Semiconductor processing tool and methods of operation

Patent metadata

Field	Value
Publication number	US-12131962-B2
Application number	US-202117446242-A
Country	US
Kind code	B2
Filing date	Aug 27, 2021
Priority date	May 13, 2021
Publication date	Oct 29, 2024
Grant date	Oct 29, 2024

Abstract

A diaphragm position of a valve may be detected and/or determined such that operation of the diaphragm may be monitored. A sensor included in the valve may generate sensor data that may be used to monitor the position of the diaphragm, which in turn may be used to determine a flow of a fluid through the valve. In this way, the sensor may be used to determine whether the diaphragm is properly functioning, may be used to identify and detect failures of the diaphragm, and/or may be used to quickly terminate operation of an associated deposition tool. This may reduce semiconductor substrate scrap, may reduce device failures on semiconductor substrates that are processed by the deposition tool, may increase semiconductor processing quality of the deposition tool, and/or may increase semiconductor processing yields of the deposition tool.

First claim

What is claimed is:

1. An atomic layer deposition (ALD) supply system, comprising:
one or more gas sources, each configured to supply a gas in the ALD supply system;
a plurality of gas manifolds, each configured to selectively supply a plurality of types of gasses in the ALD supply system;
an ampoule configured to supply a vaporized precursor in the ALD supply system;
a point-of-use valve manifold (PVM) configured to selectively dispense the plurality of types of gasses, the vaporized precursor, or a combination thereof to a showerhead included in an ALD chamber for depositing a thin film on a semiconductor substrate;
comprising:
a diaphragm configured to control a flow through the valve, and
a distance sensor configured to:
transmit a distance measurement signal toward the diaphragm,
generate sensor data based on an intensity of a reflected distance measurement signal that is based on a reflection of the distance measurement signal; and

a controller configured to:
receive the sensor data from the distance sensor, and
detect, based on the sensor data, abnormal operation of the diaphragm.

2. The ALD supply system of claim 1 , further comprising:
a fluid inlet;
a fluid outlet;
wherein the diaphragm, to control the flow through the valve, is configured to:
control the flow between the fluid inlet and the fluid outlet; and

wherein the controller, to detect abnormal operation of the diaphragm, is configured to:
detect, based on the sensor data, a failure of the diaphragm to open such that the flow is permitted between the fluid inlet and the fluid outlet.

3. The ALD supply system of claim 1 , wherein the distance sensor comprises:
a signal generator configured to transmit the distance measurement signal toward the diaphragm;
a signal detector configured to generate the sensor data based on the intensity of the reflected distance measurement signal that is based on the reflection of the distance measurement signal; and
a communication interface configured to transmit the sensor data to the controller.

4. The ALD supply system of claim 3 , wherein the signal generator, to transmit the distance measurement signal toward the diaphragm, is configured to:
transmit the distance measurement signal onto the diaphragm at an angle, relative to a surface of the diaphragm, that is in a range of approximately 30 degrees to approximately 75 degrees.

5. The ALD supply system of claim 3 , wherein the signal generator, to transmit the distance measurement signal toward the diaphragm, is configured to:
transmit the distance measurement signal onto an outer region of the diaphragm that surrounds an inner region that interfaces with a valve stem of the valve.

6. The ALD supply system of claim 5 , wherein a first ratio, between a first width of the inner region and a radius of the diaphragm is in a first range of greater than 0 to approximately 0.2; and
wherein a second ratio between a second width of the outer region and the radius of the diaphragm is in a second range of approximately 0.2 to approximately 1.

7. The ALD supply system of claim 1 , wherein abnormal operation of the diaphragm is caused by at least one of:
material fatigue of the diaphragm,
precursor condensation on the diaphragm, or
an impurity blockage associated with the diaphragm.

8. The ALD supply system of claim 1 , wherein the controller is further configured to:
cause, based on detecting the abnormal operation of the diaphragm, the ALD supply system to stop selectively dispensing the plurality of types of gasses, the vaporized precursor, or the combination thereof to the showerhead included in the ALD chamber before a greater quantity than 1 semiconductor substrate is scrapped.

