Slurry for suspension plasma spraying, method for forming rare earth acid fluoride sprayed film, and spraying member

US12024439B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-12024439-B2
Application numberUS-201716316158-A
CountryUS
Kind codeB2
Filing dateJul 10, 2017
Priority dateJul 14, 2016
Publication dateJul 2, 2024
Grant dateJul 2, 2024

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

Provided is a slurry for suspension plasma spraying, which is a spray material used for suspension plasma spraying in an atmosphere including an oxygen-containing gas, contains 5-40 mass % of rare earth fluoride particles having a maximum particle diameter (D100) of 12 μm or less, and contains one or more types of solvent selected from among water and organic solvents. A rare earth acid fluoride-containing sprayed film, in which process shift and particle generation hardly occur, can be stably formed on a base material by carrying out suspension plasma spraying in an atmosphere including an oxygen-containing gas. A spraying member provided with this sprayed film exhibits excellent corrosion resistance to halogen-based gas plasma.

First claim

Opening claim text (preview).

The invention claimed is: 1. A suspension plasma spraying slurry for use as a spray material for suspension plasma spraying in an atmosphere containing an oxygen-containing gas, the slurry comprising: 5 to 40% by weight of rare earth fluoride particles having a maximum particle size (D100) of up to 12 μm, 0.1 to 5% by weight of at least one microparticulate additive selected from the group consisting of rare earth oxides, rare earth hydroxides, and rare earth carbonates, and at least one solvent selected from water and organic solvents, wherein a ratio in terms of weight of the content of the at least one microparticulate additive to the content of the rare earth fluoride particles is 5:5 to 0.1:40. 2. The slurry of claim 1 , further comprising up to 3% by weight of an anti-agglomerating agent of an organic compound. 3. The slurry of claim 2 , further comprising at least 0.03% by weight of an anti-agglomerating agent of an organic compound. 4. The slurry of claim 1 wherein the rare earth element is at least one element selected from the group consisting of yttrium (Y), gadolinium (Gd), holmium (Ho), erbium (Er), ytterbium (Yb), and lutetium (Lu). 5. The slurry of claim 1 wherein the suspension plasma spraying is atmospheric suspension plasma spraying. 6. A method for forming a sprayed coating of rare earth oxyfluoride, comprising the step of suspension plasma spraying the slurry of claim 1 as a spray material to a substrate in an atmosphere containing an oxygen-containing gas. 7. The method of claim 6 wherein the suspension plasma spraying is atmospheric suspension plasma spraying. 8. The method of claim 6 wherein the sprayed coating contains a rare earth oxyfluoride as main phase. 9. The method of claim 6 wherein the rare earth oxyfluoride is at least one rare earth oxyfluoride selected from the group consisting of ReOF, Re 5 O 4 F 7 , Re 6 O 5 F 8 , and Re 7 O 6 F 9 wherein Re is a rare earth element. 10. The method of claim 6 wherein the sprayed coating is a mixture of a rare earth oxyfluoride, a rare earth oxide, and a rare earth fluoride.

Assignees

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Classifications

  • Oxides, borides, carbides, nitrides or silicides; Mixtures thereof · CPC title

  • Micrometer sized, i.e. from 1-100 micrometer · CPC title

  • Fluorides · CPC title

  • Plasma spraying · CPC title

  • Yttrium oxides or hydroxides · CPC title

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What does patent US12024439B2 cover?
Provided is a slurry for suspension plasma spraying, which is a spray material used for suspension plasma spraying in an atmosphere including an oxygen-containing gas, contains 5-40 mass % of rare earth fluoride particles having a maximum particle diameter (D100) of 12 μm or less, and contains one or more types of solvent selected from among water and organic solvents. A rare earth acid fluorid…
Who is the assignee on this patent?
Shinetsu Chemical Co
What technology area does this patent fall under?
Primary CPC classification C01F17/259. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jul 02 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 6 related publications on this page (citations in our corpus or others sharing the same primary CPC).