Drift tube electrode arrangement having direct current optics

Patent metadata

Field	Value
Publication number	US-12096548-B2
Application number	US-202217949862-A
Country	US
Kind code	B2
Filing date	Sep 21, 2022
Priority date	Sep 21, 2022
Publication date	Sep 17, 2024
Grant date	Sep 17, 2024

Abstract

An apparatus may include a drift tube assembly having a plurality of drift tubes to conduct an ion beam along a beam propagation direction. The plurality of drift tubes may define a multi-gap configuration corresponding to a plurality of acceleration gaps, wherein at least one powered drift tube of the drift tube assembly is coupled to receive an RF voltage signal. The apparatus may also include a DC electrode assembly that includes a conductor line, arranged within a resonator coil that is coupled to receive a DC voltage signal into the at least one powered drift tube. The DC electrode assembly may also include a DC electrode arrangement, connected to the conductor line and disposed within the at least one powered drift tube.

First claim

The invention claimed is:

1. An apparatus, comprising:
a drift tube assembly, the drift tube assembly comprising a plurality of drift tubes to conduct an ion beam along a beam propagation direction, the plurality of drift tubes defining a multi-gap configuration corresponding to a plurality of acceleration gaps,
wherein at least one powered drift tube of the drift tube assembly is coupled to receive an RF voltage signal; and
a DC electrode assembly, comprising:
a conductor line, arranged within a resonator coil that is coupled to receive a DC voltage signal into the at least one powered drift tube; and
a DC electrode arrangement, connected to the conductor line and disposed within the at least one powered drift tube.

2. The apparatus of claim 1 , wherein the conductor line is coupled to receive the DC voltage from a DC voltage source, wherein a DC electric field is generated within the at least one powered drift tube, between a DC electrode of the DC electrode arrangement, and a wall of the at least one powered drift tube.

3. The apparatus of claim 2 , the DC electrode assembly further comprising an RF filter, disposed between the DC voltage source and the DC electrode arrangement.

4. The apparatus of claim 1 , wherein the DC electrode arrangement comprises an Einzel lens configuration.

5. The apparatus of claim 1 , wherein the DC electrode arrangement comprises a quadrupole configuration.

6. The apparatus of claim 5 , wherein the quadrupole configuration comprises:
a pair of DC electrodes, disposed opposite to one another within the at least one powered drift tube, and being coupled to the conductor line; and
a pair of protrusions, electrically connected to the at least one powered drift tube.

7. The apparatus of claim 1 , wherein the resonator coil comprises a conductive wall arranged to deliver the RF voltage signal to the at least one powered drift tube, and wherein the conductive line is electrically isolated from the conductive wall.

8. A linear accelerator, comprising:
a plurality of acceleration stages, wherein at least one acceleration stage of the plurality of acceleration stages comprises:
a drift tube assembly, to conduct an ion beam along a beam propagation direction;
a resonator coil, the resonator coil comprising a conductive wall that is coupled to deliver an RF voltage to a powered drift tube of the drift tube assembly; and
a DC electrode assembly, comprising:
a conductor line, arranged within the resonator coil, and electrically isolated from the resonator coil; and
a DC electrode arrangement, connected to the conductor line and disposed within the powered drift tube, and electrically isolated from the powered drift tube.

9. The linear accelerator of claim 8 , wherein the conductor line is coupled to receive a DC voltage from a DC voltage source, wherein a DC electric field is generated within the powered drift tube, between a DC electrode of the DC electrode arrangement, and the conductive wall.

10. The linear accelerator of claim 9 , the DC electrode assembly further comprising an RF filter, disposed between the DC voltage source and the DC electrode arrangement.

11. The linear accelerator of claim 8 , wherein the DC electrode arrangement comprises an Einzel lens configuration.

12. The linear accelerator of claim 8 , wherein the DC electrode arrangement comprises a quadrupole configuration.

13. The linear accelerator of claim 12 , wherein the quadrupole configuration comprises:
a pair of DC electrodes, disposed opposite to one another within the powered drift tube, and being coupled to the conductor line; and
a pair of protrusions, electrically connected to the powered drift tube.

14. An ion implanter, comprising:
an ion source, to generate an ion beam; and
a linear accelerator, disposed to receive the ion beam, the linear accelerator comprising:
a plurality of acceleration stages, wherein at least one acceleration stage of the plurality of acceleration stages comprises:
a drift tube assembly, to conduct an ion beam along a beam propagation direction;
a resonator coil, the resonator coil comprising a conductive wall that is coupled to deliver an RF voltage to a powered drift tube of the drift tube assembly; and
a DC electrode assembly, comprising:
a conductor line, arranged within the resonator coil, and electrically isolated from the resonator coil; and
a DC electrode arrangement, connected to the conductor line and disposed within the powered drift tube, and electrically isolated from the powered drift tube.

15. The ion implanter of claim 14 , wherein the conductor line is coupled to receive a DC voltage from a DC voltage source, wherein a DC electric field is generated within the powered drift tube, between a DC electrode of the DC electrode arrangement, and the conductive wall.

16. The ion implanter of claim 15 , the DC electrode assembly further comprising an RF filter, disposed between the DC voltage source and the DC electrode arrangement.

17. The ion implanter of claim 14 , wherein the DC electrode arrangement comprises an Einzel lens configuration.

18. The ion implanter of claim 14 , wherein the DC electrode arrangement comprises a quadrupole configuration.

19. The ion implanter of claim 18 , wherein the quadrupole configuration comprises:
a pair of DC electrodes, disposed opposite to one another within the powered drift tube, and being coupled to the conductor line; and
a pair of protrusions, electrically connected to the powered drift tube.

Assignees

• Applied Materials Inc

Inventors

• Tam Wai-Ming
• Becker Klaus
• Park Jr William Herron
• Sinclair Frank

Classifications

• H05H2277/12

  Ion implantation · CPC title

• H05H2007/222

  drift tubes · CPC title

• H05H2007/025

  Radiofrequency systems · CPC title

• H05H2007/007

  for focusing the beam to irradiation target · CPC title

• H05H7/02

  Circuits or systems for supplying or feeding radio-frequency energy · CPC title