Gas feeding cup and a gas manifold assembly

Patent metadata

Field	Value
Publication number	US-12104248-B2
Application number	US-202318475338-A
Country	US
Kind code	B2
Filing date	Sep 27, 2023
Priority date	Mar 30, 2021
Publication date	Oct 1, 2024
Grant date	Oct 1, 2024

Abstract

A gas feeding cup removably provided in a fixed gas manifold structure of an atomic layer deposition apparatus and including a cup bottom including gas feeding channels extending through the cup bottom from a cup bottom outer surface to a cup bottom inner surface on the other side of the cup bottom; and a cup wall surrounding the cup bottom and extending transverse relative to the cup bottom in a direction away from the cup bottom at the inner surface side of the cup bottom such that a gas feeding space is formed by the cup wall and the cup bottom inner surface.

First claim

The invention claimed is:

1. An atomic layer deposition apparatus, comprising:
a fixed gas manifold structure; and
a gas feeding cup removably provided in the fixed gas manifold structure, the gas feeding cup including:
a cup bottom comprising gas feeding channels extending through the cup bottom from a cup bottom outer surface to a cup bottom inner surface on the other side of the cup bottom;
a cup wall surrounding the cup bottom and extending transverse relative to the cup bottom in a direction away from the cup bottom at the inner surface side of the cup bottom such that a gas feeding space is formed by the cup wall and the cup bottom inner surface; and
a gas mixing cone arranged to the gas feeding space, the gas mixing cone is disposed at a distance from the cup bottom inner surface for forming a gas mixing zone between the cup bottom inner surface and the gas mixing cone,
wherein the cup wall extends at least partly in a direction away from the cup bottom at the outer surface side of the cup bottom such that a flange is formed on the opposite side of the cup bottom than the gas feeding space.

2. The atomic layer deposition apparatus according to claim 1 , wherein at least one of the gas feeding channels forms a conical shape through the cup bottom such that an inlet opening of the gas feeding channel at the cup bottom outer surface is smaller than an outlet opening of the gas feeding channel at the cup bottom inner surface.

3. The atomic layer deposition apparatus according to claim 1 , wherein the flange comprises an alignment section configured to connect to a counter section in the fixed gas manifold structure for aligning the gas feeding cup so that the gas feeding channels align with the respective gas feeding channels of the fixed gas manifold structure.

4. The atomic layer deposition apparatus according to claim 1 , wherein the gas feeding cup comprises a gas homogenisation surface arranged to the gas feeding space, said gas homogenisation surface is disposed at a distance from the cup bottom inner surface and at least partly parallel to the cup bottom inner surface for forming a gas homogenisation zone between the cup bottom inner surface and the gas homogenisation surface.

5. The atomic layer deposition apparatus according to claim 4 , wherein the gas homogenisation surface comprises a passage from the gas homogenisation zone through the homogenisation surface to the gas feeding space outside the gas homogenisation zone for allowing gases to flow from the gas feeding channels through the gas homogenisation zone to the gas feeding space outside the gas homogenisation zone.

6. The atomic layer deposition apparatus according to claim 1 , wherein the gas mixing cone is arranged to the gas feeding space such that an apex of the gas mixing cone is furthest away from the cup bottom inner surface, and a gas flowing zone is provided between the gas mixing cone and the cup wall by arranging the gas mixing cone at a distance from the cup wall for providing a flowing path from the gas mixing zone to the gas feeding space outside the gas mixing zone.

7. The atomic layer deposition apparatus according to claim 4 , wherein the gas mixing cone is disposed at a distance from the gas homogenisation surface for forming a second gas mixing zone between the gas homogenisation surface and the gas mixing cone.

8. The atomic layer deposition apparatus according to claim 7 , wherein the gas mixing cone is arranged to the gas feeding space such that an apex of the gas mixing cone is furthest away from the gas homogenisation surface, and a gas flowing zone is disposed between the gas mixing cone and the cup wall by arranging the gas mixing cone at a distance from the cup wall for providing a flowing path from the second gas mixing zone to the gas feeding space outside the second gas mixing zone.

