Silicon photonics device for LIDAR sensor and method for fabrication

US12320925B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12320925-B2
Application numberUS-202418412119-A
CountryUS
Kind codeB2
Filing dateJan 12, 2024
Priority dateNov 24, 2021
Publication dateJun 3, 2025
Grant dateJun 3, 2025

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A structure of a silicon photonics device for LIDAR includes a first insulating structure and a second insulating structure disposed above one or more etched silicon structures overlying a substrate member. A metal layer is disposed above the first insulating structure without a prior deposition of a diffusion barrier and adhesion layer. A thin insulating structure is disposed above the second insulating structure. A first configuration of the metal layer, the first insulating structure and the one or more etched silicon structures forms a free-space coupler. A second configuration of the thin insulating structure above the second insulating structure forms an edge coupler.

First claim

Opening claim text (preview).

What is claimed is: 1. A silicon photonics device for a LIDAR sensor of a vehicle, comprising: a substrate member; and a first antenna of the LIDAR sensor formed on the substrate member, the first antenna being a one-dimensional grating coupler and including: a first grating structure coupled to the substrate member; and a first metal layer coupled to the first grating structure. 2. The silicon photonics device of claim 1 , further comprising: an edge coupler formed on the substrate member, the edge coupler including: a first dielectric structure coupled to the substrate member; and a second dielectric structure coupled to the first dielectric structure. 3. The silicon photonics device of claim 2 , further comprising: a second antenna of the LIDAR sensor formed on the substrate member, the second antenna including: a second grating structure coupled to the substrate member; a third dielectric structure coupled to the second grating structure; and the first metal layer coupled to the third dielectric structure. 4. The silicon photonics device of claim 3 , further comprising: a first frequency mixer formed on the substrate member and coupled to the first antenna; and a second frequency mixer formed on the substrate member and coupled to the second antenna. 5. The silicon photonics device of claim 1 , wherein the first antenna further includes: a diffusion barrier and adhesion layer on top of the first metal layer, the diffusion barrier and adhesion layer and the first metal layer forming a reflective mirror structure. 6. The silicon photonics device of claim 1 , further comprising a silicon-on-insulator (SOI) layer formed on the substrate member. 7. The silicon photonics device of claim 1 , wherein the first antenna further includes an intermediate oxide layer between the first grating structure and the first metal layer. 8. The silicon photonics device of claim 1 , wherein the first metal layer is a Metal 0 (MT0) layer. 9. The silicon photonics device of claim 1 , wherein a coupling loss of the first antenna is 0.25 decibels. 10. The silicon photonics device of claim 2 , wherein a thickness of the second dielectric structure is lesser than a thickness of the first dielectric structure. 11. The silicon photonics device of claim 2 , wherein the edge coupler includes an intermediate oxide layer between the first dielectric structure and the second dielectric structure. 12. The silicon photonics device of claim 5 , wherein the diffusion barrier and adhesion layer is one from a group of tantalum nitride, indium oxide, copper silicide, tungsten nitride, and titanium nitride. 13. The silicon photonics device of claim 5 , wherein a reflectivity of the first metal layer is higher than a reflectivity of the diffusion barrier and adhesion layer. 14. The silicon photonics device of claim 2 , wherein a distance between a top of the first dielectric structure and a bottom of the second dielectric structure is about 450 nanometers. 15. The silicon photonics device of claim 2 , wherein the second dielectric structure overlaps the first dielectric structure from edge to edge. 16. The silicon photonics device of claim 2 , wherein a height of the second dielectric structure is less than that of the first dielectric structure by a factor of about 3. 17. The silicon photonics device of claim 5 , wherein a height of the first metal layer is twice than that of the diffusion barrier and adhesion layer. 18. A LIDAR sensor for a vehicle, the LIDAR sensor comprising: a silicon photonics device, the silicon photonics device including: a substrate member; and a first antenna of the LIDAR sensor formed on the substrate member, the first antenna being a one-dimensional grating coupler and including: a first grating structure coupled to the substrate member; and a first metal layer coupled to the first grating structure. 19. The LIDAR sensor of claim 18 , wherein the silicon photonics device further comprises: a second antenna formed on the substrate member, the second antenna including: a second grating structure coupled to the substrate member; a first dielectric structure coupled to the second grating structure; and the first metal layer coupled to the first dielectric structure. 20. An autonomous vehicle control system comprising: a silicon photonics device for a LIDAR sensor of a vehicle, the silicon photonics device including: a substrate member; and an antenna of the LIDAR sensor formed on the substrate member, the antenna being a one-dimensional grating coupler and including: a first grating structure coupled to the substrate member; and a first metal layer coupled to the first grating structure.

Assignees

Inventors

Classifications

  • G01S17/931Primary

    of land vehicles · CPC title

  • the potential barrier being a PN heterojunction · CPC title

  • comprising only Group IV materials · CPC title

  • directly associated or integrated with the devices, e.g. back reflectors (directly associated or integrated with photovoltaic cells H10F77/42) · CPC title

  • using transmission of continuous, frequency-modulated waves while heterodyning the received signal, or a signal derived therefrom, with a locally-generated signal related to the contemporaneously transmitted signal · CPC title

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What does patent US12320925B2 cover?
A structure of a silicon photonics device for LIDAR includes a first insulating structure and a second insulating structure disposed above one or more etched silicon structures overlying a substrate member. A metal layer is disposed above the first insulating structure without a prior deposition of a diffusion barrier and adhesion layer. A thin insulating structure is disposed above the second …
Who is the assignee on this patent?
Aurora Operations Inc
What technology area does this patent fall under?
Primary CPC classification G01S17/931. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jun 03 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).