Process apparatus including gas supplier and method of operating the same

Patent metadata

Field	Value
Publication number	US-12128395-B2
Application number	US-202117411640-A
Country	US
Kind code	B2
Filing date	Aug 25, 2021
Priority date	Feb 3, 2021
Publication date	Oct 29, 2024
Grant date	Oct 29, 2024

Abstract

A process apparatus includes a gas supplier which supplies a reaction gas having a constant concentration, and a processor which performs a predetermined process by the reaction gas supplied from the gas supplier, where the gas supplier includes a reactor which accommodates a solid phase reactant, a heater which applies heat to the solid phase reactant to convert the solid phase reactant to a reaction gas in a gas phase, a gas pump which applies a predetermined pumping pressure to the reactor, and a gas outlet which discharges the reaction gas to the processor.

First claim

What is claimed is:

1. A process apparatus comprising:
a gas supplier which supplies a reaction gas having a constant concentration, the gas supplier including:
a reactor which accommodates a solid phase reactant;
a heater which applies heat to the solid phase reactant to convert the solid phase reactant to the reaction gas in a gas phase;
a gas pump which applies a predetermined pumping pressure to the reactor; and
a gas outlet which discharges the reaction gas; and

a processor which performs a predetermined process by the reaction gas supplied from the gas outlet of the gas supplier to the processor.

2. The process apparatus of claim 1 , wherein the solid phase reactant comprises at least one of a solid phase and liquid phase volatile material.

3. The process apparatus of claim 1 , further comprising a concentration measuring unit which measures the constant concentration of the reaction gas discharged from the reactor.

4. The process apparatus of claim 3 , further comprising
a controller which controls the predetermined pumping pressure of the gas pump according to a concentration change of the reaction gas received from the concentration measuring unit.

5. The process apparatus of claim 1 , further comprising a carrier gas supplier which supplies a carrier gas which moves the reaction gas discharged from the reactor to the processor.

6. The process apparatus of claim 5 , wherein the carrier gas includes at least one of nitrogen, oxygen, and air.

7. The process apparatus of claim 5 , further comprising:
a first on/off valve which blocks and releases the supply of the carrier gas; and
a controller which controls the first on/off valve.

8. The process apparatus of claim 1 , wherein the reactor includes a pumping gas inlet through which a pumping gas supplied from the gas pump is introduced and a pumping gas outlet through which the pumping gas is discharged.

9. The process apparatus of claim 8 , wherein
the pumping gas outlet is arranged at a first height from a surface of the reactor on which the heater is disposed, and the heater is arranged at a second height from the surface of the reactor, and
the first height is greater than the second height.

10. The process apparatus of claim 1 , further comprising a process gas supplier which supplies a predetermined process gas to be mixed with the reaction gas discharged from the reactor.

11. The process apparatus of claim 10 , wherein the predetermined process gas comprises at least one of nitrogen, oxygen, and air.

12. The process apparatus of claim 10 , further comprising:
a second on/off valve which blocks and releases the supply of a process gas; and
a controller which controls the second on/off valve.

Assignees

• Samsung Electronics Co Ltd

Inventors

• Yang Dongsik
• Kwon Hyukjae
• Koo Minseok
• Kuk Sukeun
• Oh Sehyeong
• Lee Hyun Chul
• Ji Sangmin

Classifications

• H10P72/0604

  Process monitoring, e.g. flow or thickness monitoring · CPC title

• H10P72/0402 Primary

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• C23C16/448

  characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials · CPC title

• C23C16/4481 Primary

  by evaporation using carrier gas in contact with the source material (C23C16/4486 takes precedence) · CPC title

• B01J7/00 Primary

  Apparatus for generating gases (production of inert gas mixtures B01J19/14; for generating specific gases, see the relevant subclasses, e.g. C01B, C10J {; in "air bags" on vehicles B60R21/26; for starter gas F02C7/26; blasting cartridges for producing gas under pressure F42B3/04}) · CPC title