Fluorine-containing silica glass powder and method for producing fluorine-containing silica glass powder
US-2024025803-A1 · Jan 25, 2024 · US
US12091346B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12091346-B2 |
| Application number | US-202017294280-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 10, 2020 |
| Priority date | Jan 11, 2019 |
| Publication date | Sep 17, 2024 |
| Grant date | Sep 17, 2024 |
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An apparatus for manufacturing a silica glass crucible includes a rotating means for rotating a mold and a supply means for feeding a silica powder inside the mold, wherein the supply means has a feeding part for delivering the silica powder in a manner releasing it to fall to a position away from the inner wall surface of the mold inside the mold, and a dispersing part for changing, to one toward the inner wall surface side, at a fall position, the direction in which the silica powder fed from the feeding part moves, while also widening an angle at which the silica powder disperses toward the inner wall surface at the fall position. The apparatus is intended to allow a silica powder layer to be stably formed in the mold in a short period of time.
Opening claim text (preview).
What is claimed is: 1. An apparatus for manufacturing a silica glass crucible, by forming a silica powder layer on an inside of a rotating mold, the apparatus for manufacturing a silica glass crucible comprising: a rotating means for rotating the mold; and a supply means for feeding a silica powder to the inside of the mold; wherein the supply means has: a feeding part for feeding the silica powder in a manner releasing it to fall to a position away from an inner wall surface of the mold on the inside of the mold; and a dispersing part for changing, to one toward the inner wall surface side, at a fall position, a direction in which the silica powder fed from the feeding part moves, while also widening an angle at which the silica powder disperses toward the inner wall surface at the fall position, wherein the dispersing part includes a rotating disk having a top surface provided in a manner horizontally rotatable around a rotation axis which is positioned between an axis of the rotating mold and the inner wall surface and away from the axis of the rotating mold and the inner wall surface as viewed in a vertical direction, wherein the silica powder falls from the feeding part and drops at the fall position on the top surface while rotating so that the silica powder hit on the top surface moves outward along the top surface toward the inner wall due to centrifugal force exerted from the rotating disk, said fall position being set between the rotation axis of the rotating disk and an outer periphery of the top surface and away from the rotation axis of the rotating disk and the outer periphery of the top surface as viewed in the vertical direction. 2. The apparatus for manufacturing a silica glass crucible according to claim 1 , wherein the dispersing part has a drive mechanism for changing relative positions of the rotating disk and the inner wall surface. 3. The apparatus for manufacturing a silica glass crucible according to claim 2 , wherein a surface hardness of the rotating disk is 5 or higher based on Mohs hardness. 4. The apparatus for manufacturing a silica glass crucible according to claim 3 , wherein a diameter of the rotating disk is 9 percent or greater but no greater than 76 percent of an inner diameter of the mold. 5. The apparatus for manufacturing a silica glass crucible according to claim 3 , wherein a material constituting the top surface of the rotating disk has a metal impurity concentration of 20 ppm or lower per element. 6. The apparatus for manufacturing a silica glass crucible according to claim 2 , wherein a diameter of the rotating disk is 9 percent or greater but no greater than 76 percent of an inner diameter of the mold. 7. The apparatus for manufacturing a silica glass crucible according to claim 6 , wherein a material constituting the top surface of the rotating disk has a metal impurity concentration of 20 ppm or lower per element. 8. The apparatus for manufacturing a silica glass crucible according to claim 2 , wherein a material constituting the top surface of the rotating disk has a metal impurity concentration of 20 ppm or lower per element. 9. The apparatus for manufacturing a silica glass crucible according to claim 1 , wherein a surface hardness of the rotating disk is 5 or higher based on Mohs hardness. 10. The apparatus for manufacturing a silica glass crucible according to claim 9 , wherein a diameter of the rotating disk is 9 percent or greater but no greater than 76 percent of an inner diameter of the mold. 11. The apparatus for manufacturing a silica glass crucible according to claim 9 , wherein a material constituting the top surface of the rotating disk has a metal impurity concentration of 20 ppm or lower per element. 12. The apparatus for manufacturing a silica glass crucible according to claim 1 , wherein a diameter of the rotating disk is 9 percent or greater but no greater than 76 percent of an inner diameter of the mold. 13. The apparatus for manufacturing a silica glass crucible according to claim 12 , wherein a material constituting the top surface of the rotating disk has a metal impurity concentration of 20 ppm or lower per element. 14. The apparatus for manufacturing a silica glass crucible according to claim 1 , wherein a material constituting the top surface of the rotating disk has a metal impurity concentration of 20 ppm or lower per element.
Silicon · CPC title
Crucibles or containers for supporting the melt · CPC title
Impurity concentration specified · CPC title
Processes specially adapted for the production of quartz or fused silica articles {, not otherwise provided for (C03B19/01, C03B19/066, C03B19/106, C03B19/12, C03B19/14, C03B37/00 take precedence)} · CPC title
by centrifuging, e.g. arc discharge in rotating mould (crucibles for crystal pulling in general C30B15/10, C30B35/002) · CPC title
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