Method of forming a diamond film

US12037679B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12037679-B2
Application numberUS-202117633010-A
CountryUS
Kind codeB2
Filing dateDec 15, 2021
Priority dateDec 18, 2020
Publication dateJul 16, 2024
Grant dateJul 16, 2024

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

Apparatuses and methods for forming a film on a substrate are described. The film is formed on the substrate by depositing an adamantane monomer and an initiator on the substrate to form a polymerizable seed layer and curing the polymerizable seed layer to form a polyadamantane layer.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of forming a film, the method comprising: depositing an adamantane monomer and an initiator on a substrate to form a polymerizable seed layer; curing the polymerizable seed layer to form a polyadamantane layer; removing an uncured portion of the polymerizable seed layer by heating the substrate at a temperature in a range of from 25° C. to 400° C. or chemically washing the substrate; and depositing a nano-crystalline diamond layer on the polyadamantane layer. 2. The method of claim 1 , wherein depositing the polymerizable seed layer comprises one or more of thermal evaporation, spin-coating, or drop-casting. 3. The method of claim 2 , wherein depositing the polymerizable seed layer comprises spin coating the initiator and the adamantane monomer onto the substrate and heating the polymerizable seed layer at a temperature in a range of from 25° C. to 400° C. prior to curing. 4. The method of claim 2 , wherein depositing the polymerizable seed layer comprises exposing a mixture of the adamantane monomer and the initiator to ultraviolet light to provide the polyadamantane seed layer. 5. The method of claim 1 , wherein the initiator comprises one or more of a benzophenone, a thioxanthone, a benzoin ether, a benzyl ketal, a dialkoxyacetophenone, a hydroxyalkylphenone, an aminoalkylphenone, and an acylphosphine oxide, and derivatives thereof. 6. The method of claim 1 , wherein the adamantane monomer has a structure selected from the group consisting of formula (I), (II), (III), and (IV), wherein R 1 , R 2 , R 3 and R 4 independently comprise one or more of hydrogen, a vinyl group, an acrylate group, a styrene group, an alkynyl group, a halide group, an epoxide group, an amine group, a carboxylic acid group, an ester group, and an alkyl group. 7. The method of claim 1 , wherein curing the polymerizable seed layer comprises exposing the polymerizable seed layer to a light source having a wavelength in a range of from 100 nm to 700 nm. 8. The method of claim 7 , wherein the polymerizable seed layer is exposed to the light source for a time period in a range of from 1 min to 2 hours. 9. The method of claim 1 , wherein the polyadamantane layer comprises one or more polymerized molecules. 10. The method of claim 9 , wherein the one or more polymerized molecules has a molecular weight in range of from 500 g/mol to 60,000 g/mol. 11. The method of claim 9 , wherein the one or more polymerized molecules comprises from 5 to 500 repeating adamantane monomers. 12. The method of claim 9 , wherein the one or more polymerized molecules are formed by copolymerizing a mixture comprising the adamantane monomer and one or more polymerizable units selected from the group consisting of a random co-polymer, a block co-polymer, a grafted co-polymer, and a branched co-polymer. 13. The method of claim 1 , further comprising, prior to curing, forming a mask layer on the polymerizable seed layer. 14. The method of claim 1 , wherein depositing the nano-crystalline diamond layer comprises one or more of atomic layer deposition (ALD), physical vapor deposition (PVD), chemical vapor deposition (CVD), microwave chemical vapor deposition (MWCVD), microwave plasma chemical vapor deposition (MWPCVD), plasma enhanced atomic layer deposition (PEALD), and plasma enhanced chemical vapor deposition (PECVD). 15. A method of forming a diamond film, the method comprising: thermally evaporating an adamantane monomer and an initiator onto a substrate to form a polymerizable seed layer, the initiator comprising one or more of a benzophenone, a thioxanthone, a benzoin ether, a benzyl ketal, a dialkoxyacetophenone, a hydroxyalkylphenone, an aminoalkylphenone, an acylphosphine oxide, and derivatives thereof, and the adamantane monomer having a structure selected from the group consisting of formula (I), (II), (III), and (IV), wherein R 1 , R 2 , R 3 and R 4 independently comprise one or more of hydrogen, a vinyl group, an acrylate group, a styrene group, an alkynyl group, a halide group, an epoxide group, an amine group, a carboxylic acid group, an ester group, and an alkyl group; exposing the polymerizable seed layer to a light source having a wavelength in a range of from 100 nm to 700 nm for a time period in a range of from 1 min to 2 hours to cure the polymerizable seed layer and form a polyadamantane layer on the substrate; removing an uncured portion of the polymerizable seed layer; and depositing a nano-crystalline diamond layer on the polyadamantane layer. 16. The method of claim 15 , wherein the adamantane monomer is selected from the group consisting of: 17. A method of forming a diamond film, the method comprising: dissolving an adamantane monomer in a first solvent to form a solution, the adamantane monomer having a structure selected from the group consisting of formula (I), (II), (III), and (IV) wherein R 1 , R 2 , R 3 and R 4 independently comprise one or more of hydrogen, a vinyl group, an acrylate group, a styrene group, an alkynyl group, a halide group, an epoxide group, an amine group, a carboxylic acid group, an ester group, and an alkyl group; adding an initiator to the solution to form a mixture, the initiator comprising one or more of a benzophenone, a thioxanthone, a benzoin ether, a benzyl ketal, a dialkoxyacetophenone, a hydroxyalkylphenone, an aminoalkylphenone, an acylphosphine oxide, and derivatives thereof; exposing the mixture to ultraviolet light to provide the polyadamantane polymer; dissolving the polyadamantane polymer in a second solvent to form a polymer solution; spin coating the polymer solution onto the substrate to coat the substrate with the polyadamantane polymer; and exposing the substrate coated with the polyadamantane polymer to a plasma to form a nano-crystalline diamond layer on the substrate.

Assignees

Inventors

Classifications

  • using microwave discharges · CPC title

  • using masks · CPC title

  • Deposition of sub-layers, e.g. to promote the adhesion of the main coating · CPC title

  • by ultraviolet or visible light · CPC title

  • Preparation (by using ultra-high pressure B01J3/06; by crystal growth C30B29/04) · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US12037679B2 cover?
Apparatuses and methods for forming a film on a substrate are described. The film is formed on the substrate by depositing an adamantane monomer and an initiator on the substrate to form a polymerizable seed layer and curing the polymerizable seed layer to form a polyadamantane layer.
Who is the assignee on this patent?
Applied Materials Inc, Nat Univ Singapore
What technology area does this patent fall under?
Primary CPC classification C23C16/274. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jul 16 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).