Layered bonding material, semiconductor package, and power module

US12080671B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12080671-B2
Application numberUS-202218288636-A
CountryUS
Kind codeB2
Filing dateApr 18, 2022
Priority dateApr 28, 2021
Publication dateSep 3, 2024
Grant dateSep 3, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A layered bonding material 10 includes a base material 11 , a first solder section 12 a stacked on a first surface of the base material 11 , and a second solder section 12 b stacked on a second surface of the base material 11 . A coefficient of linear expansion of the base material 11 is 5.5 to 15.5 ppm/K, the first solder section 12 a and the second solder section 12 b are made of lead-free solder, and both of a thickness of the first solder section 12 a and a thickness of the second solder section 12 b are 0.05 to 1.0 mm.

First claim

Opening claim text (preview).

The invention claimed is: 1. A layered bonding material comprising: a base material; a first solder section stacked on a first surface of the base material; and a second solder section stacked on a second surface of the base material, wherein a coefficient of linear expansion of the base material is 5.5 to 15.5 ppm/K, the first solder section and the second solder section are made of lead-free solder, and both of a thickness of the first solder section and a thickness of the second solder section are 0.05 to 1.0 mm. 2. The layered bonding material according to claim 1 , wherein the lead-free solder has a Young's modulus of 45 GPa or higher and tensile strength of 100 MPa or lower. 3. The layered bonding material according to claim 2 , wherein the Young's modulus of the lead-free solder is 55 GPa or higher. 4. The layered bonding material according to claim 1 , wherein the base material has a mesh shape with a lattice interval of 2.0 mm or larger. 5. The layered bonding material according to claim 1 , wherein the coefficient of linear expansion of the base material is 5.9 to 14.4 ppm/K. 6. The layered bonding material according to claim 5 , wherein the coefficient of linear expansion of the base material is 7.0 to 11.6 ppm/K. 7. The layered bonding material according to claim 3 , wherein the coefficient of linear expansion of the base material is 7.7 to 9.9 ppm/K. 8. The layered bonding material according to claim 1 , wherein the base material is made of any one of a Cu—W-based material, a Cu—Mo-based material, a layered material of the Cu—W-based material and the Cu—Mo-based material, a composite material obtained by stacking a Cu-based material on both of a first surface and a second surface of the Cu—W-based material, a composite material obtained by stacking the Cu-based material on both of a first surface and a second surface of the Cu—Mo-based material, and a composite material obtained by stacking the Cu-based material on both of a first surface and a second surface of the layered material of the Cu—W-based material and the Cu—Mo-based material. 9. The layered bonding material according to claim 1 , wherein a Cu content of the base material is 60% or lower. 10. The layered bonding material according to claim 1 , wherein a Cu content of the base material is 15% or higher. 11. The layered bonding material according to claim 1 , wherein an interface between at least one of the first solder section and the second solder section and the base material is undercoated with Ni and Sn in order from the base material side. 12. The layered bonding material according to claim 1 , wherein at least one of a ratio of thicknesses of the base material and the first solder section and a ratio of thicknesses of the base material and the second solder section is 2:1 to 10:1. 13. The layered bonding material according to claim 1 , wherein a melting point of the lead-free solder is 210° C. or higher. 14. The layered bonding material according to claim 1 , wherein a melting point of the lead-free solder is 230° C. or higher. 15. A semiconductor package comprising: a substrate; a semiconductor device disposed on the substrate; and a layered bonding material disposed between the substrate and the semiconductor device and bonding the substrate and the semiconductor device, wherein the layered bonding material includes: a base material; a first solder section stacked on a first surface of the base material; and a second solder section stacked on a second surface of the base material, a coefficient of linear expansion of the base material is 5.5 to 15.5 ppm/K, the first solder section and the second solder section are made of lead-free solder, and both of a thickness of the first solder section and a thickness of the second solder section are 0.05 to 1.0 mm. 16. A semiconductor package comprising: a substrate; a semiconductor device disposed on the substrate; a first layered bonding material disposed between the substrate and the semiconductor device and bonding the substrate and the semiconductor device; a heat radiating section disposed on an opposite side of the semiconductor device on the substrate; and a second layered bonding material disposed between the substrate and the heat radiating section and bonding the substrate and the heat radiating section, wherein at least one of the first layered bonding material and the second layered bonding material includes: a base material; a first solder section stacked on a first surface of the base material; and a second solder section stacked on a second surface of the base material, a coefficient of linear expansion of the base material is 5.5 to 15.5 ppm/K, the first solder section and the second solder section are made of lead-free solder, and both of a thickness of the first solder section and a thickness of the second solder section are 0.05 to 1.0 mm. 17. A power module comprising: a substrate; a power semiconductor device disposed on the substrate; and a layered bonding material disposed between the substrate and the power semiconductor device and bonding the substrate and the power semiconductor device, wherein the layered bonding material includes: a base material; a first solder section stacked on a first surface of the base material; and a second solder section stacked on a second surface of the base material, a coefficient of linear expansion of the base material is 5.5 to 15.5 ppm/K, the first solder section and the second solder section are made of lead-free solder, and both of a thickness of the first solder section and a thickness of the second solder section are 0.05 to 1.0 mm. 18. A power module comprising: a substrate; a power semiconductor device disposed on the substrate; a first layered bonding material disposed between the substrate and the power semiconductor device and bonding the substrate and the power semiconductor device; a heat radiating section disposed on an opposite side of the power semiconductor device on the substrate; and a second layered bonding material disposed between the substrate and the heat radiating section and bonding the substrate and the heat radiating section, wherein at least one of the first layered bonding material and the second layered bonding material includes: a base material; a first solder section stacked on a first surface of the base material; and a second solder section stacked on a second surface of the base material, a coefficient of linear expansion of the base material is 5.5 to 15.5 ppm/K, the first solder section and the second solder section are made of lead-free solder, and both of a thickness of the first solder section and a thickness of the second solder section are 0.05 to 1.0 mm.

Assignees

Inventors

Classifications

  • Arrangements for heating · CPC title

  • B32B15/01Primary

    all layers being exclusively metallic {(making layered metal workpieces by pressure cladding B23K20/22; making coatings with a metallic material characterised by its composition C23C30/00)} · CPC title

  • H10W72/30Primary

    Die-attach connectors · CPC title

  • between a chip and a stacked insulating package substrate, interposer or RDL · CPC title

  • comprising metals or metalloids, e.g. solders · CPC title

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What does patent US12080671B2 cover?
A layered bonding material 10 includes a base material 11 , a first solder section 12 a stacked on a first surface of the base material 11 , and a second solder section 12 b stacked on a second surface of the base material 11 . A coefficient of linear expansion of the base material 11 is 5.5 to 15.5 ppm/K, the first solder section 12 a and the second solder section 12 b a…
Who is the assignee on this patent?
Senju Metal Industry Co
What technology area does this patent fall under?
Primary CPC classification B32B15/01. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Sep 03 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).