Smoothing surface roughness using atomic layer deposition

Patent metadata

Field	Value
Publication number	US-12215419-B2
Application number	US-202217733575-A
Country	US
Kind code	B2
Filing date	Apr 29, 2022
Priority date	Apr 29, 2022
Publication date	Feb 4, 2025
Grant date	Feb 4, 2025

Abstract

Methods of producing an optical surface atop an exterior of a substrate that includes smoothing the exterior using an ALD process to sequentially deposit ALD layers to produce one or more ALD films that fill spaces between spaced-apart asperities existing on the exterior, and thereafter depositing a reflective material on the smoothed exterior of the substrate to produce the optical surface. The smoothing resulting from depositing the ALD film on the exterior of the substrate causes the grain size of the reflective material to be reduced in comparison to the grain size that would exists without having deposited the ALD film on the exterior of the substrate. The smoothing is sufficient to cause a reduction in grain size that results in a reduction in plasmon absorption in the optical surface in comparison to the plasmon absorption that would otherwise exist without having reduced the grain size of the reflective material.

First claim

What is claimed is:

1. A method of producing an optical surface, the method comprising:
obtaining a substrate having an exterior above which the optical surface is to reside, the exterior including laterally spaced-apart asperities having peaks which are spaced <1000 nm apart and affect optical performance of the produced optical surface absent a smoothing of the exterior surface;
smoothing the exterior of the substrate using an atomic layer deposition process to sequentially deposit a first plurality of ALD layers to produce an ALD film that fills spaces between the laterally spaced-apart asperities existing on the exterior surface; and
depositing a reflective material on a surface of the ALD film to produce the optical surface, the smoothing resulting from depositing the ALD film on the exterior of the substrate causing the grain size of the reflective material to be reduced in comparison to the grain size that would otherwise exists without having deposited the ALD film on the exterior of the substrate, the reduction in grain size of the reflective material causing a reduction in plasmon absorption in the optical surface in comparison to the plasmon absorption that would otherwise occur in the optical surface without having reduced the grain size of the reflective material.

2. The method of producing an optical surface according to claim 1 , wherein the first plurality of ALD layers are selected from the group consisting of Al 2 O 3 layers, SiO 2 layers, TiO 2 layers, ZrO 2 layers, ZnO and SiN x .

3. The method of producing an optical surface according to claim 1 , wherein the first plurality of ALD layers comprises layers of different metals.

4. The method of producing an optical surface according to claim 3 , wherein the layers of difference metals are selected from the group consisting of Al 2 O 3 layers, SiO 2 layers, TiO 2 layers, ZrO 2 layers, ZnO and SiN x .

5. The method of producing an optical surface according to claim 1 , wherein the reflective material is selected from the group consisting of silver, gold, aluminum, germanium and chromium.

6. The method of producing an optical surface according to claim 1 , wherein each of the laterally spaced-apart asperities has a peak, the ALD film having a thickness of no more than one half an average lateral distance between the peaks.

7. The method of producing an optical surface according to claim 6 , wherein the ALD film has a thickness of 3 nanometers to 400 nanometers.

8. The method of producing an optical surface according to claim 1 , further comprising an additional step of smoothing the exterior of the substrate prior to the depositing of the ALD film, the additional step of smoothing the exterior of the substrate comprising a chemical-mechanical polishing process.

9. The method of producing an optical surface according to claim 1 , further comprising an additional step of processing the exterior of the substrate prior to the depositing of the ALD film, the additional step of processing the exterior of the substrate comprising depositing one or more layers of metal on the exterior surface of the substrate using a chemical vapor deposition process.

10. The method of producing an optical surface according to claim 1 , further comprising an additional step of processing the exterior of the substrate prior to the depositing of the ALD film, the additional step of processing the exterior of the substrate comprising an ion-beam figuring process.

11. The method of producing an optical surface according to claim 1 , further comprising an additional step of processing the exterior of the substrate prior to the depositing of the ALD film, the additional step of processing the exterior of the substrate comprising depositing one or more layers of metal on the exterior surface of the substrate using a physical vapor deposition process.

12. The method of producing an optical surface according to claim 11 , wherein the metal is selected from the group consisting of silver, gold, aluminum, germanium and chromium.

13. The method of producing an optical surface according to claim 9 , wherein the metal is selected from the group consisting of silver, gold, aluminum, germanium and chromium.

14. The method of producing an optical surface according to claim 1 , further comprising:
a first step of determining the power spectral density of a surface topography of the exterior of the substrate that includes the ALD film surface as a function of spatial frequency after the smoothing of the exterior of the substrate using the atomic layer deposition process; and
a second step comprising comparing the power spectral density determined in the first step to a predetermined target power spectral density at one or more spatial frequencies, the predetermined target power spectral density at the one or more spatial frequencies corresponding to a target roughness of the exterior of the substrate before the step of depositing the reflective material.

15. The method of producing an optical surface according to claim 14 , wherein upon a determining that the exterior of the substrate that includes the ALD film surface has a roughness greater than the target roughness, smoothing the exterior of the substrate that includes the ALD film surface using the atomic layer deposition process to sequentially deposit a second plurality of ALD layers onto the exterior of the substrate that includes the ALD film surface prior to depositing the reflective material.

16. The method of producing an optical surface according to claim 14 , wherein the power spectral density at the one or more spatial frequencies is determined using atomic force microscopy.

17. A method of producing an optical surface, the method comprising:
obtaining a substrate having an exterior above which the optical surface is to reside, the exterior including laterally spaced-apart asperities;
smoothing the exterior of the substrate using an atomic layer deposition process to sequentially deposit a first plurality of ALD layers to produce an ALD film that fills spaces between the laterally spaced-apart asperities existing on the exterior surface;
a first step of determining the power spectral density of a surface topography of the exterior of the substrate that includes the ALD film surface as a function of spatial frequency after the smoothing of the exterior of the substrate using the atomic layer deposition process;
a second step comparing the power spectral density determined in the first step to a predetermined target power spectral density at one or more of the spatial frequencies, the predetermined target power spectral density at one or more spatial frequencies corresponding to a target roughness of the exterior of the substrate that includes the ALD film surface; and
only upon a determining that the exterior of the substrate that includes the ALD film surface has a roughness equal to or less than the target roughness, depositing a reflective material on the smoothed exterior of the substrate that includes the ALD film surface to produce the optical surface.

18. The method of producing an optical surface according to claim 17 , wherein upon a determining that the exterior of the substrate that includes the ALD film surface has a roughness greater than the target roughness, smoothing the exterior of the substrate that includes the ALD film surface using the atomic layer deposition process to sequentially deposit a second plurality of ALD layers onto the exterior of the substrate that includes the ALD film surface.

19. The method of producing an optica

Assignees

• Eagle Tech Llc
• Univ Of Colorado Boulder

Inventors

• Throckmorton James
• Myers Tyler
• Borrelli Rebecca
• O'Sullivan Malcolm
• Hatwar Tukaram
• George Steven M

Classifications

• C23C16/405

  of refractory metals or yttrium · CPC title

• C23C16/0254

  Physical treatment to alter the texture of the surface, e.g. scratching or polishing · CPC title

• C23C16/345

  Silicon nitride · CPC title

• C23C16/407

  of zinc, germanium, cadmium, indium, tin, thallium or bismuth · CPC title

• C23C28/042 Primary

  including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides · CPC title