CVD system with flange assembly for facilitating uniform and laminar flow

Patent metadata

Field	Value
Publication number	US-12221695-B2
Application number	US-202117305209-A
Country	US
Kind code	B2
Filing date	Jul 1, 2021
Priority date	May 18, 2021
Publication date	Feb 11, 2025
Grant date	Feb 11, 2025

Abstract

A first and a second flange assembly configured for facilitating uniform and laminar flow in a system are provided. The first flange assembly includes a first flange body configured to introduce a gas into a chamber. The first flange assembly includes a plurality of outlet tubes disposed on an interior surface of the first flange body and a plurality of inlet tubes disposed on an exterior surface of the first flange body and in fluid communication with the plurality of outlet tubes. The second flange assembly includes a second flange body configured to remove the gas from the chamber. The second flange assembly includes a plurality of through holes extending from an interior surface to an exterior surface of the second flange body and a plurality of exit tubes extending from the exterior surface of the second flange body and in fluid communication with the plurality of through holes.

First claim

The invention claimed is:

1. A flange assembly for introducing at least one gas into a chemical vapor deposition chamber, the flange assembly comprising:
a flange body disposed proximate a chemical vapor deposition process chamber, wherein the flange body defines a length and has an interior surface and an exterior surface;
a plurality of outlet tubes disposed on the interior surface of the flange body; and
a plurality of inlet tubes disposed on the exterior surface of the flange body, each inlet tube having a first end and a second end, wherein each inlet tube is in fluid communication with a corresponding outlet tube via the second end of the inlet tube, wherein the first end of each inlet tube is configured to be connected to a supply of the at least one gas,
wherein each outlet tube is configured to output the at least one gas into the chemical vapor deposition chamber for conducting a chemical vapor deposition process, and
wherein the plurality of inlet tubes extends radially outward from the exterior surface of the flange body.

2. The flange assembly of claim 1 , wherein the plurality of outlet tubes is circumferentially disposed on the interior surface of the flange body and extends along the length of the flange body.

3. The flange assembly of claim 1 , wherein a diameter of each outlet tube is greater than a diameter of each inlet tube.

4. The flange assembly of claim 3 , wherein the diameter of each outlet tube is at least two times the diameter of each inlet tube.

5. The flange assembly of claim 1 , wherein each outlet tube defines a first end and a second end, and wherein each outlet tube is configured to output the at least one gas into the chemical vapor deposition chamber via an opening at the second end.

6. The flange assembly of claim 1 , further comprising flexible bellows engaged with the flange body.

7. The flange assembly of claim 1 , further comprising an O-ring engaged with the flange body.

8. A chamber for conducting chemical vapor deposition, the chamber comprising:
a heating enclosure configured to maintain a substrate at a predefined temperature for conducting a chemical vapor deposition process within the chamber, wherein the heating enclosure comprises a body having a first end and a second end;
a first flange body disposed proximate the first end of the body of the heating enclosure and configured to introduce at least one gas into the chamber, wherein the first flange body defines a length and has an interior surface and an exterior surface;
a plurality of outlet tubes disposed on the interior surface of the first flange body;
a plurality of inlet tubes disposed on the exterior surface of the first flange body, each inlet tube having a first end and a second end, wherein each inlet tube is in fluid communication with a corresponding outlet tube via the second end of the inlet tube, wherein the first end of each inlet tube is configured to be connected to a supply of the at least one gas, wherein each outlet tube is configured to output the at least one gas into the chamber proximate the first end of the body of the heating enclosure, and wherein the plurality of inlet tubes extends radially outward from the exterior surface of the first flange body;
a second flange body disposed proximate the second end of the body of the heating enclosure and configured to remove the at least one gas from the chamber, wherein the second flange body has an interior surface and an exterior surface and defines a plurality of through holes between the interior surface and the exterior surface; and
a plurality of exit tubes extending from the exterior surface of the second flange body, wherein each of the exit tubes is aligned with a corresponding one of the plurality of through holes so as to be in fluid communication with an interior of the chamber,
wherein at least one of the plurality of exit tubes and corresponding through hole is positioned opposite another one of the plurality of exit tubes and corresponding through hole with respect to a midline of the second flange body, and
wherein the first flange body and the second flange body are configured to facilitate substantially uniform and laminar flow of the at least one gas over the substrate.

9. The chamber of claim 8 , wherein a diameter of each outlet tube is greater than a diameter of each inlet tube.

10. The chamber of claim 8 , wherein the plurality of outlet tubes is circumferentially disposed on the interior surface of the first flange body and extends along the length of the first flange body.

11. The chamber of claim 8 , wherein each outlet tube is further configured to output the at least one gas into the chamber via an opening at a second end.

12. The chamber of claim 8 , further comprising first flexible bellows engaged with the first flange body and second flexible bellows engaged with the second flange body.

13. The chamber of claim 8 , further comprising a first O-ring engaged with the first flange body and a second O-ring engaged with the second flange body.

14. The chamber of claim 8 , wherein at least one of the plurality of exit tubes is connected to another one of the plurality of exit tubes via a first intermediate tube and wherein the first intermediate tube is in fluid communication with a pump.

15. The flange assembly of claim 1 , wherein the plurality of outlet tubes extends along the length of the flange body such that the at least one gas flows parallel to the length of the flange body.

16. The flange assembly of claim 1 , wherein the flange body is cylindrical.

17. The flange assembly of claim 1 , wherein the diameter of each outlet tube of the plurality of outlet tubes varies along the length of the outlet tube, and wherein the diameter of each inlet tube of the plurality of inlet tubes varies along the length of the inlet tube.

18. The chamber of claim 8 , wherein the plurality of outlet tubes extends along the length of the first flange body such that the at least one gas flows parallel to the length of the first flange body.

19. The chamber of claim 8 , wherein the first flange body is cylindrical.

20. The chamber of claim 8 , wherein the diameter of each outlet tube of the plurality of outlet tubes varies along the length of the outlet tube, and wherein the diameter of each inlet tube of the plurality of inlet tubes varies along the length of the inlet tube.

Assignees

• Mellanox Technologies Ltd
• Univ Bar Ilan
• Univ Ramot
• Simtal Nano Coatings Ltd

Inventors

• Mentovich Elad
• Rotem Yaniv
• Gridish Yaakov
• Naveh Doron
• Stern Chen
• Ben-Naim Yosi
• Ismach Ariel
• Bar-Rabi Eran
• Kaufman Tal

Classifications

• F15D1/06

  by influencing the boundary layer · CPC title

• C23C16/46

  characterised by the method used for heating the substrate (C23C16/48, C23C16/50 take precedence) · CPC title

• C23C16/45591

  Fixed means, e.g. wings, baffles · CPC title

• C23C16/45563

  Gas nozzles · CPC title

• C23C16/45561

  Gas plumbing upstream of the reaction chamber · CPC title