Scatterometry with high harmonic generation (HHG) sources

Patent metadata

Field	Value
Publication number	US-12174009-B2
Application number	US-201917049641-A
Country	US
Kind code	B2
Filing date	Feb 24, 2019
Priority date	Apr 30, 2018
Publication date	Dec 24, 2024
Grant date	Dec 24, 2024

Abstract

A method for extending scatterometry measurements of periodic structures created on a substrate into the deep UV and soft X-ray regions of the electromagnetic spectrum is presented. The method comprises measuring the scattering of a high harmonic generated (HHG) beam, which is created by a driving laser, that is scattered from the structures on the substrate. The scattered HHG beam is measured by a spectrometer or a detector sensitive to HHG radiation. Also presented is a system for carrying out the method.

First claim

The invention claimed is:

1. A method of measuring in the UV, XUV, x-ray spectral region the reflectance of a sample comprised of structures created on a substrate as a function of incident angle, polarization, wavelength, the scattered light angle, and, in the case of a periodic structure, the diffraction order; the method comprising:
(a) providing a femtosecond laser system configured to produce amplified femtosecond pulses of light;
(b) passing the amplified femtosecond pulses of light through a polarization rotator configured to provide polarization scanning and control of the amplified femtosecond pulses;
(c) passing the amplified femtosecond pulses of light that have passed through the polarization rotator through focusing optics into a high harmonic generated (HHG) medium comprising one of: a gas jet, a semi-infinite gas cell, a gas-filled capillary, or a solid target, thereby generating a polarized spatially coherent HHG beam;
(d) directing the polarized spatially coherent HHG beam to fall on the sample;
(e) scanning the polarized spatially coherent HHG beam relative to the sample from which the polarized spatially coherent HHG beam is scattered/diffracted;
(f) directing a scattering/diffraction pattern of the polarized spatially coherent HHG beam that is scattered/diffracted by the sample to a grazing incidence XUV spectrometer;
(g) spectrally and spatially resolving the scattering/diffraction pattern of the polarized spatially coherent HHG beam that has been scattered/diffracted by the sample by a grating of the grazing incidence XUV spectrometer,
(h) measuring the intensity of the scattering/diffraction pattern of the polarized spatially coherent HHG beam that has been spectrally and spatially resolved by the grazing incidence XUV spectrometer with a XUV CCD camera or a microchannel plate whose backside phosphor screen is imaged onto a CCD camera or CMOS camera;
(i) repeating steps (a) to (h) for a well-calibrated sample for which the reflectance as a function of wavelength and polarization is known; and
(j) determining the reflectance of the sample from the measured intensity of the scattering/diffraction pattern from the sample and the measured intensity from the scattering/diffraction pattern and known reflectance of the well-calibrated sample;
wherein:
I) the polarization rotator is configured to be activated to scan the polarization of the amplified femtosecond pulses of light; and
II) scanning the polarized spatially coherent HHG beam relative to the sample is accomplished by mounting the sample on a stage that is configured to move the sample in the plane perpendicular to the polarized spatially coherent HHG beam propagation to facilitate measurement of a specific sample area and also to rotate the sample allowing the incident angle of the polarized spatially coherent HHG beam on the sample to be changed; thereby, allowing creation of a spatially coherent polarization-dependent scatterometry data set from different areas on the sample.

2. The method of claim 1 comprising the additional step of applying scatterometry algorithms to the reflectance determined in step (j) in order to determine properties of the structures created on the substrate.

3. The method of claim 1 , wherein the grazing incidence XUV spectrometer is replaced with one of the following:
(a) an XUV spectrometer;
(b) a deep UV spectrometer; and
(c) a soft X-ray spectrometer.

4. The method of claim 1 , wherein the scanning is at least one of linear and rotational.

5. A system for extending scatterometry measurements of periodic structures created on a substrate into the deep UV and soft X-ray regions of the electromagnetic spectrum, the system comprising:
a) a femtosecond laser system;
b) a polarization rotator;
c) a focusing lens;
d) a HHG medium;
e) a grazing incidence XUV spectrometer; and
f) an arrangement for scanning a HHG beam relative to a sample;

wherein:
i) the polarization rotator is configured to rotate the polarization of the laser beam coming from the femtosecond laser system;
ii) the HHG medium comprises one of: a gas jet, a semi-infinite gas cell, a gas-filled capillary, or a solid target;
iii) directing the laser beam coming from the femtosecond laser system through the polarization rotator and focusing the polarized laser beam into the HHG medium creates a polarized spatially coherent HHG beam;
iv) a grating of the grazing incidence XUV spectrometer is configured to spectrally and spatially resolve the scattering/diffraction pattern of the polarized spatially coherent HHG beam after it has been scattered/diffracted by the sample;
v) the polarization rotator is configured to be activated to scan the polarization of the amplified femtosecond pulses of light; and
vi) the arrangement for scanning the polarized coherent HHG beam relative to the sample comprises a stage on which the sample is mounted, the stage is configured to move the sample in the plane perpendicular to the polarized spatially coherent HHG beam propagation to facilitate measurement of a specific sample area and also to rotate the stage allowing the incident angle of the polarized spatially coherent HHG beam on the sample to be changed; thereby, allowing creation of a spatially coherent polarization-dependent scatterometry data set from different areas on the sample.

6. The system of claim 5 , wherein the grazing incidence XUV spectrometer is replaced with one of the following:
(a) an XUV spectrometer;
(b) a deep UV spectrometer; and
(c) a soft X-ray spectrometer.

7. The system of claim 5 comprising at least one of:
a) a spectral broadening apparatus;
b) a dispersion control assembly;
c) an optical parametric amplifier; and
d) HHG beam focusing optics.

8. The system of claim 7 , wherein the HHG focusing optics comprises at least one of reflective and diffractive elements.

Assignees

• B G Negev Technologies And Applications Ltd At Ben Gurion Univ

Inventors

• Frumker Evgeny

Classifications

• G02F1/354

  Third or higher harmonic generation · CPC title

• G01B11/02

  for measuring length, width or thickness (G01B11/08 takes precedence) · CPC title

• G01B11/0625

  with measurement of absorption or reflection · CPC title

• G01B2210/56

  Measuring geometric parameters of semiconductor structures, e.g. profile, critical dimensions or trench depth · CPC title

• G01B15/04 Primary

  for measuring contours or curvatures · CPC title