System and method for parallel two-photon lithography using a metalens array

Patent metadata

Field	Value
Publication number	US-12130407-B2
Application number	US-202117168743-A
Country	US
Kind code	B2
Filing date	Feb 5, 2021
Priority date	Feb 5, 2021
Publication date	Oct 29, 2024
Grant date	Oct 29, 2024

Abstract

A metalens array is disclosed for controllably modifying a phase of a wavefront of an optical beam. The metalens array may have a substrate having at least first and second metalens unit cells, and forming a single integrated structure with no stitching being required of the first and second metalens unit cells. The first metalens unit cell has a first plurality of nanoscale features and is configured to modify a phase of a first portion of a wavefront of an optical signal incident thereon in accordance with a first predetermined phase pattern to create at least one first focal voxel within an image plane. The second metalens unit cell has a second plurality of nanoscale features configured to modify the phase of a second portion of the wavefront of the optical signal incident thereon, in accordance with a second predetermined phase pattern, to simultaneously create at least one second focal voxel within the image plane. Each metalens unit cell also has an overall diameter of no more than about 200 microns.

First claim

What is claimed is:

1. A metalens array apparatus for controllably modifying a wavefront of an optical beam, the apparatus comprising:
a first metalens unit cell having a first plurality of nanoscale features, the first metalens unit cell configured to modify a first portion of a wavefront of an optical signal in accordance with a first predetermined phase pattern to create a first focal voxel within an image plane;
a second metalens unit cell having a second plurality of nanoscale features and formed adjacent to the first metalens unit cell, the second metalens unit cell configured to receive and modify a second portion of the wavefront of the optical signal, and in accordance with a second predetermined phase pattern, to create a second focal voxel within the image plane; and
wherein the first and second metalens unit cells are further configured to simultaneously receive portions of the optical beam to enable simultaneously projecting the first and second focal voxels within the image plane.

2. The apparatus of claim 1 , wherein the first and second metalens unit cells are identical in construction.

3. The apparatus of claim 1 , wherein the first and second metalens unit cells are different in construction.

4. The apparatus of claim 1 , wherein the first and second pluralities of nanoscale of the first and second metalens unit cells, respectively, create the first and second focal voxels with different dimensions.

5. The apparatus of claim 1 , wherein the first and second pluralities of nanostructures of the first and second metalens unit cells, respectively, create the first and second focal voxels with the same dimensions.

6. The metalens array of claim 1 , wherein the first focal voxel and the second focal voxel at least partially overlap one another at a point in the image plane to produce a resulting focal voxel, and wherein the resulting focal voxel differs in at least one aspect from the focal voxel and the second focal voxel.

7. The metalens array of claim 6 , wherein the at least one aspect comprises a dimension.

8. The metalens array of claim 6 , wherein the at least one aspect comprises an aspect ratio.

9. The metalens array of claim 8 , wherein the aspect ratio comprises an aspect ratio of at least about 5:1.

10. The metalens array of claim 6 , wherein the first focal voxel and the second focal voxel fully overlap one another in the image plane to form a resulting focal voxel which differs in at least one respect from each of the first focal voxel and the second focal voxel.

11. The metalens array of claim 10 , wherein the at least one aspect comprises a dimension.

12. The metalens array of claim 10 , wherein the at least one aspect comprises an aspect ratio.

13. The metalens array of claim 12 , wherein the metalens array forms a numerical aperture of 0.8 or greater.

14. A metalens array for use in two-photon lithography, for controllably modifying a wavefront of an optical beam being used to activate a photoresist, the photoresist being used to form a 3D part in a printing operation, the apparatus comprising:
a substrate;
a plurality of metalens unit cells arranged in a contiguous planar grid on the substrate, each said metalens unit cell including:
a plurality of nanoscale features formed on the substrate, which modify a portion of a wavefront of the optical beam which is incident upon an upper surface of the metalens array in a predetermined manner to generate at least one focal voxel within an area defined by its associated said metalens unit cell, and further such that the at least one focal voxel is generated within a planar focal plane within which the photoresist is present, and

wherein the metalens unit cells create their respective focal voxels simultaneously within the focal plane using the optical beam.

15. The metalens array of claim 14 , wherein the nanoscale features of the metalens unit cells are different in construction, such that select ones of the focal voxels differ in at least one aspect from one another.

16. The metalens array of claim 14 , wherein the selected ones of the focal voxels differ in at least one of:
dimension;
spatial location relative to their respective said metalens unit cell; or
aspect ratio.

17. The metalens array of claim 14 , wherein each said metalens unit cell creates two focal voxels at spaced apart locations within the focal plane.

18. The metalens array of claim 17 , wherein select ones of the focal voxels at least partially overlap one another in the focal plane, such that each said focal voxel is formed using portions of the optical beam passing through two adjacently positioned metalens unit cells.

19. A method of forming a metalens array able to controllably modify a wavefront of an optical beam incident thereon, the method comprising:
forming a plurality of unit cells on a portion of a planar substrate material, which collectively configure the metalens array to form a periodic structure;
further forming each one of the plurality of unit cells such that the unit cells are arranged contiguously to one another in a grid pattern; and
further forming each one of the plurality of unit cells such that each is able to modify a portion of the wavefront of the optical beam, and such that each said unit cell simultaneously creates a focal voxel within an image plane.

20. The method of claim 19 , further comprising forming the unit cells such that each said unit cell simultaneously creates two spaced apart focal voxels within the image plane, and further such that adjacently located ones of the unit cells produce overlapping focal voxels within the image plane.

Assignees

• L Livermore Nat Security Llc

Inventors

• Xia Xiaoxing
• Feigenbaum Eyal

Classifications

• G03F7/0037

  Production of three-dimensional images · CPC title

• G03F7/70275

  Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems · CPC title

• G02B2207/101

  Nanooptics · CPC title

• G02B1/002 Primary

  made of materials engineered to provide properties not available in nature, e.g. metamaterials · CPC title

• G03F7/70416

  2.5D lithography · CPC title