Method for producing substrate with patterned film and fluorine-containing copolymer

Patent metadata

Field	Value
Publication number	US-12038692-B2
Application number	US-201917057528-A
Country	US
Kind code	B2
Filing date	May 23, 2019
Priority date	May 23, 2018
Publication date	Jul 16, 2024
Grant date	Jul 16, 2024

Abstract

The production method of a substrate with a patterned film according to the present disclosure includes: a cleaning step of performing UV/ozone cleaning or oxygen plasma cleaning on a substrate with a patterned film to obtain a first substrate with a patterned film, the substrate with a patterned film including a substrate and a patterned film on the substrate, the patterned film containing a fluorine-containing copolymer having a specific repeating unit; and a heating step of heating the first substrate with a patterned film to obtain a second substrate with a patterned film.

First claim

The invention claimed is:

1. A method for producing a substrate with a patterned film, the method comprising:
a cleaning step of performing UV/ozone cleaning or oxygen plasma cleaning on a substrate with a patterned film to obtain a first substrate with a patterned film, the substrate with a patterned film comprising a substrate and a patterned film on the substrate, the patterned film containing a fluorine-containing copolymer, the fluorine-containing copolymer containing all of a repeating unit represented by the following formula (A), a repeating unit represented by the following formula (B), and a repeating unit represented by the following formula (C); and
a heating step of heating the first substrate with a patterned film to obtain a second substrate with a patterned film, the formulas (A), (B), and (C) being:

wherein R 1 , R 2 , and R 3 are each independently a hydrogen atom, a fluorine atom, or a C1-C20 alkyl group in which hydrogen atoms bonded to a carbon atom are optionally partly or entirely replaced by fluorine atoms; Q is a C1-C20 fluoroalkyl group optionally containing a hydrogen atom, an oxygen atom, or a nitrogen atom; X and Y are each independently a single bond or a divalent group; Z is a bis(trifluoromethyl)vinyl group; O is an oxygen atom; and His a hydrogen atom.

2. The production method according to claim 1 ,
wherein the first substrate with a patterned film is heated at 50° C. or higher but 350° C. or lower for 10 seconds or longer in the heating step.

3. The production method according to claim 1 ,
wherein the second substrate with a patterned film is a substrate for forming a display element by an ink-jet method.

4. The production method according to claim 1 ,
wherein Q is a C3-C10 fluoroalkyl group and X is a carbonyl group in the repeating unit represented by the formula (A).

5. The production method according to claim 4 ,
wherein Q is a perfluorohexyl ethyl group and X is a carbonyl group in the repeating unit represented by the formula (A).

6. The production method according to claim 4 ,
wherein Q is a hexafluoroisopropyl group and X is a carbonyl group in the repeating unit represented by the formula (A).

7. The production method according to claim 1 ,
wherein the repeating unit represented by the formula (A) is a repeating unit represented by the following formula (A-1):

wherein R 4 and R 5 are each independently a hydrogen atom, a fluorine atom, or a C1-C3 alkyl group in which hydrogen atoms bonded to a carbon atom are optionally partly or entirely replaced by fluorine atoms; O is an oxygen atom; His a hydrogen atom; and F is a fluorine atom.

8. The production method according to claim 1 ,
wherein Q is a hexafluoroisopropyl group and X is a carbonyl group in the repeating unit represented by the formula (A), and Y is a p-phenylene group or a carboxyethylene group in the repeating unit represented by the formula (B).

