Film forming apparatus including a sprayer port and exhaust port on a supply pipe

US12096678B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12096678-B2
Application numberUS-201615283672-A
CountryUS
Kind codeB2
Filing dateOct 3, 2016
Priority dateApr 18, 2014
Publication dateSep 17, 2024
Grant dateSep 17, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A film forming apparatus, a substrate processing apparatus, and a device manufacturing method are provided, which improve the film thickness uniformity of a thin film that is formed on a substrate by spraying a thin film material. The film forming apparatus which forms a thin film on a substrate is provided with a nozzle that sprays a thin film material and an exhaust unit that discharges a gas. An exhaust port of the exhaust unit is arranged on a side that is opposite to the direction in which the gravity acts with respect to the substrate. The substrate processing apparatus performs a predetermined process on the substrate using the film forming apparatus. The device manufacturing method manufactures a device using the film forming apparatus.

First claim

Opening claim text (preview).

What is claimed is: 1. A film forming apparatus comprising: a film forming chamber; a mist supplier configured to atomize a liquid including a thin film material; a substrate conveyor configured to convey a flexible substrate into the film forming chamber; a sprayer port provided in the film forming chamber, the sprayer port configured to spray a gas including the liquid which has been atomized onto the flexible substrate from inside of the film forming chamber and above the flexible substrate, the flexible substrate inclined in the film forming chamber with respect to a horizontal plane, said horizontal plane being perpendicular to a direction of gravitational force; and an exhaust port provided above the flexible substrate and configured to exhaust the gas including the liquid which has been atomized from the film forming chamber, wherein: the substrate conveyor conveys the flexible substrate with the flexible substrate inclined within a range of 30° to 60° with respect to the horizontal plane perpendicular to the direction of gravitational force inside the film forming chamber, an angular difference between a spraying direction of the sprayer port and an exhaust direction of the exhaust port is less than or equal to 75°, and the sprayer port is configured to spray the gas including the atomized liquid onto the flexible substrate, the sprayer port is arranged directly above the portion of the flexible substrate being conveyed in an inclined direction within the range of 30° to 60°. 2. The film forming apparatus according to claim 1 , wherein the sprayer port is one among a plurality of sprayer ports included in the film forming apparatus, and the plurality of sprayer ports are arranged along a direction in which the flexible substrate is conveyed. 3. A substrate processing apparatus comprising: the film forming apparatus according to claim 1 ; and an exposure device configured to form a predetermined pattern on the flexible substrate by illuminating the flexible substrate, on which the thin film is formed by the film forming apparatus, with a light. 4. A device manufacturing method for manufacturing a device, comprising: forming a thin film on the flexible substrate, using the film forming apparatus according to claim 1 ; and forming a predetermined pattern on the flexible substrate by illuminating the flexible substrate, on which the thin film is formed by the forming the thin film, with a light. 5. The film forming apparatus according to claim 1 , wherein the gas including the liquid which has been atomized is sprayed onto the flexible substrate while the flexible substrate is being conveyed. 6. The film forming apparatus according to claim 1 , wherein the thin film material comprises fine metal particles or metal oxide. 7. The film forming apparatus according to claim 1 , wherein the flexible substrate is formed of a resin. 8. The film forming apparatus according to claim 1 , wherein the mist supplier atomizes the liquid using an ultrasonic vibrator. 9. The device manufacturing method according to claim 4 , wherein the sprayer port is one among a plurality of sprayer ports included in the film forming apparatus, and the plurality of sprayer ports are arranged along a direction in which the flexible substrate is conveyed. 10. The device manufacturing method according to claim 4 , wherein the substrate conveyor conveys the flexible substrate in the film forming chamber in a manner that the flexible substrate is inclined with respect to the horizontal plane perpendicular to the direction of gravitational force. 11. The device manufacturing method according to claim 4 , wherein the flexible substrate is conveyed in a state in which the flexible substrate is inclined within a range of 15° to 75° with respect to the horizontal plane perpendicular to the direction of gravitational force. 12. The device manufacturing method according to claim 11 , wherein the angular difference between a spraying direction of the sprayer port and an exhaust direction of the exhaust port is less than or equal to 75°.

Assignees

Inventors

Classifications

  • H10K71/00Primary

    Manufacture or treatment specially adapted for the organic devices covered by this subclass · CPC title

  • B05D1/02Primary

    performed by spraying · CPC title

  • the liquid or other fluent material being sucked or aspirated from an outlet orifice by another fluid, e.g. a gas, coming from another outlet orifice · CPC title

  • using printing deposition, e.g. ink jet printing · CPC title

  • using ultrasonic {or other kinds of} vibrations · CPC title

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Frequently asked questions

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What does patent US12096678B2 cover?
A film forming apparatus, a substrate processing apparatus, and a device manufacturing method are provided, which improve the film thickness uniformity of a thin film that is formed on a substrate by spraying a thin film material. The film forming apparatus which forms a thin film on a substrate is provided with a nozzle that sprays a thin film material and an exhaust unit that discharges a gas…
Who is the assignee on this patent?
Nikon Corp
What technology area does this patent fall under?
Primary CPC classification H10K71/00. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Sep 17 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 7 related publications on this page (citations in our corpus or others sharing the same primary CPC).