Control apparatus, imprint apparatus, and method of manufacturing article

US12246482B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12246482-B2
Application numberUS-202117410191-A
CountryUS
Kind codeB2
Filing dateAug 24, 2021
Priority dateAug 28, 2020
Publication dateMar 11, 2025
Grant dateMar 11, 2025

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A control apparatus which controls a force applied to an object, includes a driver configured to apply the force to the object, an estimator configured to estimate, based on information related to a state of the object, an estimated value of a disturbance force to be applied to the object, a corrector configured to correct, based on the estimated value, a command value provided to the driver so as to reduce an influence of the disturbance force, and a determiner configured to execute processing for determining a plurality of parameter values to be used by the estimator to obtain the estimated value based on the information.

First claim

Opening claim text (preview).

What is claimed is: 1. A control apparatus that controls a force applied to an object, comprising: a driver configured to apply the force to the object; an estimator configured to estimate, based on information related to a state of the object, a disturbance force to be applied to the object via a member connected to the object, using a model that includes a plurality of parameter values indicating one or more characteristics of an attenuation and a stiffness regarding the member; and a corrector configured to correct a command value provided to the driver so as to reduce an influence of the disturbance force estimated by the estimator, wherein the model includes a three element model comprising a first spring having a first end connected to the object, and a second spring and a damper which are arranged in parallel and serially connected to a second end of the first spring. 2. The apparatus according to claim 1 , wherein the member is directly connected or indirectly connected to the object. 3. The apparatus according to claim 1 , further comprising: a measurement unit configured to measure the information. 4. The apparatus according to claim 1 , further comprising: a determiner configured to determine the plurality of parameter values to be used by the estimator; and an acquirer configured to acquire the disturbance force, wherein the determiner determines, based on the disturbance force acquired by the acquirer, the plurality of parameter values through machine learning. 5. The apparatus according to claim 4 , wherein in position feedback control in which the driver is operated based on a difference between a position command value for commanding a position of the object and a measured value of the position of the object so that the position command value and the measured value will match, the acquirer acquires the disturbance force based on the difference and the measured value. 6. The apparatus according to claim 4 , wherein the machine learning is unsupervised learning. 7. The apparatus according to claim 6 , wherein in the unsupervised learning, one of a mean squared error, an average mean squared error, a mean absolute error, and a mean squared logarithmic error is used as a loss function. 8. The apparatus according to claim 4 , wherein the machine learning is reinforcement learning. 9. The apparatus according to claim 8 , wherein in the reinforcement learning, a reciprocal of one of a mean squared error, an average mean squared error, a mean absolute error, and a mean squared logarithmic error is used as a reward. 10. The apparatus according to claim 1 , wherein the apparatus is incorporated in an imprint apparatus configured to bring a mold into contact with an imprint material on a substrate and to cure the imprint material to form a pattern made of a cured product of the imprint material. 11. The apparatus according to claim 10 , wherein a force applied to a mold holder configured to hold the mold is controlled as the force to be applied to the object. 12. The apparatus according to claim 1 , wherein the information includes information related to a displacement of the object. 13. The apparatus according to claim 1 , wherein the member includes a plurality of elements, and the model includes a plurality of three element models respectively corresponding to the plurality of elements. 14. An imprint apparatus that brings a mold into contact with an imprint material on a substrate and cures the imprint material to form a pattern made of a cured product of the imprint material, comprising: a mold holder configured to hold the mold; a driver configured to apply a force to the mold holder; an estimator configured to estimate, based on information related to a state of the mold holder, a disturbance force to be applied to the mold holder via a member connected to the mold holder, using a model that includes a plurality of parameter values indicating one or more characteristics of an attenuation and a stiffness regarding the member; and a corrector configured to correct a command value provided to the driver so as to reduce an influence of the disturbance force estimated by the estimator, wherein the model includes a three element model comprising a first spring having a first end connected to the object, and a second spring and a damper which are arranged in parallel and serially connected to a second end of the first spring. 15. The apparatus according to claim 14 , wherein the member is directly connected or indirectly connected to the mold holder. 16. The apparatus according to claim 14 , further comprising: a measurement unit configured to measure the information. 17. The apparatus according to claim 14 , further comprising: an acquirer configured to acquire the disturbance force, wherein the determiner determines, based on the disturbance force acquired by the acquirer, the plurality of parameter values through machine learning. 18. The apparatus according to claim 17 , wherein in position feedback control in which the driver is operated based on a difference between a position command value for commanding a position of the object and a measured value of the position of the object so that the position command value and the measured value will match, the acquirer acquires the disturbance force based on the difference and the measured value. 19. A method of manufacturing an article, comprising: forming a pattern on a substrate by using an imprint apparatus according to claim 14 ; and processing the substrate on which the pattern is formed in the forming.

Assignees

Inventors

Classifications

  • characterised by multiple measurements, corrections, marking or sorting processes · CPC title

  • characterised by the use of electric means · CPC title

  • characterised by control arrangements for compensation, e.g. for backlash, overshoot, tool offset, tool wear, temperature, machine construction errors, load, inertia (G05B19/19, G05B19/41 take precedence) · CPC title

  • Control of mechanical oscillations, e.g. of amplitude, of frequency, of phase · CPC title

  • Machine learning · CPC title

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What does patent US12246482B2 cover?
A control apparatus which controls a force applied to an object, includes a driver configured to apply the force to the object, an estimator configured to estimate, based on information related to a state of the object, an estimated value of a disturbance force to be applied to the object, a corrector configured to correct, based on the estimated value, a command value provided to the driver so…
Who is the assignee on this patent?
Canon Kk
What technology area does this patent fall under?
Primary CPC classification B29C59/002. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Mar 11 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).