Method for purifying hydrogen peroxide

Patent metadata

Field	Value
Publication number	US-12258268-B2
Application number	US-201917269006-A
Country	US
Kind code	B2
Filing date	Jan 25, 2019
Priority date	Aug 17, 2018
Publication date	Mar 25, 2025
Grant date	Mar 25, 2025

Abstract

The present invention relates to a method for purifying hydrogen peroxide, and more particularly, to a method including purifying a crude product of hydrogen peroxide using a primary purification system, and purifying a primarily purified hydrogen peroxide solution using a secondary purification system. One of the primary purification system and the secondary purification system includes an electrodeionization system, and the other one of the primary purification system and the secondary purification system includes at least one from among a distillation system, a resin system, a reverse osmosis system, and a combination system thereof.

First claim

The invention claimed is:

1. A method for purifying hydrogen peroxide, the method comprising:
purifying a crude product of hydrogen peroxide using a primary purification system;
allowing a primarily purified hydrogen peroxide solution to pass through a heat exchanger; and
purifying the primarily purified hydrogen peroxide solution using an electrodeionization system, wherein:
the primary purification system includes at least one from among a distillation system, a resin system, a reverse osmosis system, and a combination system thereof,
the heat exchanger is configured to adjust the temperature of the primarily purified hydrogen peroxide solution to prevent excessive oxygen generation in the electrodeionization system, and
the heat exchanger adjusts the temperature of the primarily purified hydrogen peroxide solution to a range from −20° C. to 20° C.

2. The method of claim 1 , wherein the electrodeionization system comprises:
a first electrode and a second electrode;
a first concentrate chamber, a second concentrate chamber, and a dilute chamber between the first and second concentrate chambers;
an ion exchange resin provided inside the dilute chamber;
an anion exchange membrane between the first concentrate chamber and the dilute chamber; and
a cation exchange membrane between the second concentrate chamber and the dilute chamber.

3. The method of claim 2 , wherein:
direct current power is applied to the first electrode and the second electrode;
anion impurities in the hydrogen peroxide solution inside the dilute chamber pass through the anion exchange membrane and move to the first concentrate chamber; and
cation impurities in the hydrogen peroxide solution in the dilute chamber pass through the cation exchange membrane and move to the second concentrate chamber.

4. The method of claim 2 , wherein:
a first concentrate and a second concentrate are respectively introduced into the first concentrate chamber and the second concentrate chamber; and
the first concentrate and the second concentrate are water.

5. The method of claim 1 , wherein the purifying of using the primary purification system comprises:
performing a distillation process on a crude product of hydrogen peroxide; and
purifying a resin process on a distilled hydrogen peroxide solution.

6. The method of claim 1 , wherein the purifying of using the primary purification system comprises:
performing a resin process on a crude product of hydrogen peroxide; and
performing a reverse osmosis process on a hydrogen peroxide solution which has been subjected to the resin process.

7. The method of claim 1 , wherein the electrodeionization system comprises a cooling system for cooling the hydrogen peroxide solution.

8. A method for manufacturing a semiconductor device, the method comprising:
purifying a crude product of hydrogen peroxide using a primary purification system;
allowing a primarily purified hydrogen peroxide solution to pass through a heat exchanger;
purifying the primarily purified hydrogen peroxide solution using an electrodeionization system; and
performing a cleaning process on a semiconductor substrate using the purified hydrogen peroxide, wherein:
the primary purification system includes at least one from among a distillation system, a resin system, a reverse osmosis system, and a combination system thereof,
the heat exchanger is configured to adjust the temperature of the primarily purified hydrogen peroxide solution to prevent excessive oxygen generation in the electrodeionization system, and
the heat exchanger adjusts the temperature of the primarily purified hydrogen peroxide solution to a range from −20° C. to 20° C.

Assignees

• Oci Co Ltd

Inventors

• Kim Deokyun
• Kim Hyejin
• Kim Kyungyeol
• Kim Yongil

Classifications

• H10P70/00

  Cleaning of wafers, substrates or parts of devices · CPC title

• B01D61/42

  Electrodialysis; Electro-osmosis {; Electro-ultrafiltration; Membrane capacitive deionization} · CPC title

• B08B3/08 Primary

  the liquid having chemical or dissolving effect · CPC title

• B01D2317/025

  Permeate series · CPC title

• B01D2313/40

  Adsorbents within the flow path · CPC title