Color film substrate, display panel and display device

Patent metadata

Field	Value
Publication number	US-12105372-B2
Application number	US-202318374109-A
Country	US
Kind code	B2
Filing date	Sep 28, 2023
Priority date	Jan 17, 2020
Publication date	Oct 1, 2024
Grant date	Oct 1, 2024

Abstract

A color filter substrate, a display panel and a display device are provided. The color filter substrate includes: a base substrate; a color conversion layer on the base substrate; a covering layer on a side of the color conversion layer away from the base substrate; and a polarizing layer on a side of the covering layer away from the base substrate. The polarizing layer includes a wire grid polarizer. The covering layer includes a first covering sub-layer and a second covering sub-layer, the first covering sub-layer is located on the side of the color conversion layer away from the base substrate, the second covering sub-layer is located on a side of the first covering sub-layer away from the base substrate, and a material of the first covering sub-layer is different from a material of the second covering sub-layer.

First claim

What is claimed is:

1. A color filter substrate, comprising:
a base substrate;
a filter layer on the base substrate;
a planarization layer on a side of the filter layer away from the base substrate;
a color conversion layer on a side of the planarization layer away from the base substrate; and
an isolation bank on a side of the planarization layer away from the base substrate,
wherein the filter layer comprises a first filter structure, the first filter structure is configured to filter light within a first wavelength range, and the planarization layer comprises a first part and a second part,
wherein an orthographic projection of the first part on the base substrate overlaps with an orthographic projection of the isolation bank on the base substrate, and an orthographic projection of the second part on the base substrate overlaps with an orthographic projection of the first filter structure on the base substrate, and
wherein a height of the first part in a direction perpendicular to the base substrate is different from a height of the second part in the direction perpendicular to the base substrate.

2. The color filter substrate of claim 1 , wherein the planarization layer is in direct contact with the filter layer.

3. The color filter substrate of claim 2 , wherein the planarization layer comprises a first surface on a side away from the base substrate, and the first surface is a substantially flat surface.

4. The color filter substrate of claim 2 , wherein the height of the first part of the planarization layer in the direction perpendicular to the base substrate is greater than the height of the second part of the planarization layer in the direction perpendicular to the base substrate.

5. The color filter substrate of claim 1 , wherein the color conversion layer comprises a first quantum dot structure and a second quantum dot structure, the first quantum dot structure is configured to convert light within a third wavelength range into the light within the first wavelength range, the second quantum dot structure is configured to convert the light within the third wavelength range into light within a second wavelength range, and
wherein the filter layer further comprises a second filter structure, and the second filter structure is configured to filter the light within the second wavelength range.

6. The color filter substrate of claim 5 , wherein the color filter substrate comprises a plurality of pixels, at least one pixel comprises a first sub-pixel, a second sub-pixel and a third sub-pixel, the first sub-pixel comprises the first quantum dot structure and the first filter structure, the second sub-pixel comprises the second quantum dot structure and the second filter structure, and
wherein the third sub-pixel comprises a third filter structure, and the third filter structure is configured to filter the light within the third wavelength range; or, the third sub-pixel comprises a transparent structure, the transparent structure is configured to allow the light within the third wavelength range, that is incident thereon, to pass therethrough.

7. The color filter substrate of claim 6 , wherein an orthographic projection of the first quantum dot structure on the base substrate falls within an orthographic projection of the first filter structure on the base substrate, and an orthographic projection of the second quantum dot structure on the base substrate falls within an orthographic projection of the second filter structure on the base substrate.

8. The color filter substrate of claim 7 , further comprising:
a covering layer on a side of the color conversion layer away from the base substrate,
wherein the covering layer comprises a first covering sub-layer and a second covering sub-layer, the first covering sub-layer is located on the side of the color conversion layer away from the base substrate, the second covering sub-layer is located on a side of the first covering sub-layer away from the base substrate, and a material of the first covering sub-layer is different from a material of the second covering sub-layer.

9. The color filter substrate of claim 8 , wherein a thickness of the first covering sub-layer is greater than a thickness of the second covering sub-layer.

10. The color filter substrate of claim 9 , wherein the second covering sub-layer at least comprises a photoinitiator, and the second covering sub-layer comprises a second surface on a side away from the base substrate, and a difference in height for the second surface is less than or equal to 100 nanometers.

11. The color filter substrate of claim 10 , further comprising:
a polarizing layer on a side of the covering layer away from the base substrate.

12. The color filter substrate of claim 11 , wherein the first covering sub-layer is a thermally cured covering layer; and/or the second covering sub-layer is a light-curing covering layer; and/or a leveling property of a material of the second covering sub-layer is greater than a leveling property of a material of the first covering sub-layer.

13. The color filter substrate of claim 12 , further comprising a buffer layer between the covering layer and the polarizing layer, wherein the buffer layer comprises a first buffer sub-layer and a second buffer sub-layer, the first buffer sub-layer is arranged on a side of the polarizing layer facing the base substrate, the second buffer sub-layer is arranged on a side of the first buffer sub-layer facing the base substrate, and a refractive index of a material of the first buffer sub-layer is less than a refractive index of a material of the second buffer sub-layer.

14. The color filter substrate of claim 13 , further comprising a protective layer on a side of the polarizing layer away from the base substrate, wherein the protective layer comprises a first protective sub-layer and a second protective sub-layer, the first protective sub-layer is arranged on a side of the polarizing layer away from the base substrate, the second protection sub-layer is arranged on a side of the first protection sub-layer away from the base substrate, and a refractive index of a material of the first protective sub-layer is less than a refractive index of a material of the second protective sub-layer.

15. The color filter substrate of claim 14 , wherein a thickness of the first buffer sub-layer is within a range of 275.5 to 304.5 nm, and a thickness of the second buffer sub-layer is within a range of 95 to 105 nm; and/or
a thickness of the first protective sub-layer is within a range of 427.5 to 472.5 nm, and a thickness of the second protective sub-layer is within a range of 47.5 to 52.5 nm; and/or
wherein refractive indices of the first buffer sub-layer and the first protective sub-layer are both within a range of 1.35 to 1.65; and/or, refractive indices of the second buffer sub-layer and the second protection sub-layer are both within a range of 1.6 to 2.0.

16. The color filter substrate of claim 15 , wherein the first buffer sub-layer and the first protection sub-layer are both silicon oxide layers; and/or,
the second buffer sub-layer and the second protection sub-layer are both silicon nitride layers.

17. The color filter substrate of claim 6 , wherein an orthographic projection of the transparent structure on the base substrate falls within an orthographic projection of the third filter structure on the base substrate.

18. The color filter substrate of claim 6 , wherein the isolation bank is located on a side of the planarization layer away from the base substrate, so that a plurality of grooves are

Assignees

• Boe Technology Group Co Ltd

Inventors

• Shi Ge
• Liu Yujie
• Shu Shi
• Huang Wei
• Zhang Shiyu
• Wang Yuyao
• Im Yunsik
• Chen Xiaochuan
• Dong Xue
• Zhu Ming
• Yang Song

Classifications

• G02F1/133512

  Light shielding layers, e.g. black matrix (G02F1/136209 takes precedence) · CPC title

• G02F1/133548

  Wire-grid polarisers · CPC title

• G02F2201/50

  Protective arrangements · CPC title

• G02F1/133519

  Overcoatings · CPC title

• G02F1/133617

  Illumination with ultraviolet light; Luminescent elements or materials associated to the cell · CPC title