Systems, devices, and methods for contaminant resistant insulative structures

Patent metadata

Field	Value
Publication number	US-11355303-B2
Application number	US-202017006049-A
Country	US
Kind code	B2
Filing date	Aug 28, 2020
Priority date	Sep 3, 2019
Publication date	Jun 7, 2022
Grant date	Jun 7, 2022

Abstract

Embodiments of systems, devices, and methods relate to an electrode standoff isolator. An example electrode standoff isolator includes a plurality of adjacent insulative segments positioned between a proximal end and a distal end of the electrode standoff isolator. A geometry of the adjacent insulative is configured to guard a surface area of the electrode standoff isolator against deposition of a conductive layer of gaseous phase materials from a filament of an ion source.

First claim

What is claimed is:

1. An electrode standoff isolator, comprising:
a plurality of adjacent insulative segments positioned between a proximal end and a distal end of the electrode standoff isolator, wherein each adjacent insulative segment of the plurality of insulative segments comprises a curved surface that deflects toward the distal end of the electrode standoff isolator,
wherein a geometry of the plurality of adjacent insulative segments is configured to guard a surface area of the electrode standoff isolator against deposition of a conductive layer of gaseous phase materials from a filament of an ion source.

2. The electrode standoff isolator of claim 1 , wherein dimensions of adjacent insulative segments of the plurality of adjacent insulative segments configure the electrode standoff isolator to withstand a potential difference across two surfaces between which the electrode standoff isolator is positioned while an ion beam passes along its proximal end toward its distal end.

3. The electrode standoff isolator of claim 2 , wherein the potential difference is 20 kV.

4. The electrode standoff isolator of claim 2 , wherein each adjacent insulative segment comprises material suitable to withstand a subset of the potential difference.

5. The electrode standoff isolator of claim 2 , wherein the electrode standoff isolator comprises a maximum surface area configured to:
withstand the potential difference while allowing passage of an ion beam through an einzel lens within which the electrode standoff isolator is situated and avoid deposition of contaminants on the surface area.

6. The electrode standoff isolator of claim 1 , wherein an insulative segment comprises an overhanging rib connected at its underside to a body of the electrode standoff isolator.

7. The electrode standoff isolator of claim 6 , wherein each overhanging rib is separated from its immediate neighboring overhanging rib by a distance.

8. The electrode standoff isolator of claim 7 , wherein a first distance between a first pair of overhanging ribs is different from a second distance between a second pair of overhanging ribs.

9. The electrode standoff isolator of claim 1 , further comprising one or more threads for attaching to one or more surfaces.

10. The electrode standoff isolator of claim 1 , wherein each adjacent insulative segment of the plurality of adjacent insulative segments comprises substantially equivalent dimensions.

11. The electrode standoff isolator of claim 1 , wherein one or more adjacent insulative segment of the plurality of adjacent insulative segments comprises differing dimensions from one or more other adjacent insulative segments of the plurality of adjacent insulative segments.

12. The electrode standoff isolator of claim 1 , having a length associated with dimensions of an einzel lens within which the electrode standoff isolator is situated.

13. The electrode standoff isolator of claim 1 , configured to be oriented such that the ion beam passes in a direction along a curvature of the curved surface.

14. The electrode standoff isolator of claim 1 , configured to be oriented such that the ion beam passes in a direction against a curvature of the curved surface.

15. The electrode standoff isolator of claim 1 , wherein the geometry of a given adjacent insulative segment provides a shadow region on one or more of a first surface area of an immediate adjacent insulative segment or a second surface area of the electrode standoff isolator, wherein the shadow region is guarded against deposition of a conductive layer of gaseous phase materials from a filament of an ion source.

16. The electrode standoff isolator of claim 1 , further comprising 3D printed opaque plastic.

17. The electrode standoff isolator of claim 1 , further comprising a ceramic filling.

18. The electrode standoff isolator of claim 1 , further comprising a standalone monolithic body.

19. A method of reducing deposition of contaminants on a surface area of an electrode standoff isolator, the method comprising:
positioning a plurality of adjacent insulative segments between a proximal end and a distal end of the electrode standoff isolator; and
configuring a geometry of the plurality of adjacent insulative segments to guard the surface area of the electrode standoff isolator against deposition of a conductive layer of gaseous phase materials from a filament of an ion source, wherein each adjacent insulative segment of the plurality of insulative segments comprises a curved surface that deflects toward the distal end of the electrode standoff isolator.

Assignees

• Tae Tech Inc

Inventors

• Killer Christopher J
• Vekselman Vladislav
• Leuenberger Joshua

Classifications

• H01J2237/038

  Insulating · CPC title

• H01J27/024

  Extraction optics, e.g. grids · CPC title

• H01J37/12 Primary

  electrostatic · CPC title

• H05H7/00

  Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00 · CPC title

• A61N5/1077

  Beam delivery systems · CPC title