Aluminum member and method of manufacturing the same
US-2021002783-A1 · Jan 7, 2021 · US
US12173421B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12173421-B2 |
| Application number | US-202117382224-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 21, 2021 |
| Priority date | Jan 23, 2019 |
| Publication date | Dec 24, 2024 |
| Grant date | Dec 24, 2024 |
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Provided is an aluminum member including a base material containing aluminum or an aluminum alloy and an anodic oxide film having a barrier layer on the surface of the base material and a porous layer on the barrier layer, in which the anodic oxide film has a thickness of 100 μm or less, the porous layer contains S and P, the concentration of S, C S , and the concentration of P, C P , in the porous layer, measured by X-ray photoelectron spectroscopy, satisfy C S >C P over the depth direction from the surface of the anodic oxide film toward the base material.
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What is claimed is: 1. An aluminum member comprising: a base material containing aluminum or an aluminum alloy; and an anodic oxide film having a barrier layer on a surface of the base material and a porous layer on the barrier layer, wherein the anodic oxide film has a thickness of 100 μm or less, the porous layer contains S and P, and a concentration of S, C S , and a concentration of P, C P , in the porous layer, measured by X-ray photoelectron spectroscopy, satisfy C S >C P , first pores extending perpendicularly to a surface of the barrier layer lie on a barrier layer side of the porous layer, second pores lie on a surface side of the porous layer and extend in a thickness direction of the porous layer in such a way as to branch radially toward a surface of the porous layer, and the second pores communicate with the first pores. 2. The aluminum member according to claim 1 , wherein when in a depth direction from a surface of the anodic oxide film toward the base material, a region having a depth greater than 500 nm from a surface of the porous layer is defined as S1, and a region having a depth of 500 nm or less from the surface of the porous layer is defined as S2, an existing amount of a sulfide based on 2p orbital electrons in the region S1 measured by X-ray photoelectron spectroscopy, S1(2p), and an existing amount of the sulfid based on 2p orbital electrons in the region S2 measured by X-ray photoelectron spectroscopy, S2(2p), satisfy a relationship of S 1(2 p )/ S 2(2 p )=0.5 to 100. 3. The aluminum member according to claim 1 , wherein a peak of a spectrum based on 2p orbital electrons of S in a binding energy of 155 to 165 eV measured by X-ray photoelectron spectroscopy, exists in the porous layer in a range of a depth of 0.50 to 100 μm from a surface of the porous layer in a depth direction from a surface of the anodic oxide film toward the base material. 4. The aluminum member according to claim 1 , wherein the porous layer comprises a pore having a wall surface that makes an acute angle with the surface of the base material. 5. The aluminum member according to claim 1 , wherein a Hunter whiteness measured from a surface side of the anodic oxide film is 60 to 90. 6. A method of manufacturing the aluminum member according to claim 1 , comprising: preparing a base material containing aluminum or an aluminum alloy; and performing an anodic oxidation treatment on the base material in an electrolytic solution containing (a) a first acid containing S or a salt of the first acid, and (b) at least one second acid selected from the group consisting of diphosphoric acid, triphosphoric acid, and polyphosphoric acid, or a salt of the second acid. 7. The method of manufacturing the aluminum member according to claim 6 , wherein in performing the anodic oxidation treatment, a concentration of the first acid or the salt of the first acid in the electrolytic solution is 0.01 to 2.0 mol·dm −3 , and a concentration of the second acid or the salt of the second acid in the electrolytic solution is 0.01 to 5.0 mol·dm −3 . 8. The method of manufacturing the aluminum member according to claim 6 , wherein in performing the anodic oxidation treatment, the anodic oxidation treatment is performed under conditions of a current density of 5 to 30 mA·cm −2 and an electrolysis time of 10 to 600 minutes.
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