Laser welding transparent glass sheets using low melting glass or thin absorbing films

Patent metadata

Field	Value
Publication number	US-9515286-B2
Application number	US-201414271797-A
Country	US
Kind code	B2
Filing date	May 7, 2014
Priority date	May 10, 2013
Publication date	Dec 6, 2016
Grant date	Dec 6, 2016

Abstract

A method of sealing a workpiece comprising forming an inorganic film over a surface of a first substrate, arranging a workpiece to be protected between the first substrate and a second substrate wherein the inorganic film is in contact with the second substrate; and sealing the workpiece between the first and second substrates as a function of the composition of impurities in the first or second substrates and as a function of the composition of the inorganic film by locally heating the inorganic film with a predetermined laser radiation wavelength. The inorganic film, the first substrate, or the second substrate can be transmissive at approximately 420 nm to approximately 750 nm.

First claim

We claim:

1. A method of bonding a workpiece comprising:
forming an inorganic film over a surface of a first substrate;
arranging a workpiece to be protected between the first substrate and a second
substrate wherein the film is in contact with the second substrate;
bonding the workpiece between the first and second substrates by locally heating the film with laser radiation having a predetermined wavelength,
wherein the inorganic film, the first substrate, or the second substrate are transmissive at approximately 420 nm to approximately 750 nm, and
wherein the step of bonding further comprises bonding the workpiece between the first and second substrates as a function of the composition of impurities in the first or second substrates and as a function of the composition of the inorganic film.

2. The method of claim 1 , wherein each of the inorganic film, first substrate and second substrate are transmissive at approximately 420 nm to approximately 750 nm.

3. The method of claim 1 , wherein absorption of the inorganic film is more than 10% at a predetermined laser wavelength.

4. The method of claim 1 , wherein the composition of the inorganic film is selected from the group consisting of SnO 2 , ZnO, TiO 2 , ITO, Zn, Ti, Ce, Pb, Fe, Va, Cr, Mn, Mg, Ge, SnF 2 , ZnF 2 and combinations thereof.

5. The method of claim 1 , wherein the composition of the inorganic film is selected to lower the activation energy for inducing creep flow of the first substrate, the second substrate, or both the first and second substrates.

6. The method of claim 1 , wherein the composition of the inorganic film is a laser absorbing low liquidus temperature material with a liquidus temperature less than or equal to about 1000° C.

7. The method of claim 1 , wherein the composition of the inorganic film comprises:
20-100 mol % SnO;
0-50 mol % SnF 2 ; and
0-30 mol % P 2 O 5 or B 2 O 3 .

8. The method of claim 1 , wherein the inorganic film and the first and second substrates have a combined internal transmission of more than 80% at approximately 420 nm to approximately 750 nm.

9. The method of claim 1 , wherein the impurities in the first or second substrates are selected from the group consisting of As, Fe, Ga, K, Mn, Na, P, Sb, Ti, Zn, Sn and combinations thereof.

10. The method of claim 1 , wherein the first and second substrates have different lateral dimensions, different CTEs, different thicknesses, or combinations thereof.

11. The method of claim 1 , wherein one of the first and second substrates is glass or glass-ceramic.

12. The method of claim 11 , wherein the other of the first and second substrates is a glass-ceramic, ceramic or metal.

13. The method of claim 1 , further comprising the step of annealing the bonded workpiece.

14. The method of claim 1 , wherein the laser radiation comprises UV radiation at a predetermined wavelength between approximately 193 nm to approximately 420 nm.

15. The method of claim 1 , wherein the laser radiation comprises NIR radiation at a predetermined wavelength between approximately 780 nm to approximately 5000 nm.

16. The method of claim 1 , wherein a pulse-width of the laser radiation is from 1 to 40 nanoseconds and a repetition rate of the laser radiation is at least 1 kHz.