9. A gas manifold assembly for use in an atomic layer deposition apparatus, wherein the gas manifold assembly comprises:
a gas manifold structure comprising gas feeding channels extending from gas sources to a manifold surface;
a gas feeding cup having a cup bottom and comprising gas feeding channels extending through the cup bottom from a cup bottom outer surface to a cup bottom inner surface on the other side of the cup bottom, the gas feeding cup being releasably arranged in connection with the gas manifold structure such that the cup bottom outer surface is arranged against the manifold surface, and the gas feeding channels of the gas feeding cup are aligned with the respective gas feeding channels of the gas manifold structure for forming continuous gas feeding channels; and
a gas guiding structure in connection with the gas manifold structure, the gas guiding structure is configured to guide gases from the gas sources through the gas feeding channels of the gas manifold structure and further through the gas feeding channels of the gas feeding cup.

10. The gas manifold assembly according to claim 9 , wherein the gas feeding cup being positioned to the gas manifold structure by using gravity, and the gas feeding channels of the gas feeding cup are aligned with the gas feeding channels of the gas manifold structure by an alignment structure.

11. The gas manifold assembly according to claim 10 , wherein the alignment structure comprises an alignment section in the gas feeding cup arranged to connect to a counter section in the fixed gas manifold structure for aligning the gas feeding channels of the gas feeding cup with the respective gas feeding channels of the gas manifold structure.

12. The gas manifold assembly according to claim 11 , wherein the alignment section is arranged in connection with the flange of the gas feeding cup.

13. A gas feeding cup for use in an atomic layer deposition apparatus, wherein the gas feeding cup comprises:
a cup bottom comprising gas feeding channels extending through the cup bottom from a cup bottom outer surface to a cup bottom inner surface on the other side of the cup bottom;
a cup wall surrounding the cup bottom and extending transverse relative to the cup bottom in a direction away from the cup bottom at the inner surface side of the cup bottom such that a gas feeding space is formed by the cup wall and the cup bottom inner surface; and
a gas mixing cone is disposed at a distance from the cup bottom inner surface for forming a gas mixing zone between the cup bottom inner surface and the gas mixing cone,
wherein the cup wall extends at least partly in a direction away from the cup bottom at the outer surface side of the cup bottom such that a flange is formed on the opposite side of the cup bottom than the gas feeding space.

14. The gas feeding cup according to claim 13 , wherein at least one of the gas feeding channels forms a conical shape through the cup bottom such that an inlet opening of the gas feeding channel at the cup bottom outer surface is smaller than an outlet opening of the gas feeding channel at the cup bottom inner surface.

15. The gas feeding cup according to claim 13 , further comprising a gas homogenisation surface arranged to the gas feeding space, the gas homogenisation surface is disposed at a distance from the cup bottom inner surface and at least partly parallel to the cup bottom inner surface for forming a gas homogenisation zone between the cup bottom inner surface and the gas homogenisation surface.

16. The gas feeding cup according to claim 15 , wherein the gas homogenisation surface comprises a passage from the gas homogenisation zone through the homogenisation surface to the gas feeding space outside the gas homogenisation zone for allowing gases t

Assignees

• Beneq Oy

Inventors

• Soininen Pekka
• Wesslin Johannes
• Andersson Jonas

Classifications

• C23C16/45563

  Gas nozzles · CPC title

• C23C16/45561 Primary

  Gas plumbing upstream of the reaction chamber · CPC title

• C30B25/14 Primary

  Feed and outlet means for the gases; Modifying the flow of the reactive gases · CPC title

• B01F25/45211

  the elements being cylinders or cones which obstruct the whole diameter of the tube, the flow changing from axial in radial and again in axial · CPC title

• B01F23/10

  Mixing gases with gases · CPC title