Spin dispenser module substrate surface protection system

Patent metadata

Field	Value
Publication number	US-9855579-B2
Application number	US-201414179337-A
Country	US
Kind code	B2
Filing date	Feb 12, 2014
Priority date	Feb 12, 2014
Publication date	Jan 2, 2018
Grant date	Jan 2, 2018

Abstract

A spin dispenser module and methods for using the same is disclosed. The spin dispenser module includes a cup having a basin with sidewalls and an exhaust, a rotatable platform situated inside the cup adapted for holding and rotating a substrate, a liquid dispenser disposed over the rotatable platform for dispensing a liquid coating material on top of the substrate, one or more ejector inlets disposed over the rotatable platform, the one or more ejectors connected to a negative pressure source, and a motor coupled to the rotatable platform to rate the rotatable platform at different rotational speeds. The one or more ejector inlets may be translatable and/or rotatable with optionally adjustable suction pressure. The ejector inlets operate after a liquid coating material is dispensed to avoid deposition of suspended organic compounds after a coating is formed.

First claim

What is claimed is:

1. A spin dispenser module comprising:
a cup having a basin with sidewalls and an exhaust;
a rotatable platform situated inside the cup adapted for holding and rotating a substrate;
a liquid dispenser disposed over the rotatable platform for dispensing a liquid coating material on top of the substrate;
one or more ejector inlets disposed over the rotatable platform, the one or more ejector inlets being continuously positioned relative to the liquid dispenser, the one or more ejector inlets being positioned vertically further from a top surface of the substrate than an outlet of the liquid dispenser, the one or more ejectors inlets connected to a negative pressure source, wherein the negative pressure source is configured to control negative pressure at the one or more ejector inlets such that the one or more ejector inlets remove gaseous or particulate organic material suspended over the substrate without disturbing a surface of the liquid coating material; and
a motor coupled to the rotatable platform to rotate the rotatable platform at different rotational speeds.

2. The spin dispenser module of claim 1 , wherein the one or more ejector inlets are mounted on the liquid dispenser.

3. The spin dispenser module of claim 1 , wherein the negative pressure source is a Venturi pump.

4. The spin dispenser module of claim 1 , wherein the negative pressure source is a vacuum pump.

5. The spin dispenser module of claim 1 , further comprising a movable support for at least one of the liquid dispenser and the one or more ejector inlets.

6. The spin dispenser module of claim 5 , wherein the movable support is an arm mounted on a track.

7. The spin dispenser module of claim 6 , wherein the arm is rotatable.

8. The spin dispenser module of claim 1 , wherein the one or more ejector inlets is disposed between about 5 mm and 50 mm above the substrate.

9. The spin dispenser module of claim 1 , wherein the liquid coating material is a photoresist or a developer.

10. The spin dispenser module of claim 1 , the rotatable platform is a vacuum chuck.

11. A device comprising:
a cup having sidewalls;
a rotatable platform situated inside the cup at a position lower than a topmost point of the sidewalls;
a vacuum chuck integrated into the rotatable platform for holding a substrate onto the rotatable platform;
an outlet nozzle disposed over the rotatable platform for dispensing a liquid coating material on top of the substrate;
one or more ejectors inlets disposed over the rotatable platform, the one or more ejector inlets being attached to a movable apparatus of the outlet nozzle, the one or more ejector inlets being positioned vertically further from a top surface of the rotatable platform than the outlet nozzle, the one or more ejector inlets connected to a vacuum pressure device by a corresponding ejector line, the vacuum pressure device configured to control a negative pressure at the one or more ejector inlets to remove gaseous or particulate organic material suspended over the substrate without forming a pattern on a surface of the liquid coating material; and
a motor coupled to the rotatable platform to rotate the rotatable platform at different rotational speeds.

12. The device of claim 11 , wherein the one or more ejector inlets are mounted proximate the outlet nozzle.

13. The device of claim 11 , wherein the one or more ejector inlets comprise two ejector inlets located on opposite sides of the outlet nozzle.

14. The device of claim 11 , wherein, for each of the one or more ejector inlets, a first portion of the corresponding ejector line is perpendicular to a top surface of the rotatable platform and disposed proximate to the outlet nozzle, wherein each of the one or more ejector inlets are laterally separated from the outlet nozzle by a second portion of the corresponding ejector line that extends away from the first portion, each of the one or more ejector inlets disposed at a distal end of the corresponding ejector line.

15. The device of claim 11 further comprising, a dispenser module, wherein the outlet nozzle is connected to the dispenser module and wherein the dispenser module comprises a movable support for at least one of the outlet nozzle and the one or more ejector inlets.

16. The device of claim 11 , wherein the liquid coating material is a photoresist or a developer.

17. A system comprising:
a substrate disposed on a rotatable platform in a chamber, the substrate being held to the rotatable platform by a vacuum at a top surface of the rotatable platform;
a dispensing nozzle positioned over the substrate, the dispensing nozzle configured to dispense a photoresist or photoresist developer;
a plurality of ejector inlets disposed over the rotatable platform, two of the plurality of ejector inlets being disposed on opposite sides of the dispensing nozzle;
a vacuum source connected to the plurality of ejector inlets by a respective ejector line for causing a negative pressure at the plurality of ejector inlets, the negative pressure configured to remove gaseous materials from the chamber via the plurality of ejector inlets without altering a surface of the photoresist or photoresist developer; and
a motor coupled to the rotatable platform configured to rotate the substrate.

18. The system of claim 17 , wherein the vacuum source is configured to operate when the rotatable platform is stationary.

19. The system of claim 17 , wherein the respective ejector lines are routed to a chemical exhaust.

20. The system of claim 17 , wherein the plurality of ejector inlets are configured to remove suspended particles from the chamber.

Assignees

• Taiwan Semiconductor Mfg Co Ltd
• Taiwan Semiconductor Mfg Co Ltd

Inventors

• Yang Ching-Hai
• Kao Yao-Hwan
• Li shang-sheng
• Chen Kuo-Pin
• Tseng Hsiang-Kai
• Chen Chuan-Wei

Classifications

• H10P72/0448

  Apparatus for applying a liquid, a resin, an ink or the like · CPC title

• G03F7/3021

  from a wafer supported on a rotating chuck · CPC title

• B05C11/1039 Primary

  Recovery of excess liquid or other fluent material; Controlling means therefor · CPC title

• B05C11/08

  Spreading liquid or other fluent material by manipulating the work, e.g. tilting · CPC title

• G03F7/162 Primary

  Coating on a rotating support, e.g. using a whirler or a spinner · CPC title