Lithography apparatus, and method of manufacturing article

Patent metadata

Field	Value
Publication number	US-9977346-B2
Application number	US-201715428488-A
Country	US
Kind code	B2
Filing date	Feb 9, 2017
Priority date	Feb 19, 2016
Publication date	May 22, 2018
Grant date	May 22, 2018

Abstract

The present invention provides a lithography apparatus which performs a process of forming a pattern on a substrate, the apparatus comprising a processing device configured to perform the process, an actuator configured to exert an action to the processing device, a detector configured to detect vibrations of a support for supporting the processing device, and a controller configured to control the actuator, wherein the controller is configured to perform an estimation of vibration transferred from the processing device to the detector, and control the actuator based on vibration obtained by the estimation and vibration detected by the detector.

First claim

What is claimed is:

1. A lithography apparatus comprising:
a first processing device supported by a base and configured to form a pattern on a substrate;
a first actuator configured to exert an action to the first processing device;
a detector configured to detect vibrations of the base at a position between the first processing device and a first mechanism supported by the base; and
a first controller configured to control the first actuator to reduce vibrations generated in the mechanism and transferred to the first processing device through the base,
wherein the first controller is configured to estimate a first signal component, caused by vibrations generated in the first processing device and transferred to the base, of an output signal from the detector, and control the first actuator based on a first signal obtained by removing the estimated first signal component from the output signal.

2. The apparatus according to claim 1 , wherein the vibrations transferred from the first processing device to the base and the vibrations transferred from the first mechanism to the base have a frequency common thereto.

3. The apparatus according to claim 1 , wherein each of the first processing device and the first mechanism includes a driving device for driving a movable object, as a vibration source.

4. The apparatus according to claim 3 , wherein the first controller has information of a transfer function for estimating the first signal component based on a command value to be supplied to the driving device included in the first processing device.

5. The apparatus according to claim 4 , wherein the first controller is configured to obtain the information of the transfer function based on vibrations detected by the detector in a case where the driving device included in the first processing device generates vibrations.

6. The apparatus according to claim 1 , wherein the first controller is configured to control the actuator to reduce vibrations, that transfer to the first processing device, of the vibrations detected by the detector.

7. The apparatus according to claim 1 , wherein the detector is configured to detect vibrations at a portion of the base located closer to the first mechanism than to the first processing device.

8. The apparatus according to claim 1 , further comprising:
a second processing device supported by the base and configured to form a pattern on a substrate;
a second actuator configured to exert an action to the second processing device; and
a second controller configured to control the second actuator to reduce vibrations generated in the first processing apparatus and transferred to the second processing device through the base,
wherein the second controller is configured to estimate a second signal component caused by vibrations generated in the second processing device and transferred to the base, of the output signal from the detector, and control the second actuator based on a second signal obtained by removing the estimated second signal component from the output signal.

9. The apparatus according to claim 1 , wherein:
the first controller is configured to estimate a second signal component caused by vibrations generated in a second mechanism and transferred to the base, of the output signal from the detector, and control the first actuator-based on a second signal obtained by further removing the estimated second signal component from the output signal, and
the second mechanism is supported by the base, and the first processing device is located between the first mechanism and the second mechanism.

10. A method of manufacturing an article, the method comprising the steps of:
forming a pattern on a substrate using a lithography apparatus; and
processing the substrate, on which the pattern has been formed, to manufacture the article,
wherein the lithography apparatus includes:
a processing device configured to form the pattern;
an actuator configured to exert an action to the processing device;
a detector configured to detect vibrations of the base at a position between the processing device and a mechanism supported by the base; and
a controller configured to control the actuator to reduce vibrations generated in the mechanism and transferred to the processing device through the base,
wherein the controller is configured to estimate a signal component, caused by vibrations generated in the processing device and transferred to the base, of an output signal from the detector, and control the actuator based on a signal obtained by removing the estimated signal component from the output signal.

11. The apparatus according to claim 1 , wherein:
the first processing device forms the pattern on the substrate by transferring a pattern formed in an original onto the substrate, and
the first processing device includes a first driving device that drives the original and a second driving device that drives the substrate, as vibration sources.

12. The apparatus according to claim 1 , further comprising:
the first mechanism,
wherein the first mechanism includes a second processing device supported by the base and configured to form a pattern on a substrate.

13. The apparatus according to claim 1 , wherein the first controller is configured to control the first actuator to exert an action to the first processing device at a timing when vibrations generated in the first mechanism and detected by the detector is to be transferred to the first processing unit.

14. The apparatus according to claim 1 , wherein the output signal from the detector includes the first signal component and a second signal component, the first signal component being caused by vibrations generated in the first processing device and transferred to the base, and the second signal component being caused by vibrations generated in the first mechanism and transferred to the base.

Assignees

• Canon Kk

Inventors

• Okada Tetsuji
• Asano Tosiya
• Maruyama Naoki

Classifications

• G03F7/70725 Primary

  control · CPC title

• G03F7/0002 Primary

  Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title

• G03F7/709

  Vibration, e.g. vibration detection, compensation, suppression or isolation · CPC title