Gas jet deflection in pressurized systems

Patent metadata

Field	Value
Publication number	US-12049883-B2
Application number	US-202318466294-A
Country	US
Kind code	B2
Filing date	Sep 13, 2023
Priority date	Jul 19, 2019
Publication date	Jul 30, 2024
Grant date	Jul 30, 2024

Abstract

Provided herein are articles of manufacture, systems, and methods employing a gas-deflector plate in low to ultra-high vacuum systems that use differential pumping (e.g., gas-target particle accelerators, mass spectrometers, and windowless delivery ports). In certain embodiments, the gas-deflector plate is configured to be positioned between higher and lower pressure regions in a pressurized system, wherein the gas-deflector plate has a channel therethrough shaped and/or angled such that jetting gas moving through the channel enters the lower pressure region at an angle offset from the vertical axis of the gas-deflector plate and/or the channel. In other embodiments, a jet-deflector component is employed such that the jetting gas strikes such jet-deflector component and is re-directed in another direction.

First claim

We claim:

1. A system comprising:
a pressurized subsystem including a higher pressure region and a lower pressure region;
a gas-deflector plate with a first surface facing the higher pressure region, a second surface facing the lower pressure region, and a channel extending through the gas-deflector plate, wherein the channel includes with a first opening in the first surface and an asymmetric opening in the second surface; and
a jet-deflector component coupled to the gas-deflector plate.

2. The system of claim 1 , wherein the gas-deflector plate has a longitudinal axis and a lateral axis that extends through the gas-deflector plate and are parallel to the first surface and the second surface; and wherein the gas-deflector plate has a vertical axis that is perpendicular to the longitudinal axis and the lateral axis; and wherein gas moving through the channel from the higher pressure region to the lower pressure region enters the lower pressure region at an angle offset from the vertical axis.

3. The system of claim 2 , wherein the angle offset is at least 15 degrees.

4. The system of claim 2 , wherein the asymmetric opening is formed from a first portion and a second portion of the channel, wherein the first portion is across the asymmetric opening from the second portion, and wherein the second portion has a greater angular offset from the vertical axis than the first portion.

5. The system of claim 1 , wherein the pressurized subsystem comprises a differential pumping system.

6. The system of claim 1 , further including an ion source, an ion accelerator, a differential pumping system, and a target chamber.

7. The system of claim 6 , wherein said gas-deflector plate is positioned between the target chamber and the differential pumping system.

8. The system of claim 7 , wherein the target chamber comprises the higher pressure region and said differential pumping system comprises the lower pressure region.

9. The system of claim 1 , further including a mass spectrometer.

10. The system of claim 9 , wherein said mass spectrometer includes a sample chamber, a differential pressure stage, and an ionization chamber.

11. The system of claim 10 , wherein the gas-deflector plate is positioned between the sample chamber and the differential pumping stage.

12. The system of claim 11 , wherein the sample chamber comprises the higher pressure region and the differential pressure stage comprises the lower pressure region.

13. The system of claim 1 , wherein the first opening has a diameter of about 6-18 mm.

14. The system of claim 1 , wherein the gas-deflector plate has a thickness between first surface and the second surface of about 13-40 mm.

15. The system of claim 1 , wherein the gas-deflector plate has a circular or generally circular shape.

16. The system of claim 1 , wherein most or all of the gas-deflector plate is composed of a metal.

17. The system of claim 16 , wherein the metal is selected from the group consisting of: copper, tungsten, and stainless steel.

18. The system of claim 1 , wherein the gas-deflector plate comprises one or more openings that allow attachment to the higher pressure region and/or the lower pressure region.

19. The system of claim 1 , wherein the jet-deflector component is positioned in the lower pressure region.

20. The system of claim 19 , wherein the jet-deflector component includes a surface; and wherein the gas entering the lower pressure region strikes the surface of the jet-deflector component and is re-directed in a different direction.

Assignees

• Shine Technologies Llc

Inventors

• Kobernik Arne V
• Jackson Brandon A
• Bonde Thomas C
• Gribb Tye
• Radel Ross F

Classifications

• H01J2237/3104

  Welding · CPC title

• H01J2237/188

  Differential pressure · CPC title

• H05H7/10

  Arrangements for ejecting particles from orbits · CPC title

• H05H7/14

  Vacuum chambers (H05H5/03 takes precedence) · CPC title

• H05H13/00 Primary

  Magnetic resonance accelerators; Cyclotrons {(strophotrons, turbine tubes H01J25/62)} · CPC title