Systems, devices, and methods for contaminant resistant insulative structures

Patent metadata

Field	Value
Publication number	US-12283454-B2
Application number	US-202318397728-A
Country	US
Kind code	B2
Filing date	Dec 27, 2023
Priority date	Sep 3, 2019
Publication date	Apr 22, 2025
Grant date	Apr 22, 2025

Abstract

Embodiments of systems, devices, and methods relate to an electrode standoff isolator. An example electrode standoff isolator includes a plurality of adjacent insulative segments positioned between a proximal end and a distal end of the electrode standoff isolator. A geometry of the adjacent insulative is configured to guard a surface area of the electrode standoff isolator against deposition of a conductive layer of gaseous phase materials from a filament of an ion source.

First claim

What is claimed is:

1. An electrostatic lens, comprising:
a mount plate;
a biasable electrode; and
an insulative structure positioned relative to the biasable electrode and the mount plate, wherein the insulative structure comprises a plurality of adjacent insulative segments between a proximal end and a distal end of the insulative structure, and wherein each adjacent insulative segment comprises a horizontal exterior surface between two rounded edges.

2. The electrostatic lens of claim 1 , wherein the biasable electrode is mounted between a first grounded aperture and a second grounded aperture of the electrostatic lens.

3. The electrostatic lens of claim 1 , wherein a first adjacent insulative segment of the plurality of adjacent insulative segments and a second adjacent insulative segment of the plurality of adjacent insulative segments are connected at an adjoining point positioned therebetween.

4. The electrostatic lens of claim 3 , wherein the first adjacent insulative segment and the second adjacent insulative segment create a shadow region at the adjoining point.

5. The electrostatic lens of claim 4 , wherein the shadow region is a shaded surface area protected against deposition of a conductive layer.

6. The electrostatic lens of claim 3 , wherein a first diameter of each of the first adjacent insulative segment and the second adjacent insulative segment is larger than a second diameter of the adjoining point.

7. The electrostatic lens of claim 1 , wherein the insulative structure is positioned within a hollowed space of the biasable electrode.

8. The electrostatic lens of claim 1 , wherein each adjacent insulative segment further comprises an overhanging rib that discontinues into a body of the insulative structure.

9. The electrostatic lens of claim 8 , wherein the overhanging rib creates one or more shadow regions.

10. The electrostatic lens of claim 9 , wherein the one or more shadow regions are a shaded surface area protected against deposition of a conductive layer.

11. The electrostatic lens of claim 1 , wherein the insulative structure further comprises a first connector for coupling with the biasable electrode and a second connector for coupling with the mount plate.

12. The electrostatic lens of claim 1 , wherein adjacent insulative segment further comprises a complete band around a body of the insulative structure.

13. The electrostatic lens of claim 1 , wherein the insulative structure can withstand a total potential drop of up to 20 kV.

14. The electrostatic lens of claim 13 , wherein each adjacent insulative segment of the plurality of adjacent insulative segments can withstand a subset of the total potential drop.

15. The electrostatic lens of claim 1 , wherein the insulative structure comprises opaque white SLA plastic.

16. The electrostatic lens of claim 15 , wherein the insulative structure is ceramic-filled.

17. The electrostatic lens of claim 15 , wherein the opaque white SLA plastic is grit blasted and 3D printed.

18. The electrostatic lens of claim 1 , wherein the insulative structure is a monolithic or unitary structure.

19. A neutron beam system, comprising:
a tandem accelerator;
a high-energy beam line (HEBL) coupled to an output of the tandem accelerator; and
a low-energy beam line (LEBL) coupled to an inlet of the tandem accelerator, the low-energy beam line (LEBL) comprising the electrostatic lens according to claim 1 .

20. The neutron beam system of claim 19 , wherein the low-energy beam line (LEBL) further comprises an ion source comprising a ground lens, wherein the electrostatic lens is mounted adjacent and downstream of the ground lens.

Assignees

• Tae Tech Inc

Inventors

• Killer Christopher J
• Vekselman Vladislav
• Leuenberger Joshua

Classifications

• H01J2237/038

  Insulating · CPC title

• H01J27/024

  Extraction optics, e.g. grids · CPC title

• H01J49/068

  Mounting, supporting, spacing, or insulating electrodes · CPC title

• A61N2005/109

  Neutrons · CPC title

• A61N5/1077

  Beam delivery systems · CPC title