Hydrogen chloride dehydration method

Patent metadata

Field	Value
Publication number	US-12404172-B2
Application number	US-202017771532-A
Country	US
Kind code	B2
Filing date	Sep 4, 2020
Priority date	Nov 13, 2019
Publication date	Sep 2, 2025
Grant date	Sep 2, 2025

Abstract

A dehydration method in accordance with an embodiment of the present invention includes: a first dehydration step of bringing hydrogen chloride gas ( 21 ) and concentrated sulfuric acid ( 13 A) into contact with each other; and a second dehydration step of bringing hydrogen chloride gas ( 21 A) that has been obtained through the first dehydration step into contact with concentrated sulfuric acid ( 13 B). A concentration of the concentrated sulfuric acid used in the second dehydration step is higher than a concentration of the concentrated sulfuric acid used in the first dehydration step.

First claim

The invention claimed is:

1. A method of dehydrating hydrogen chloride gas through a multi-step process, the method comprising:
a first dehydration step of bringing hydrogen chloride gas and concentrated sulfuric acid into contact with each other; and
a second dehydration step of bringing hydrogen chloride gas that has been obtained through the first dehydration step into contact with concentrated sulfuric acid,
wherein a concentration of the concentrated sulfuric acid used in the second dehydration step is higher than a concentration of the concentrated sulfuric acid used in the first dehydration step,
wherein at least part of the concentrated sulfuric acid that has been used in the second dehydration step is reused in the first dehydration step,
wherein the multi-step process consists of the first dehydration step, the second dehydration step, and a third dehydration step carried out after the second dehydration step,
wherein at least part of concentrated sulfuric acid that has been used in the third dehydration step is reused in the second dehydration step,
a concentration of the concentrated sulfuric acid reused in the second dehydration step after having been used in the third dehydration step is not lower than 96 wt %,
a concentration of the concentrated sulfuric acid reused in the first dehydration step after having been used in the second dehydration step is not lower than 85 wt % and lower than 96 wt %, and
a concentration of the concentrated sulfuric acid after having been used in the first dehydration step is not lower than 75 wt % and lower than 85 wt %.

2. The dehydration method according to claim 1 , wherein in the multi-step process, a concentration of concentrated sulfuric acid used in a most downstream dehydration step is a highest concentration, as compared with the concentrations of the concentrated sulfuric acids used in dehydration steps upstream from the most downstream dehydration step.

3. The dehydration method according to claim 1 , further comprising:
a step of removing sulfuric acid mist from hydrogen chloride gas that has been obtained through the multi-step process, by using a mist separator provided with a glass filter.

4. A method for producing trichlorosilane by reacting hydrogen chloride gas with water content that has been reduced by a dehydration method according to claim 1 with metallic silicon.

Assignees

• Tokuyama Corp

Inventors

• Sakai Junya
• Iiyama Shoji

Classifications

• C01B33/10763

  from silicon · CPC title

• B01D2257/30

  Sulfur compounds · CPC title

• B01D53/26

  Drying gases or vapours · CPC title

• C01B7/07

  Purification {; Separation (C01B7/015 takes precedence)} · CPC title

• C01B33/107

  Halogenated silanes · CPC title