, 2022
Priority date	Jun 9, 2022
Publication date	Jun 17, 2025
Grant date	Jun 17, 2025

Abstract

A plasma processing system for cleaning a substrate is provided. The plasma processing system includes a process chamber that includes: a chamber body enclosing an interior volume; and a substrate support disposed in the interior volume. The plasma processing system includes a vacuum pump; a first exhaust line fluidly coupled between the interior volume of the process chamber and the vacuum pump; and a second exhaust line fluidly coupled between the interior volume of the process chamber and the vacuum pump. The first exhaust line and the second exhaust line are arranged to provide alternative paths for the exhaust between the interior volume and the vacuum pump, and the first exhaust line has an internal diameter that is at least 50% smaller than the internal diameter of the second exhaust line.

First claim

The invention claimed is:

1. A plasma processing system for cleaning a substrate comprising:
a process chamber, comprising:
a chamber body enclosing an interior volume; and
a substrate support disposed in the interior volume;

a vacuum pump;
a first exhaust line fluidly coupled between the interior volume of the process chamber and the vacuum pump;
a second exhaust line fluidly coupled between the interior volume of the process chamber and the vacuum pump, wherein
the first exhaust line and the second exhaust line are arranged to provide alternative paths for the exhaust between the interior volume and the vacuum pump, and
the first exhaust line has an internal diameter that is at least 50% smaller than the internal diameter of the second exhaust line;

a first supply line fluidly coupled between the interior volume and a gas source; and
a second supply line fluidly coupled between the interior volume and a gas source, wherein
the first supply line and the second supply line are arranged to provide alternative paths between the interior volume and the gas source, and
the first supply line has an internal diameter that is at least 50% smaller than an internal diameter of the second supply line; and

a controller configured to:
receive a substrate on the substrate support at a beginning of a first time period;
open a first exhaust valve on the first exhaust line to reduce a pressure in the interior volume and exhaust the interior volume of the process chamber through the first exhaust line until a first exhaust pressure in the interior volume is reached during the first time period;
open a second exhaust valve on the second exhaust line to further reduce the pressure to exhaust the interior volume of the process chamber through the second exhaust line until a second exhaust pressure in the interior volume is reached during the first time period;
perform an initial process on the substrate in the interior volume of the process chamber during the first time period after the second exhaust pressure is reached, wherein the first exhaust pressure is greater than 400 Torr;
open a first supply valve on the first supply line to provide a gas from the gas source to the interior volume of the process chamber through the first supply line until a first supply pressure in the interior volume is reached; and
open a second supply valve on the second supply line to provide the gas from the gas source to the interior volume of the process chamber through the second supply line until a second supply pressure in the interior volume is reached, wherein the first supply pressure is less than 300 Torr.

2. The plasma processing system of claim 1 , wherein the second exhaust pressure is less than 50 Torr.

3. The plasma processing system of claim 1 , further comprising a remote plasma source fluidly coupled between the first supply line and the interior volume.

4. The plasma processing system of claim 1 , wherein the second supply pressure is greater than 600 Torr.

5. A plasma processing system for cleaning a substrate comprising:
a process chamber, comprising:
a chamber body enclosing an interior volume; and
a substrate support disposed in the interior volume;

a gas source fluidly coupled to the interior volume;
a first supply line fluidly coupled between the interior volume and the gas source;
a second supply line fluidly coupled between the interior volume and the gas source, wherein
the first supply line and the second supply line are arranged to provide alternative paths between the interior volume and the gas source, and
the first supply line has an internal diameter that is at least 50% smaller than the internal diameter of the second supply line; and

a controller configured to:
perform a process on a substrate disposed on the substrate support in the interior volume of the process chamber during a first time period;
open a first supply valve on the first supply line to increase a pressure in the interior volume and provide a gas from the gas source to the interior volume of the process chamber through the first supply line until a first supply pressure in the interior volume is reached during the first time period;
open a second supply valve on the second supply line to further increase a pressure in the interior volume and provide the same gas from the gas source to the interior volume of the process chamber through the second supply line until a second supply pressure in the interior volume is reached during the first time period; and
remove the substrate from the process chamber during the first time period after the second supply pressure is reached.

6. The plasma processing system of claim 5 , wherein the first supply pressure is less than 300 Torr.

7. The plasma processing system of claim 6 , wherein the second supply pressure is greater than 600 Torr.

8. The plasma processing system of claim 5 , further comprising a remote plasma source fluidly coupled between the first supply line and the interior volume.

9. A cluster tool for processing a semiconductor substrate, comprising:
a transfer chamber;
a deposition chamber coupled to the transfer chamber; and
a plasma processing system coupled to the transfer chamber, the plasma processing system comprising:
a process chamber comprising:
a chamber body enclosing an interior volume; and
a substrate support disposed in the interior volume;

a vacuum pump;
a first exhaust line fluidly coupled between the interior volume of the process chamber and the vacuum pump;
a second exhaust line fluidly coupled between the interior volume of the process chamber and the vacuum pump, wherein
the first exhaust line and the second exhaust line are arranged to provide alternative paths for the exhaust between the interior volume and the vacuum pump, and
the first exhaust line has an internal diameter that is at least 50% smaller than the internal diameter of the second exhaust line,

a gas source fluidly coupled to the interior volume;
a first supply line fluidly coupled between the interior volume and the gas source;
a second supply line fluidly coupled between the interior volume and the gas source, wherein
the first supply line and the second supply line are arranged to provide alternative paths between the interior volume and the gas source, and
the first supply line has an internal diameter that is at least 50% smaller than an internal diameter of the second supply line; and

a controller configured to:
receive a substrate on the substrate support at a beginning of a first time period;
open a first exhaust valve on the first exhaust line to reduce a pressure in the interior volume and exhaust the interior volume of the process chamber through the first exhaust line until a first exhaust pressure in the interior volume is reached during the first time period;
open a second exhaust valve on the second exhaust line to further reduce the pressure to exhaust the interior volume of the process chamber through the second exhaust line until a second exhaust pressure in the interior volume is reached during the first time period; and
perform an initial process on the substrate in the interior volume of the process chamber during the first time period after the second exhaust pressure is reached, wherein the first exhaust pressure is greater than 400 Torr;
open a first supply valve on the first supply line to provide a gas from the gas source to the interior volume of the process chamber through the first supply line until a first supply pressure in the interior volume is reached; and
open a second supply valve on the second supply line to provide the gas from the gas source to the interior volume of the process chamber through the second supply line

Assignees

• Applied Materials Inc

Inventors

• Lee Songjae
• Ishii Masato
• Truemper Martin
• Collins Richard O
• Salinas Martin Jeffrey
• Zheng Yong
• Zhao Anita
• Mariadass Adele
• Marcadal Christophe
• Barandica Henry
• Ulloa Ernesto J

Classifications

• H10P72/0462

  characterised by the construction of the processing chambers, e.g. modular processing chambers · CPC title

• H10P72/0402

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• H01J37/3244

  Gas supply means · CPC title

• H01J37/32825

  Working under atmospheric pressure or higher · CPC title

• H01J37/32899

  Multiple chambers, e.g. cluster tools · CPC title