9. A method for producing a substrate with a patterned film, the method comprising:
a cleaning step of performing UV/ozone cleaning or oxygen plasma cleaning on a substrate with a patterned film to obtain a first substrate with a patterned film, the substrate with a patterned film comprising a substrate and a patterned film on the substrate, the patterned film containing a fluorine-containing copolymer, the fluorine-containing copolymer containing all of a repeating unit represented by the following formula (A), a repeating unit represented by the following formula (B), and a repeating unit represented by the following formula (C); and
a heating step of heating the first substrate with a patterned film to obtain a second substrate with a patterned film, the formulas (A), (B), and (C) being:

wherein R1, R2 and R3 are each independently a hydrogen atom, a fluorine atom, or a C1-C20 alkyl group in which hydrogen atoms bonded to a carbon atom are optionally partly or entirely replaced by fluorine atoms; Q is a C3-C10 fluoroalkyl group and X is a carbonyl group; Y is a p-phenylene group, a p-phenylene carbonyl group, or a p-phenylene hexafluoroisopropylene group; Z is a bis(trifluoromethyl)vinyl group; O is an oxygen atom; and His a hydrogen atom.

10. The production method according to claim 9 ,
wherein the first substrate with a patterned film is heated at 50° C. or higher but 350° C. or lower for 10 seconds or longer in the heating step.

11. The production method according to claim 9 ,
wherein the second substrate with a patterned film is a substrate for forming a display element by an ink-jet method.

12. The production method according to claim 9 ,
wherein Q is a perfluorohexyl ethyl group and X is a carbonyl group in the repeating unit represented by the formula (A).

13. The production method according to claim 9 ,
wherein Q is a hexafluoroisopropyl group and X is a carbonyl group in the repeating unit represented by the formula (A).

14. A fluorine-containing copolymer comprising all of a repeating unit represented by the following formula (A), a repeating unit represented by the following formula (B), and a repeating unit represented by the following formula (C):

wherein R 1 , R 2 , and R 3 are each independently a hydrogen atom, a fluorine atom, or a C1-C20 alkyl group in which hydrogen atoms bonded to a carbon atom are optionally partly or entirely replaced by fluorine atoms; Q is a C1-C20 fluoroalkyl group optionally containing a hydrogen atom, an oxygen atom, or a nitrogen atom; X and Y are each independently a single bond or a divalent group; Z is a bis(trifluoromethyl)vinyl group; O is an oxygen atom; and H is a hydrogen atom.

15. The fluorine-containing copolymer according to claim 14 ,
wherein Q is a C3-C10 fluoroalkyl group and X is a carbonyl group in the repeating unit represented by the formula (A), and Z is a bis(trifluoromethyl)vinyl group in the repeating unit represented by the formula (C).

16. The fluorine-containing copolymer according to claim 14 , wherein Q is a C3-C10 fluoroalkyl group and X is a carbonyl group in the repeating unit represented by the formula (A), Y is a p-phenylene group, a p-phenylene carbonyl group, or a p-phenylene hexafluoroisopropylene group in the repeating unit represented by the formula (B), and R 3 is a hydrogen atom or a methyl group and Z is a bis(trifluoromethyl)vinyl group in the repeating unit represented by the formula (C).

17. A fluorine-containing copolymer comprising all of a repeating unit represented by the following formula (A), a repeating unit represented by the following formula (B), and a repeating unit represented by the following formula (C):

wherein R1, R2 and R3 are each independently a hydrogen atom, a fluorine atom, or a C1-C20 alkyl group in which hydrogen atoms bonded to a carbon atom are optionally partly or entirely replaced by fluorine atoms; Q is a C3-C10 fluoroalkyl group and X is a carbonyl group; Y is a p-phenylene group, a p-phenylene carbonyl group, or a p-phenylene hexafluoroisopropylene group; Z is a bis(trifluoromethyl)vinyl group; O is an oxygen atom; and H is a hydrogen atom.

Assignees

• Central Glass Co Ltd

Inventors

• Kaneko Yuzuru
• Aoki Takashi
• Nomura Yusuke
• Sasaki Keiko
• Sano Asuka

Classifications

• H10P70/12

  by dry cleaning only (H10P70/52 takes precedence) · CPC title

• H10P50/242

  of Group IV materials · CPC title

• H10P95/08

  Planarisation of organic insulating materials · CPC title

• G03F7/38 Primary

  Treatment before imagewise removal, e.g. prebaking {(G03F7/265 takes precedence)} · CPC title

• H05B33/22

  characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers · CPC title