Quartz MEMS piezoelectric resonator for chipscale RF antennae

US12166471B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12166471-B2
Application numberUS-202217574200-A
CountryUS
Kind codeB2
Filing dateJan 12, 2022
Priority dateJun 16, 2017
Publication dateDec 10, 2024
Grant dateDec 10, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A RF antenna having a magnetostrictive film may be made by patterning selected portions of a top surface of the quartz wafer for deposition of electrode metal and deposition of the magnetostrictive film and depositing the electrode metal and the magnetostrictive film; temporarily bonding the quartz wafer to a handle wafer; thinning the quartz wafer to a desired thickness; etching the quartz wafer to define the outlines of at least one quartz resonator bearing the electrode metal and the magnetostrictive film; patterning selected portions of a bottom surface the at least one quartz resonator for deposition of electrode metal and at least one bond pad and depositing the electrode metal and the at least one bond pad; bonding the at least one quartz resonator to a substrate wafer; and releasing the at least one quartz resonator from the handle wafer.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of making a RF antenna in which a magnetostrictive film is deposited on a quartz wafer, the method comprising: patterning selected portions of a top surface of the quartz wafer for deposition of electrode metal and deposition of said magnetostrictive film and depositing said electrode metal and said magnetostrictive film; temporarily bonding the quartz wafer to a handle wafer; thinning the quartz wafer to a desired thickness; etching the quartz wafer to define the outlines of at least one quartz resonator bearing said electrode metal and said magnetostrictive film; patterning selected portions of a bottom surface the at least one quartz resonator for deposition of electrode metal and at least one bond pad and depositing said electrode metal and said at least one bond pad; bonding the at least one quartz resonator to a substrate wafer; and releasing the at least one quartz resonator from said handle wafer. 2. The method of making a RF antenna according to claim 1 wherein the magnetostrictive film consists of material such as FeGaB or FeCoB or other ferromagnetic material. 3. The method of making a RF antenna according to claim 1 wherein the step of patterning selected portions of the bottom surface the at least one quartz resonator includes patterning for deposition of the magnetostrictive film on said bottom surface and depositing the magnetostrictive film on said bottom surface. 4. The method of making a RF antenna according to claim 1 wherein the magnetostrictive film is deposited directly on said quartz wafer. 5. The method of making a RF antenna according to claim 1 wherein the magnetostrictive film is deposited directly on said electrode metal. 6. The method of making a RF antenna according to claim 1 wherein the at least one quartz resonator is a tuning fork, extensional mode, or a shear mode quartz resonator. 7. The method of making a RF antenna according to claim 1 wherein a plurality of quartz resonators are formed and all bonded to said substrate wafer, and wherein at least some of plurality of quartz resonators bonded to said substrate wafer have different resonant frequencies.

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What does patent US12166471B2 cover?
A RF antenna having a magnetostrictive film may be made by patterning selected portions of a top surface of the quartz wafer for deposition of electrode metal and deposition of the magnetostrictive film and depositing the electrode metal and the magnetostrictive film; temporarily bonding the quartz wafer to a handle wafer; thinning the quartz wafer to a desired thickness; etching the quartz waf…
Who is the assignee on this patent?
Hrl Lab Llc
What technology area does this patent fall under?
Primary CPC classification H03H9/19. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Dec 10 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).