Production method for high-purity hydrogen chloride gas

Patent metadata

Field	Value
Publication number	US-12312247-B2
Application number	US-202017780311-A
Country	US
Kind code	B2
Filing date	Dec 3, 2020
Priority date	Dec 9, 2019
Publication date	May 27, 2025
Grant date	May 27, 2025

Abstract

A method for producing a high-purity hydrogen chloride gas comprises performing a purification process that includes the steps 1) to 3) below on a byproduct hydrogen chloride gas:
1) a crude hydrochloric acid generation step of allowing water to absorb the byproduct hydrogen chloride gas; 2) a volatile organic impurity-removed hydrochloric acid generation step of bringing the crude hydrochloric acid obtained in the step 1) into contact with an inert gas at a liquid temperature of 20 to 45° C. to dissipate volatile organic impurities; and 3) a high-purity hydrogen chloride gas generation step of supplying the volatile organic impurity-removed hydrochloric acid obtained in the step 2) to a distillation column and performing distillation under conditions of a column bottom temperature of higher than 60° C. and 108° C. or lower and a column top temperature of 60° C. or lower to distill out a high-purity hydrogen chloride gas.

First claim

The invention claimed is:

1. A method for producing a high-purity hydrogen chloride gas, comprising performing a purification process that includes the following 1) to 3) by using, as a raw material, a byproduct hydrogen chloride gas generated when producing vinyl chloride by thermally decomposing 1,2-dichloroethane:
1) generating a crude hydrochloric acid by allowing water to absorb the byproduct hydrogen chloride gas;
2) generating a volatile organic impurity-removed hydrochloric acid by bringing the crude hydrochloric acid obtained in 1) into contact with an inert gas supplied from a supply pipe, at a liquid temperature of 20 to 45° C. to dissipate volatile organic impurities; and
3) generating a high-purity hydrogen chloride gas by supplying the volatile organic impurity-removed hydrochloric acid obtained in 2) to a distillation column and performing distillation under conditions of a column bottom temperature of higher than 60° C. and 108° C. or lower and a column top temperature of 60° C. or lower to distill out a high-purity hydrogen chloride gas.

2. The method for producing a high-purity hydrogen chloride gas according to claim 1 , wherein a content of low molecular weight carboxylic acids consisting of formic acid and acetic acid in the crude hydrochloric acid obtained in 1) is 3 ppm or more.

3. The method for producing a high-purity hydrogen chloride gas according to claim 1 , wherein a content of bromine ion in the crude hydrochloric acid obtained in 1) is 5 ppm or more.

4. The method for producing a high-purity hydrogen chloride gas according to claim 1 , wherein 1,2-dichloroethane includes one obtained by an oxychlorination reaction using ethylene, hydrogen chloride, and oxygen as raw materials.

5. The method for producing a high-purity hydrogen chloride gas according to claim 1 , wherein, in 3), a column bottom liquid after distilling out the hydrogen chloride gas from the volatile organic impurity-removed hydrochloric acid is circulated to the crude hydrochloric acid of 1).

6. The method for producing a high-purity hydrogen chloride gas according to claim 1 , wherein the high-purity hydrogen chloride gas is for semiconductor manufacturing.

7. A method for producing a high-purity hydrochloric acid, comprising after performing the method for producing a high-purity hydrogen chloride gas according to claim 1 :
4) generating a high-purity hydrochloric acid by allowing water to absorb the obtained high-purity hydrogen chloride gas.

8. The method for producing a high-purity hydrochloric acid according to claim 7 , further comprising:
5) Removing a particle by treating the high-purity hydrochloric acid obtained in the step 4) with a particulate capturing filter.

9. The method for producing a high-purity hydrochloric acid according to claim 7 , wherein a content of low molecular weight carboxylic acids consisting of formic acid and acetic acid in the resulting high-purity hydrochloric acid is 1 ppm or less.

10. The method for producing a high-purity hydrochloric acid according to claim 7 , wherein a content of bromine ion in the resulting high-purity hydrochloric acid is 1 ppm or less.

11. The method for producing a high-purity hydrochloric acid according to claim 7 , wherein the high-purity hydrochloric acid is for semiconductor manufacturing.

12. The method for producing a high-purity hydrochloric acid according to claim 1 , wherein in 2), the volatile organic impurities are dissipated by counterflow contact in which the hydrochloric acid is distributed from an upper side to a lower side and the inert gas is distributed from a lower side to an upper side.

Assignees

• Tokuyama Corp

Inventors

• Saito Akihiro
• Tsunoda Dai
• Moriwaki Masayuki

Classifications

• C01P2006/80

  Compositional purity · CPC title

• C01B2210/0098

  Other impurities · CPC title

• C01B2210/0068

  Organic compounds · CPC title

• C01B2210/0042

  Making ultrapure specific gas · CPC title

• C01B2210/0028

  Separation of the specific gas from gas mixtures containing a minor amount of this specific gas · CPC title