Reflective member and glass layered member production method

US12264095B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12264095-B2
Application numberUS-202017642525-A
CountryUS
Kind codeB2
Filing dateAug 17, 2020
Priority dateSep 13, 2019
Publication dateApr 1, 2025
Grant dateApr 1, 2025

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

One aspect is a reflective member, which has a laminated structure in which transparent quartz glass members are formed on an upper surface and a lower surface of an opaque siliceous sintered powder layer. The opaque siliceous sintered powder layer has a thickness of 0.1 mm or more and a thickness distribution of ±0.05 mm or less. When a load is applied to each of the transparent quartz glass members on an upper surface and a lower surface of the laminated structure in a direction parallel to the laminated structure, the reflective member is fractured at a load of 5 N or more per square centimeter. The laminated structure includes a semi-transparent portion having a width of 0.01 mm or less, which has an intermediate opacity between an opacity of the opaque siliceous sintered powder layer and an opacity of each of the transparent quartz glass members.

First claim

Opening claim text (preview).

The invention claimed is: 1. A reflective member comprising: a laminated structure in which transparent quartz glass members are formed on an upper surface and a lower surface of an opaque siliceous sintered powder layer, wherein the opaque siliceous sintered powder layer has a thickness of 0.1 mm or more and a thickness distribution of ±0.05 mm or less, wherein, when a load is applied to each of the transparent quartz glass members on an upper surface and a lower surface of the laminated structure in a direction parallel to the laminated structure, the reflective member is fractured at a load of 5 N or more per square centimeter, and wherein the laminated structure includes, in a boundary between the opaque siliceous sintered powder layer and each of the transparent quartz glass members of the laminated structure, a semi-transparent portion having a width of 0.01 mm or less, which has an intermediate opacity between an opacity of the opaque siliceous sintered powder layer and an opacity of each of the transparent quartz glass members. 2. The reflective member according to claim 1 , wherein the reflective member has a reflectance of 60% or more at a wavelength of from 1,000 nm to 2,000 nm. 3. The reflective member according to claim 1 , wherein the siliceous sintered powder layer has a bulk density of from 1.3 g/cm 3 to 1.5 g/cm 3 . 4. The reflective member according to claim 1 , wherein the reflective member comprises a plurality of the siliceous sintered powder layers, and wherein the siliceous sintered powder layers and the quartz glass members are alternately laminated.

Assignees

Inventors

Classifications

  • Reflective · CPC title

  • Silica · CPC title

  • Inorganic coating · CPC title

  • comprising glass as the main or only constituent of a layer, next to another layer of a specific {material} · CPC title

  • characterised by features of a layer formed of particles, e.g. chips, powder {or granules (layer formed of natural mineral particles B32B19/00; layer being formed of wood fibres, chips or particles B32B21/02)} · CPC title

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What does patent US12264095B2 cover?
One aspect is a reflective member, which has a laminated structure in which transparent quartz glass members are formed on an upper surface and a lower surface of an opaque siliceous sintered powder layer. The opaque siliceous sintered powder layer has a thickness of 0.1 mm or more and a thickness distribution of ±0.05 mm or less. When a load is applied to each of the transparent quartz glass m…
Who is the assignee on this patent?
Shin Etsu Quartz Prod Co Ltd, Heraeus Quarzglas
What technology area does this patent fall under?
Primary CPC classification C03B23/203. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Apr 01 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).