Nanoparticle having dissociable protective group, nanoparticle layer patterning method and related application

Patent metadata

Field	Value
Publication number	US-12203019-B2
Application number	US-202318490221-A
Country	US
Kind code	B2
Filing date	Oct 19, 2023
Priority date	Nov 30, 2020
Publication date	Jan 21, 2025
Grant date	Jan 21, 2025

Abstract

The present disclosure discloses a nanoparticle having a ligand with a changeable polarity, a nanoparticle layer patterning method and related application. When the nanoparticle disclosed by the present disclosure is adopted to form a patterned nanoparticle layer on a substrate, a photosensitive material is added in the nanoparticle, then a protective group in a first ligand is dissociated to form an amino under the irradiation of light with a preset wavelength, a second ligand including an amino is formed on a surface of a nanometer particle, and a polarity of the second ligand is different from a polarity of the first ligand; and the amino of the second ligand is cross-linked with an adjacent nanoparticle.

First claim

What is claimed is:

1. A nanoparticle, comprising:
a nanometer particle; and
a first ligand linked to a surface of the nanometer particle, wherein the first ligand comprises an amino protected by a protective group, a linking group linked with the amino protected by the protective group, and a coordinating group linked with the linking group;
wherein the protective group comprises at least one of:
tert-butoxycarbonyl,

wherein the linking group is (CH 2 ) n , and n is an integer from 2 to 6; or,
the linking group is of a structure containing a conjugate group, and comprises at least one

or,
the linking group is

and n is an integer from 2 to 6.

2. The nanoparticle according to claim 1 , wherein the coordinating group comprises at least one of: —NH 2 , —SH, —COOH, —P and —PO 2 .

3. The nanoparticle according to claim 1 , wherein the first ligand comprises at least one of

Boc represents tert-butoxycarbonyl, and represents the linking group linked with the amino and the coordinating group linked with the linking group.

4. The nanoparticle according to claim 1 , wherein the nanometer particle comprises at least one of CdS, CdSe, ZnSe, InP, PbS, CsPbCl 3 , CsPbBr 3 , CsPbI 3 , CdS/ZnS, CdSe/ZnS, CdSe/ZnSe, InP/ZnS, PbS/ZnS, CsPbCl 3 /ZnS, CsPbBr 3 /ZnS, CsPhI 3 /ZnS, ZnTeSe/ZnSe, ZnO, ZnMgO, ZnAlO and ZnLiO.

5. The nanoparticle according to claim 1 , wherein the first ligand is configured to dissociate the protective group under an action of a photosensitive material and irradiation of light with a preset wavelength so as to form a second ligand with an amino on the surface of the nanometer particle, and a polarity of the second ligand is different from a polarity of the first ligand.

6. A nanoparticle layer patterning method, comprising:
forming a film layer comprising the nanoparticles according to claim 1 on a substrate;
irradiating a reserved region of the film layer by adopting light with a preset wavelength; and
removing nanoparticles which are not irradiated by the light with the preset wavelength so as to form a patterned nanoparticle layer in the reserved region.

7. The patterning method according to claim 6 , wherein the film layer further comprises a photosensitive material;
wherein a product of the photosensitive material reacts with the first ligand under irradiation of the light with the preset wavelength to dissociate the protective group, a second ligand with an amino is formed on the surface of the nanometer particle, and a polarity of the second ligand is different from a polarity of the first ligand.

8. The patterning method according to claim 7 , wherein the photosensitive material is a photo acid generator; and
under the irradiation of the light with the preset wavelength, H + generated by the photo acid generator reacts with the first ligand to dissociate the protective group.

9. The patterning method according to claim 8 , wherein the photo acid generator comprises at least one of sulfonium salt, triazine, sulfonic ester and diazonium salt.

10. The patterning method according to claim 7 , wherein a mass of the photosensitive material accounts for 1% to 5% of a total mass of the photosensitive material and the nanoparticles.

11. The patterning method according to claim 6 , wherein the amino of the second ligand is linked with the adjacent nanoparticle under a coordinating action so as to cross-link the nanoparticles together.

12. The patterning method according to claim 6 , wherein the irradiating the reserved region of the film layer by adopting the light with the preset wavelength further comprises:
shielding the film layer by adopting a mask, wherein the mask comprises a light transmitting region and a light shielding region, and the light transmitting region corresponds to the reserved region irradiated by the light in the film layer.

13. The patterning method according to claim 6 , wherein the removing the nanoparticles which are not irradiated by the light with the preset wavelength further comprises:
cleaning the film layer irradiated by the light with the preset wavelength with a solvent, wherein the nanoparticles in a region, which is not irradiated by the light, in the film layer are dissolved in the solvent, and the nanoparticles in a nanoparticle reserved region are cross-linked and not dissolved in the solvent.

14. A method for preparing a light emitting device, comprising: preparing an anode, a nanoparticle layer and a cathode, wherein the nanoparticle layer is formed by adopting the nanoparticle layer patterning method according to claim 6 .

15. A light emitting device, comprising the nanoparticle according to claim 1 .

16. The light emitting device according to claim 15 , comprising an anode, a nanoparticle layer and a cathode which are laminated, wherein the nanoparticle layer comprises the nanoparticle according to claim 1 .

17. A nanoparticle, comprising:
a nanometer particle; and
a first ligand linked to a surface of the nanometer particle, wherein the first ligand comprises an amino protected by a protective group;
wherein the first ligand is configured to dissociate the protective group under an action of a photosensitive material and irradiation of light with a preset wavelength so as to form a second ligand with an amino on the surface of the nanometer particle, and a polarity of the second ligand is different from a polarity of the first ligand.

Assignees

• Beijing Boe Technology Dev Co Ltd
• Boe Technology Group Co Ltd

Inventors

• Chen Zhuo
• Wang Tieshi

Classifications

• H10K71/421

  using coherent electromagnetic radiation, e.g. laser annealing · CPC title

• H10K71/00

  Manufacture or treatment specially adapted for the organic devices covered by this subclass · CPC title

• H10K50/115

  comprising active inorganic nanostructures, e.g. luminescent quantum dots · CPC title

• B82Y20/00

  Nanooptics, e.g. quantum optics or photonic crystals · CPC title

• B82Y40/00

  Manufacture or treatment of nanostructures · CPC title