Direct Write Lithography for the Fabrication of Geometric Phase Holograms
US-2015331167-A1 · Nov 19, 2015 · US
Dielectric metasurface optical elements
US9507064B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9507064-B2 |
| Application number | US-201514810229-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 27, 2015 |
| Priority date | Jul 27, 2014 |
| Publication date | Nov 29, 2016 |
| Grant date | Nov 29, 2016 |
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Abstract
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A dielectric gradient metasurface optical device provides optical wavefront shaping using an ultrathin (less than 100 nm thick) layer of nanoscale geometric Pancharatnam-Berry phase optical elements deposited on a substrate layer. The optical elements are nanobeams composed of high refractive index dielectric material. The nanobeams have uniform size and shape and are arranged with less than 200 nm separations and spatially varying orientations in the plane of the device such that the optical device has a spatially varying optical phase response capable of optical wavefront shaping. The high refractive index dielectric material may be materials compatible with semiconductor electronic fabrication, including silicon, polysilicon, germanium, gallium arsenide, titanium dioxide, or iron oxide.
First claim
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The invention claimed is: 1. A dielectric gradient metasurface optical device comprising a less than 100 nm thick layer of nanoscale geometric Pancharatnam-Berry phase optical elements deposited on a substrate layer, wherein the optical elements are nanobeams composed of high refractive index dielectric material, wherein the nanobeams have uniform size and shape and are arranged with less than 200 nm separations and spatially varying orientations in the plane of the device such that the optical device has a spatially varying optical phase response capable of optical wavefront shaping. 2. The optical device of claim 1 wherein the high refractive index dielectric material is silicon. 3. The optical device of claim 2 wherein the high refractive index dielectric material is polysilicon, germanium, gallium arsenide, titanium dioxide, or iron oxide. 4. The optical device of claim 1 wherein the substrate is quartz or glass, or other low refractive index material. 5. The optical device of claim 1 wherein the spatially varying optical phase response of the optical device functions as an optical blazed grating, lens, or axicon.
Assignees
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Classifications
- G02B5/001Primary
Axicons, waxicons, reflaxicons · CPC title
made of materials engineered to provide properties not available in nature, e.g. metamaterials · CPC title
- G02B5/1833Primary
comprising birefringent materials (birefringent elements per se G02B5/3083) · CPC title
Nanooptics, e.g. quantum optics or photonic crystals · CPC title
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- What does patent US9507064B2 cover?
- A dielectric gradient metasurface optical device provides optical wavefront shaping using an ultrathin (less than 100 nm thick) layer of nanoscale geometric Pancharatnam-Berry phase optical elements deposited on a substrate layer. The optical elements are nanobeams composed of high refractive index dielectric material. The nanobeams have uniform size and shape and are arranged with less than 20…
- Who is the assignee on this patent?
- Univ Leland Stanford Junior, Technion Res & Dev Foundation
- What technology area does this patent fall under?
- Primary CPC classification G02B5/001. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Nov 29 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).