17. The method of claim 1 , wherein the laser radiation is continuous wave.

18. The method of claim 1 , wherein a thickness of the inorganic film ranges from about 10 nm to 100 micrometers.

19. The method of claim 1 , wherein the first, second or first and second substrates comprise an alkaline earth boro-aluminosilicate glass, alkali-aluminosilicate glass, soda-lime glass, born-silicate glass, thermally strengthened glass, chemically strengthened glass, and combinations thereof.

20. The method of claim 1 , further comprising the step of moving a laser spot formed by the laser radiation at a speed of approximately 1 mm/s to approximately 1000 mm/s to create a minimal heating zone.

21. The method of claim 20 , wherein the speed does not exceed the product of a diameter of the laser spot and a repetition rate of the laser radiation.

22. The method of claim 1 , wherein the step of bonding creates a bond line having a width of approximately 50 μm to approximately 1000 μm.

23. The method of claim 1 , wherein the inorganic film, first substrate, or second substrate are optically transparent before and after the step of bonding in a range of greater than 80%, between 80% to 90%, greater than 85%, or greater than 90% at about 420 nm to about 750 nm.

24. The method of claim 1 , wherein the workpiece is selected from the group consisting of a light emitting diode, an organic light emitting diode, a conductive lead, a semiconductor chip, an ITO lead, a patterned electrode, a continuous electrode, quantum dot materials, phosphor, and combinations thereof.

25. The method of claim 1 , wherein the step of bonding creates a bond having an integrated bond strength greater than an integrated bond strength of a residual stress field in the first substrate, second substrate or both the first and second substrates.

26. A bonded device comprising:
an inorganic film formed over a surface of a first substrate; and
a device protected between the first substrate and a second substrate wherein the inorganic film is in contact with the second substrate,
wherein the device includes a bond formed between the first and second substrates as a function of the composition of impurities in the first or second substrates and as a function of the composition of the inorganic film though a local heating of the inorganic film with laser radiation having a predetermined wavelength, and
wherein the inorganic film, the first substrate, or the second substrate are transmissive at approximately 420 nm to approximately 750 nm.

27. The device of claim 26 , wherein each of the inorganic film, first substrate and second substrate are transmissive at approximately 420 nm to approximately 750 nm.

28. The device of claim 26 , wherein absorption of the inorganic film is more than 10% at a predetermined laser wavelength.

29. The device of claim 26 , wherein the composition of the inorganic film is selected from the group consisting of SnO 2 , ZnO, TiO 2 , ITO, Zn, Ti, Ce, Pb, Fe, Va, Cr, Mn, Mg, Ge, SnF 2 , ZnF 2 and combinations thereof.

30. The device of claim 26 , wherein the composition of the inorganic film is selected to lower the activation energy for inducing creep flow of the first substrate, the second substrate, or both the first and second substrates.

31. The device of claim 26 , wherein the composition of the inorganic film is a laser absorbing low liquidus temperature material with a liquidus temperature less than or equal to about 1000° C.

32. The device of claim 26 , wherein the composition of the inorganic film comprises:
20-100 mol % SnO;
0-50 mol % SnF 2 ; and
0-30 mol % P 2 O 5 or B 2 O 3 .

33. The device of claim 26 , wherein the inorganic film and the first and second substrates have a combined internal transmission of more than 80% at approximately 420 nm to approximately 750 nm.

34. The device of claim 26 , wherein the impurities in the first or second substrates are selected from the group consisting of As, Fe, Ga, K, Mn, Na, P, Sb, Ti, Zn, Sn and combinatio

Assignees

• Corning Inc

Inventors

• Dabich Ii Leonard Charles
• Logunov Stephan Lvovich
• Quesada Mark Alejandro
• Streltsov Alexander Mikhailovich

Classifications

• H10K50/8426

  Peripheral sealing arrangements, e.g. adhesives, sealants · CPC title

• C03C3/12 Primary

  Silica-free oxide glass compositions · CPC title

• C03B23/203

  Uniting glass sheets (C03B23/24 takes precedence) · CPC title

• C03C3/23

  containing halogen and at least one oxide, e.g. oxide of boron · CPC title

• B32B2250/03

  3 layers · CPC title