Boron nitride nanotubes and process for production thereof
US-9862604-B2 · Jan 9, 2018 · US
US12172889B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12172889-B2 |
| Application number | US-201917253749-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 11, 2019 |
| Priority date | Jul 11, 2018 |
| Publication date | Dec 24, 2024 |
| Grant date | Dec 24, 2024 |
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Provided is a process and an apparatus for purifying boron nitride nanotube (BNNT) materials. The process involves the use of a halogen gas to remove halogen-reactive impurities from boron nitride nanotube (BNNT) materials in a single step with minimal interactions to produce structurally pristine BNNT. Gaseous byproducts are produced that 5 can be removed without the need for solution phase treatments. Yield efficiencies and purity of recovered BNNT are high compared to the other known methods of purification for BNNT material.
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The invention claimed is: 1. A process for purifying boron nitride nanotubes, the process comprising: contacting a solid boron nitride nanotube (BNNT) material containing boron nitride nanotubes and impurities with a halogen gas selected from the group consisting of chlorine, bromine and fluorine at a temperature in a range of 600° C. to 1250° C. when chlorine is the halogen, 700° C. to 1250° C. when bromine is the halogen gas, and 500° C. to 700° C. when fluorine is the halogen gas, the impurities reacting with the halogen gas to produce gaseous halogen-containing byproducts; and, removing the gaseous halogen-containing byproducts and unreacted halogen gas from the solid boron nitride nanotube material to produce purified boron nitride nanotubes. 2. The process of claim 1 conducted under dry conditions. 3. The process of claim 1 , wherein the impurities comprise boron-containing impurities. 4. The process of claim 1 , wherein the purity and crystallinity of BNNT material recovered from the process improves as the temperature is increased up to a maximum temperature of 1250° C. 5. The process of claim 3 , wherein the impurities removed comprise hexagonal boron nitride. 6. The process of claim 3 , wherein the impurities removed comprise defective BNNT material. 7. The process of claim 1 , wherein the gaseous halogen-containing byproducts comprise a boron trihalide. 8. The process of claim 1 , wherein the solid boron nitride nanotube material is a material produced in a catalyst-free process. 9. The process of claim 1 , wherein the gaseous halogen-containing byproducts and unreacted halogen gas are removed from the solid boron nitride nanotube material under a positive pressure of flowing gas. 10. The process of claim 1 , wherein the purity of the purified boron nitride nanotubes is at least 75%. 11. The process of claim 1 , wherein the solid boron nitride nanotube material is exposed to the halogen gas at the indicated temperature for a period of about 1-20 minutes per gram of solid boron nitride nanotube material.
Nanotubes · CPC title
obtained by SEM · CPC title
by thermal analysis data, e.g. TGA, DTA, DSC · CPC title
by UV- or VIS- data · CPC title
Compounds containing boron and nitrogen, e.g. borazoles (ammonium tetrafluoborates C01B35/063; ammonium borates C01B35/12) · CPC title
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