Microscale plasma limiter integrated into thick film interconnect

US12068516B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12068516-B2
Application numberUS-202217704173-A
CountryUS
Kind codeB2
Filing dateMar 25, 2022
Priority dateMar 25, 2022
Publication dateAug 20, 2024
Grant dateAug 20, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A radio frequency (RF) transmission line is described. The RF transmission line includes a first ground line, a second ground line, and a signal line disposed on a substrate and forming a coplanar waveguide. A plasma limiter feature is integrated into an internal surface of one or more of the first ground line, the second ground line, and the signal line. The plasma limiter decreases a gap distance between the signal line and the associated ground line. The gap distance is selected, together with a gas pressure, to control a voltage at which the gas within the gap breaks down, targeted at a breakdown power of 1 W across a wide bandwidth. The plasma limiter thus limits a power transmitted by way of the RF transmission line for protecting a sensitive integrated circuit.

First claim

Opening claim text (preview).

What is claimed: 1. A radio frequency transmission line comprising: a substrate including a surface; a first ground line disposed on the surface; a second ground line disposed on the surface; a signal line disposed on the surface between the first ground line and the second ground line and forming a coplanar waveguide with the first ground line and the second ground line; wherein the signal line, the first ground line, and the second ground line are substantially parallel in a first section of the radio frequency transmission line; the signal line and the first ground line defining a first gap in the first section; the signal line and the second ground line defining a second gap in the first section; wherein the first gap and the second gap are hermetically sealed and include a gas; and a plasma limiter disposed between the signal line and the first ground line in the first gap, the plasma limiter integrated into one or more of the signal line or the first ground line, the plasma limiter defining a spark-gap between the signal line and the first ground line; the radio frequency transmission line including a breakdown power threshold at which the gas disposed in the spark-gap is configured to form a plasma; wherein the plasma changes a characteristic impedance of the radio frequency transmission line; wherein the plasma limiter comprises a spiral-shaped resonator. 2. The radio frequency transmission line of claim 1 , wherein the plasma limiter includes a point with a diameter between 4 micrometers and 14 micrometers. 3. The radio frequency transmission line of claim 2 , wherein the radio frequency transmission line is configured to form the plasma across a frequency range between 2 and 18 gigahertz; wherein the breakdown power is between 1 watt and 10 watts across the frequency range. 4. The radio frequency transmission line of claim 3 , wherein the transmission line includes a width of between 50 micrometers and 500 micrometers. 5. The radio frequency transmission line of claim 4 , wherein each of the signal line, the first ground line, and the second ground line comprise a gold metal including a thickness of between 22.5 micrometers and 300 micrometers from the surface of the substrate. 6. The radio frequency transmission line of claim 5 , wherein a distance of the first gap and a distance of the second gap is between 50 micrometers and 500 micrometers. 7. The radio frequency transmission line of claim 6 , wherein the gas is a noble gas; wherein the noble gas is Argon; wherein the Argon is at a pressure between 1 Torr and 500 Torr. 8. The radio frequency transmission line of claim 1 , wherein the plasma limiter is a first plasma limiter integrated into the signal line, further comprising a second plasma limiter integrated into the first ground line; wherein the first plasma limiter and the second plasma limiter are aligned. 9. The radio frequency transmission line of claim 8 , wherein each of the first plasma limiter and the second plasma limiter comprise a first concave surface and a second concave surface. 10. The radio frequency transmission line of claim 8 , wherein each of the first plasma limiter and the second plasma limiter comprise an aspect ratio greater than one. 11. The radio frequency transmission line of claim 1 , wherein the resonator is configured to generate plasma at a select frequency range at the breakdown power. 12. The radio frequency transmission line of claim 1 , wherein a thickness of the plasma limiter is substantially equal to one or more of a thickness of the signal line or a thickness of the first ground line. 13. The radio frequency transmission line of claim 1 , wherein the radio frequency transmission line includes a second section; wherein the first ground line and the second ground line converge towards the signal line along the second section; wherein a width of the signal line decreases as the first ground line and the second ground line converge towards the signal line along the second section; wherein a distance of the first gap and a distance of the second gap each decrease along the second section. 14. A microscale package comprising: an integrated circuit; and a radio frequency transmission line including: a substrate including a surface; a first ground line disposed on the surface; a second ground line disposed on the surface; a signal line disposed on the surface between the first ground line and the second ground line and forming a coplanar waveguide with the first ground line and the second ground line; wherein the signal line, the first ground line, and the second ground line are substantially parallel in a first section of the radio frequency transmission line; the signal line and the first ground line defining a first gap in the first section; the signal line and the second ground line defining a second gap in the first section; wherein the first gap and the second gap are hermetically sealed by a hermetic seal and include a gas; and a plasma limiter disposed between the signal line and the first ground line in the first gap, the plasma limiter integrated into one or more of the signal line or the first ground line, the plasma limiter defining a spark-gap between the signal line and the first ground line; the radio frequency transmission line including a breakdown power threshold at which the gas disposed in the spark-gap is configured to form a plasma; wherein the plasma changes a characteristic impedance of the radio frequency transmission line; wherein each of the signal line, the first ground line, and the second ground line is coupled to the integrated circuit; wherein the change in the characteristic impedance of the radio frequency transmission line limits a power to the integrated circuit; wherein each of the signal line, the first ground line, and the second ground line is further configured to couple to a carrier substrate; wherein the plasma limiter comprises a spiral-shaped resonator. 15. The microscale package of claim 14 , wherein the integrated circuit is disposed inside of the hermetic seal. 16. The microscale package of claim 14 , wherein the integrated circuit is disposed adjacent to the hermetic seal, wherein the hermetic seal includes a dielectric material. 17. The microscale package of claim 14 , wherein each of the signal line, the first ground line, and the second ground line is configured to couple to the carrier substrate by a hermetic via. 18. The microscale package of claim 14 , wherein the radio frequency transmission line is configured to form the plasma across a frequency range between 2 to 18 gigahertz; wherein the breakdown power is between 1 watt and 10 watts across the frequency range. 19. The microscale package of claim 14 , wherein each of the signal line, the first ground line, and the second ground line is coupled to the integrated circuit by a flip chip coupling.

Assignees

Inventors

Classifications

  • using discharge tubes (H03G11/008 takes precedence) · CPC title

  • H01P1/14Primary

    by electric discharge devices (discharge devices H01J17/64) · CPC title

  • Special shape resonators · CPC title

  • Coplanar lines · CPC title

  • H01P1/227Primary

    Strip line attenuators (H01P1/23 takes precedence) · CPC title

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What does patent US12068516B2 cover?
A radio frequency (RF) transmission line is described. The RF transmission line includes a first ground line, a second ground line, and a signal line disposed on a substrate and forming a coplanar waveguide. A plasma limiter feature is integrated into an internal surface of one or more of the first ground line, the second ground line, and the signal line. The plasma limiter decreases a gap dist…
Who is the assignee on this patent?
Rockwell Collins Inc
What technology area does this patent fall under?
Primary CPC classification H01P1/14. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Aug 20 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 5 related publications on this page (citations in our corpus or others sharing the same primary CPC).