Substrate support assembly with deposited surface features
US-2020243368-A1 · Jul 30, 2020 · US
Electrostatic chuck with mesas
US12224198B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12224198-B2 |
| Application number | US-202418584937-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 22, 2024 |
| Priority date | Apr 15, 2021 |
| Publication date | Feb 11, 2025 |
| Grant date | Feb 11, 2025 |
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- Title
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Abstract
Official abstract text for this publication.
Electrostatic chucks (ESCs) for plasma processing chambers, and methods of fabricating ESCs, are described. In an example, a substrate support assembly includes a ceramic top plate having a top surface with a processing region. One or more electrodes is within the ceramic top plate. A plurality of mesas is within the processing region and on the top surface of the ceramic plate or vertically over an edge of one of the one or more electrodes.
First claim
Opening claim text (preview).
What is claimed is: 1. A substrate support assembly, comprising: a ceramic top plate having a top surface with a processing region; one or more electrodes within the ceramic top plate; and a plurality of mesas within the processing region and on the top surface of the ceramic top plate, wherein all of the plurality of mesas are fully over a corresponding one of the one or more electrodes. 2. The substrate support assembly of claim 1 , wherein the plurality of mesas is continuous with the top surface of the ceramic top plate. 3. The substrate support assembly of claim 1 , wherein the ceramic top plate comprises aluminum nitride. 4. The substrate support assembly of claim 1 , wherein the ceramic top plate comprises aluminum oxide. 5. The substrate support assembly of claim 1 , wherein the one or more electrodes comprise molybdenum. 6. A substrate support assembly, comprising: a ceramic top plate having a top surface with a processing region; a molybdenum mesh within the ceramic top plate; and a plurality of mesas within the processing region and on the top surface of the ceramic top plate, wherein all of the plurality of mesas are fully over the molybdenum mesh. 7. The substrate support assembly of claim 6 , wherein the ceramic top plate comprises aluminum nitride. 8. The substrate support assembly of claim 6 , wherein the ceramic top plate comprises aluminum oxide. 9. A substrate support assembly, comprising: a ceramic top plate having a top surface with a processing region, the top surface having one or more high topography regions and one or more electrodes within the ceramic top plate; and a plurality of mesas within the processing region and on the top surface of the ceramic top plate, wherein all of the plurality of mesas are fully over a corresponding one of the one or more electrodes. 10. The substrate support assembly of claim 9 , wherein the plurality of mesas is continuous with the top surface of the ceramic top plate. 11. The substrate support assembly of claim 9 , wherein the ceramic top plate comprises aluminum nitride. 12. The substrate support assembly of claim 9 , wherein the ceramic top plate comprises aluminum oxide. 13. The substrate support assembly of claim 9 , further comprising one or more electrodes comprising molybdenum. 14. A substrate support assembly, comprising: a ceramic top plate having a top surface with a processing region, the top surface having one or more stress regions; one or more electrodes within the ceramic top plate; and a plurality of mesas within the processing region and on the top surface of the ceramic top plate, wherein all of the plurality of mesas are fully over a corresponding one of the one or more electrodes. 15. The substrate support assembly of claim 14 , wherein the plurality of mesas is continuous with the top surface of the ceramic top plate. 16. The substrate support assembly of claim 14 , wherein the ceramic top plate comprises aluminum nitride. 17. The substrate support assembly of claim 14 , wherein the ceramic top plate comprises aluminum oxide. 18. The substrate support assembly of claim 14 , further comprising one or more electrodes comprising molybdenum.
Assignees
Inventors
Classifications
characterised by a coating, a hardness or a material · CPC title
- H10P72/722Primary
Details of electrostatic chucks · CPC title
- H01J37/32715Primary
Workpiece holder · CPC title
Electricity · mapped topic
- H01L21/6833Primary
Electricity · mapped topic
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Frequently asked questions
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- What does patent US12224198B2 cover?
- Electrostatic chucks (ESCs) for plasma processing chambers, and methods of fabricating ESCs, are described. In an example, a substrate support assembly includes a ceramic top plate having a top surface with a processing region. One or more electrodes is within the ceramic top plate. A plurality of mesas is within the processing region and on the top surface of the ceramic plate or vertically ov…
- Who is the assignee on this patent?
- Applied Materials Inc
- What technology area does this patent fall under?
- Primary CPC classification H10P72/722. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Feb 11 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 5 related publications on this page (citations in our corpus or others sharing the same primary CPC).