9. The ALD supply system of claim 1 , wherein the distance sensor is included in a housing of the valve at a location such that a piston of the valve and a valve stem of the valve do not interfere with generation of the sensor data by the distance sensor.

10. An atomic layer deposition (ALD) supply system, comprising:
one or more gas sources, each configured to supply a gas in the ALD supply system;
a plurality of gas manifolds, each configured to selectively supply a plurality of types of gasses in the ALD supply system;
an ampoule configured to supply a vaporized precursor in the ALD supply system;
a point-of-use valve manifold (PVM) configured to selectively dispense the plurality of types of gasses, the vaporized precursor, or a combination thereof to a showerhead included in an ALD chamber for depositing a thin film on a semiconductor substrate;
a valve comprising:
a diaphragm configured to deform between two configurations, including:
a closed configuration to block a flow through the valve, and
an open configuration to permit the flow through the valve, and

a sensor, comprising a laser sensor, an infrared sensor, or a radar sensor, configured to generate sensor data associated with the diaphragm; and

a controller configured to:
receive the sensor data from the sensor, and
determine, based on the sensor, a position of the diaphragm, and a presence of the flow through the valve
detect, based on the sensor data, abnormal operation of the diaphragm.

11. The ALD supply system of claim 10 , wherein the sensor includes a distance sensor;
wherein the sensor, to generate the sensor data associated with the diaphragm, is configured to:
emit a distance measurement signal toward the diaphragm; and
generate the sensor data based on an intensity of a reflected distance measurement signal,
wherein the reflected distance measurement signal is reflected off of the diaphragm, and
wherein the intensity of the reflected distance measurement signal is based on a distance between the diaphragm and the sensor and an angle of the diaphragm relative to an angle of the distance measurement signal.

12. The ALD supply system of claim 11 , wherein the intensity of the reflected distance measurement signal is greater when the diaphragm is in the open configuration than when the diaphragm is in the closed configuration.

13. The ALD supply system of claim 11 , wherein the sensor, to emit the distance measurement signal toward the diaphragm, is configured to:
emit the distance measurement signal onto a measurement point on the diaphragm,
wherein the measurement point is located an offset from a center of the diaphragm so as to prevent a valve stem of the valve from interfering with the distance measurement signal.

14. The ALD supply system of claim 13 , wherein a ratio between the offset and a radius of the diaphragm is in a range of approximately 0.2 to approximately 1.

15. The ALD supply system of claim 10 , wherein the valve further comprises:
a valve stem configured to selectively actuate the diaphragm between the open configuration and the closed configuration; and
a piston configured to actuate the valve stem,
wherein the sensor is located between the diaphragm and the piston,
wherein the sensor is located adjacent to the valve stem, and
wherein the position of the diaphragm and the presence of the flow through the valve are to be used to detect an unopened failure of the diaphragm.

16. An atomic layer deposition (ALD) supply system, comprising:
a controller configured to:
receive sensor data includes information identifying signal intensity of a signal reflected off of a diaphragm of an ALD valve included in the ALD supply system,
wherein the sensor data is received from a sensor included in the ALD valve, and
wherein the sensor data is received during an ALD operation associated with a semicond

Assignees

• Taiwan Semiconductor Mfg Co Ltd

Inventors

• Cheng Kuang-Wei
• Liu Yung-Tsun
• Lee Chih-Tsung
• Ni Chyi-Tsong

Classifications

• H10P14/69433

  the material being a silicon nitride not containing oxygen, e.g. SixNy or SixByNz · CPC title

• H10P14/6339

  deposition by cyclic CVD, e.g. ALD, ALE or pulsed CVD · CPC title

• H10P74/238 Primary

  comprising acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection or in-situ thickness measurement · CPC title

• H10P72/0616

  Monitoring of warpages, curvatures, damages, defects or the like · CPC title

• H10P72/0402

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title