Fittings for wafer cleaning systems

US12237179B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12237179-B2
Application numberUS-202217671664-A
CountryUS
Kind codeB2
Filing dateFeb 15, 2022
Priority dateAug 12, 2021
Publication dateFeb 25, 2025
Grant dateFeb 25, 2025

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A fitting for an upper brush in a double brush scrubbing chamber of a wafer cleaning system is disclosed. The fitting includes a base plate, a flanged pipe, and a threaded connector. The base plate includes a threaded hole with a stop surface therein and a channel extending from the stop surface through a lower surface of the base plate. The flanged pipe is inserted into the base plate such that the flange at the top end of a hollow tube rests on the stop surface and the hollow tube passes through the channel of the base plate. The threaded connector has a passage therethrough, and engages the threaded hole of the base plate to fix the flanged pipe in place. This structure is able to provide fluid while minimizing particle generation.

First claim

Opening claim text (preview).

What is claimed is: 1. A wafer cleaning system, comprising: a brush scrubbing chamber having an upper brush that is attached to a rotatable shaft of an upper arm; and a fitting attached to a support bar of the upper arm, the fitting comprising: a base plate comprising a threaded hole with a stop surface therein and a channel extending from the stop surface through a lower surface of the base plate; a flanged pipe comprising a hollow tube and a flange at a top end of the hollow tube, inserted into the base plate such that the flange rests on the stop surface and the hollow tube passes through the channel of the base plate and into the rotatable shaft; and a threaded connector having a passage therethrough, the threaded connector engaging the threaded hole of the base plate to fix the flanged pipe in place; wherein the flanged pipe cannot contact the upper brush. 2. The system of claim 1 , further comprising a liquid source configured to provide liquid through the passage of the threaded connector and the hollow tube of the flanged pipe. 3. The system of claim 1 , further comprising a washer between the flanged pipe and the threaded connector. 4. The system of claim 1 , wherein the hollow tube of the flanged pipe has a length of about 5 cm to about 11 cm. 5. The system of claim 1 , wherein the flange of the flanged pipe has a diameter that is greater than a diameter of a bottom end of the hollow tube. 6. The system of claim 1 , wherein the flange of the flanged pipe has a diameter of up to about 27 mm. 7. The system of claim 1 , wherein the flanged pipe is made of steel, polyether ether ketone (PEEK), polypropylene, polyvinyl chloride (PVC) or glass. 8. The system of claim 1 , wherein the threaded connector is made of polytetrafluoroethylene, a rubber, or steel. 9. A method of assembling an upper arm for an upper brush, comprising: inserting a flanged pipe into a threaded hole of a base plate such that a flange of the flanged pipe rests on a stop surface of the base plate and so that a hollow tube of the flanged pipe passes through a channel of the base plate and out a lower surface of the base plate; inserting a threaded connector into the threaded hole to fix the flanged pipe in place; fastening the base plate to a support bar. 10. The method of claim 9 , further comprising connecting a pipe from a fluid source to provide fluid through a passage of the threaded connector and the hollow tube of the flanged pipe. 11. The method of claim 9 , further comprising inserting a washer into the threaded hole prior to inserting the threaded connector. 12. The method of claim 9 , wherein the hollow tube of the flanged pipe has a length of about 5 cm to about 11 cm. 13. The method of claim 9 , wherein the flange of the flanged pipe has a diameter that is greater than a diameter of a bottom end of the hollow tube. 14. The method of claim 9 , wherein the flange of the flanged pipe has a diameter of up to about 27 mm. 15. The method of claim 9 , wherein the flanged pipe is made of steel, polyether ether ketone (PEEK), polypropylene, polyvinyl chloride (PVC) or glass. 16. The method of claim 9 , wherein the threaded connector is made of polytetrafluoroethylene, a rubber, or steel. 17. A method of cleaning a wafer surface in a scrubbing chamber of a wafer cleaning system, comprising: providing a washing fluid through a fitting comprising: a base plate comprising a threaded hole with a stop surface therein and a channel extending from the stop surface through a lower surface of the base plate; a flanged pipe comprising a hollow tube and a flange at an end of the hollow tube, inserted into the base plate such that the flange rests on the stop surface and the hollow tube passes through the channel of the base plate; and a threaded connector having a hole therethrough, the threaded connector engaging the threaded hole to fix the flanged pipe in place; wherein the flanged pipe is fixed in place and cannot contact an upper brush within the double brush scrubbing chamber; and scrubbing the wafer surface with the upper brush. 18. The method of claim 17 , wherein the hollow tube of the flanged pipe has a length of about 5 cm to about 11 cm. 19. The method of claim 17 , wherein the flange of the flanged pipe has a diameter that is greater than a diameter of a bottom end of the hollow tube. 20. The method of claim 17 , wherein the flange of the flanged pipe has a diameter of up to about 27 mm.

Assignees

Inventors

Classifications

  • using mainly scrubbing means, e.g. brushes · CPC title

  • rotating about an axis orthogonal to the surface · CPC title

  • Brushes · CPC title

  • characterised by how the flanges are joined to, or form an extension of, the pipes · CPC title

  • the pipe ends having integral collars or flanges · CPC title

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What does patent US12237179B2 cover?
A fitting for an upper brush in a double brush scrubbing chamber of a wafer cleaning system is disclosed. The fitting includes a base plate, a flanged pipe, and a threaded connector. The base plate includes a threaded hole with a stop surface therein and a channel extending from the stop surface through a lower surface of the base plate. The flanged pipe is inserted into the base plate such tha…
Who is the assignee on this patent?
Taiwan Semiconductor Mfg Co Ltd, Taiwan Semiconductor Mfg Co Ltd
What technology area does this patent fall under?
Primary CPC classification H10P72/0412. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Feb 25 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).