Method for manufacturing large-area volume grating via plasma grating direct writing

Patent metadata

Field	Value
Publication number	US-12202073-B2
Application number	US-202117528468-A
Country	US
Kind code	B2
Filing date	Nov 17, 2021
Priority date	Nov 17, 2020
Publication date	Jan 21, 2025
Grant date	Jan 21, 2025

Abstract

A method for manufacturing a large-area volume grating includes: (1) splitting a laser beam into two or more laser beams, converging the two or more laser beams into a sample at an angle less than 60° to form a first plasma grating; (2) moving the sample in a longitudinal direction of a plane vertical to the first plasma grating to etch out a first prefabricated volume grating; (3) moving the sample laterally to form a second plasma grating, an effective cross section of the first prefabricated volume grating partially overlapping with that of the second plasma grating, then moving the sample in a longitudinal direction of a plane vertical to the second plasma grating to etch out a second prefabricated volume; and (4) repeating steps (2) and (3) n times to obtain a volume grating in any size.

First claim

What is claimed is:

1. A method for manufacturing a large-area volume grating via plasma grating direct writing, comprising:
(1) splitting a laser beam output by an ultrafast pulse laser into two or more laser beams with equal power proportion via a splitting module, converging the two or more laser beams into a sample at an included angle θ less than 60° via a spatio-temporal synchronization module and a converging module, such that a first plasma grating is formed in the sample by interference of the two or more laser beams, the sample being fixed on an electronically controlled three-dimensional mobile platform;
(2) moving the sample in a longitudinal direction of a plane vertical to the first plasma grating to etch out a first prefabricated volume grating with an equivalent cross section to that of the first plasma grating;
(3) moving the sample laterally and keeping a distance from a focal point of the two or more laser beams to a front surface of the sample unchanged to form a second plasma grating at another position of the sample, an effective cross section of the first prefabricated volume grating partially overlapping with a cross section of the second plasma grating, then moving the sample in a longitudinal direction of a plane vertical to the second plasma grating to etch out a second prefabricated volume grating with an equivalent cross section to that of the second plasma grating; and
(4) repeating steps (2) and (3) n times to obtain a volume grating having a width W=n·w0, a length equal to a length L etched by each plasma grating in a cross section of the sample perpendicular to a propagation direction of the laser, and a depth equal to a length D of optical filaments of each plasma grating formed in the sample, wherein n represents a positive integer greater than 0, w0 represents an effective width of each plasma grating.

2. The method according to claim 1 , wherein the laser beam output by the ultrafast pulse laser is a femtosecond pulse laser beam, a picosecond pulse laser beam, or a femtosecond/picosecond pulse laser cluster.

3. The method according to claim 1 , wherein the splitting module is selected from a splitting slice, a micro-mirror array and a diffraction beam splitting device.

4. The method according to claim 1 , wherein the spatio-temporal synchronization module consists of a plurality of plane mirrors and an electronically controlled mobile platform, and is configured to adjust spatio-temporal interval of the two or more laser beams.

5. The method according to claim 1 , wherein the converging module is selected from a rounded lens, a cylindrical lens, a tapered lens, a micro-lens array or any combination thereof.

6. The method according to claim 1 , wherein the included angle θ refers to an angle between propagation directions of any two laser beams, a period/of each plasma grating formed by the interference of the two or more laser beams in the sample meets a formula: Λ=λ/2 sin (θ/2).

7. The method according to claim 1 , wherein the interference of the two or more laser beams comprises interference of two laser beams, such that a one-dimensional plasma grating is formed, or
the interference of the two or more laser beams comprises interference of three or four laser beams, such that a two-dimensional plasma grating is formed; or
the interference of the two or more laser beams comprises interference of five laser beams, such that a three-dimensional plasma grating is formed.

8. The method according to claim 1 , wherein each prefabricated volume grating is etched through once scan of the respective plasma grating in the sample, and each prefabricated volume grating has a width equal to the effective width w0 of the respective plasma grating, a length equal to a length L etched by the respective plasma grating in the cross section of the sample perpendicular to the propagation direction, and a depth equal to a length D of the optical filaments of the respective plasma grating formed in the sample.

9. The method according to claim 1 , further comprising:
changing the distance from the focal point of the two or more laser beams to the front surface of the sample, and then repeating the steps (2) to (3).

10. The method according to claim 1 , further comprising:
rotating the sample by 90°, and repeating the steps (2) to (3) to fabricate a two-dimensional grating.

11. The method according to claim 1 , wherein the sample is made of quartz glass, doped-glass or a transparent material.

12. The method according to claim 1 , further comprising:
applying the two or more laser beams to a surface of the sample to form a surface plasma grating, so as to fabricate a surface grating.

13. The method according to claim 12 , wherein the ultrafast pulse laser is a fundamental monochromatic field or a two-color laser field comprising a fundamental wave and a second harmonic.

14. The method according to claim 12 , further comprising:
applying an auxiliary gas near the focal point of the two or more laser beams when fabricating the surface grating,
wherein the auxiliary gas is a gas that is easier to ionize than air in a strong field.

15. The method according to claim 12 , further comprising:
applying an electrostatic field near the focal point of the two or more laser beams to guide and accelerate plasmas generated by the ultrafast pulse laser when fabricating the surface grating.

16. The method according to claim 12 , further comprising:
plating a metal oxide film or a silicon oxide film on the surface of the sample before fabricating the surface grating; and
exposing the sample to plasmas to obtain an ion-doped grating.

17. A non-transitory computer-readable storage medium having stored therein instructions that, when executed by a processor, causes the method according to claim 1 to be performed.

18. A device for manufacturing a large-area volume grating via plasma grating direct writing, comprising:
an ultrafast pulse laser, configured to emit an ultrafast laser beam;
a splitting module, configured to split the ultrafast laser beam into two or more laser beams;
a spatio-temporal synchronization module, configured to adjust spatio-temporal interval of the two or more laser beams;
a converging module, configured to converge the two or more laser beams into a sample at an included angle θ less than 60°, such that a first plasma grating is formed in the sample by interference of the two or more laser beams; and
a three-dimensional mobile platform, configured to:
(1) move the sample in a longitudinal direction of a plane vertical to the first plasma grating to etch out a first prefabricated volume grating with an equivalent cross section to that of the first plasma grating;
(2) move the sample laterally and keep a distance from a focal point of the two or more laser beams to a front surface of the sample unchanged to form a second plasma grating at another position of the sample, an effective cross section of the first prefabricated volume grating partially overlapping with a cross section of the second plasma grating; and
(3) move the sample in a longitudinal direction of a plane vertical to the second plasma grating to etch out a second prefabricated volume grating with an equivalent cross section to that of the second plasma grating, such that the sample is moved periodically to periodically manufacture prefabricated volumes to finally obtain a volume grating having a width W=n·w0, a length equal to a length L etched by each plasma grating in a cross section of the sample perpendicular to a propagation direction, and a depth e

Assignees

• Chongqing Institute Of East China Normal Univ
• Roi Optoelectronics Tech Co Ltd
• Univ East China Normal

Inventors

• Zeng Heping
• Nan Junyi
• Hu Mengyun

Classifications

• G02B5/1857 Primary

  using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams · CPC title

• B23K26/14

  using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor (B23K26/12 takes precedence) · CPC title

• B23K26/0861

  in at least three axial directions · CPC title

• B23K26/0673

  into independently operating sub-beams, e.g. beam multiplexing to provide laser beams for several stations · CPC title

• B23K26/0648

  comprising lenses · CPC title