Film forming material for lithography, composition for film formation for lithography, underlayer film for lithography, and method for forming pattern
US-2021278767-A1 · Sep 9, 2021 · US
US12012485B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12012485-B2 |
| Application number | US-202217687420-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 4, 2022 |
| Priority date | Mar 23, 2021 |
| Publication date | Jun 18, 2024 |
| Grant date | Jun 18, 2024 |
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Provided is a resin composition that has a low viscosity before curing, and is capable of being turned into a cured product having superior dielectric properties (low relative permittivity and low dielectric tangent), a low elastic modulus and also an excellent heat resistance. The resin composition is a heat-curable citraconimide resin composition containing: (A) a citraconimide compound having a saturated or unsaturated divalent hydrocarbon group(s) having 6 to 100 carbon atoms; (B) an epoxy resin having at least two epoxy groups in one molecule; and (C) a reaction promoter, wherein a mass ratio between the components (A) and (B) is (A):(B)=99:1 to 1:99.
Opening claim text (preview).
What is claimed is: 1. A heat-curable citraconimide resin composition comprising: (A) a citraconimide compound represented by the following formulae (5), (6) or (7), wherein p is 1 to 10 and C 36 H 72 represents a dimer acid frame, wherein q is 1 to 10 and C 36 H 72 represents a dimer acid frame; (B) an epoxy resin having at least two epoxy groups in one molecule; and (C) a reaction promoter, wherein a mass ratio between the components (A) and (B) is (A):(B)=99:1 to 1:99. 2. The heat-curable citraconimide resin composition according to claim 1 , wherein the reaction promoter as the component (C) is an anionic polymerization initiator containing at least one of a nitrogen and phosphorus atom(s). 3. An uncured resin film comprised of the heat-curable citraconimide resin composition according to claim 1 . 4. A cured resin film comprised of a cured product of the heat-curable citraconimide resin composition according to claim 1 . 5. A prepreg comprising the heat-curable citraconimide resin composition according to claim 1 ; and a fiber base material. 6. A substrate comprising the heat-curable citraconimide resin composition according to claim 1 . 7. An adhesive comprised of the heat-curable citraconimide resin composition according to claim 1 . 8. A semiconductor encapsulant comprised of the heat-curable citraconimide resin composition according to claim 1 . 9. The heat-curable citraconimide resin composition according to claim 1 , wherein a mass ratio between the components (A) and (B) is (A):(B)=98:2 to 5:95. 10. The heat-curable citraconimide resin composition according to claim 1 , wherein a mass ratio between the components (A) and (B) is (A):(B)=98:2 to 30:70. 11. The heat-curable citraconimide resin composition according to claim 1 , wherein said citraconimide compound is represented by the formula: 12. The heat-curable citraconimide resin composition according to claim 1 , wherein said citraconimide compound is represented by the formula: wherein p≈3 and C 36 H 72 represents a dimer acid frame. 13. The heat-curable citraconimide resin composition according to claim 1 , wherein said citraconimide compound is represented by the formula: wherein q≈3 and C 36 H 72 represents a dimer acid frame. 14. The heat-curable citraconimide resin composition according to claim 1 , wherein the epoxy resin of component (B) is solid at 25° C. and has a melting point of 40 to 150° C. or a softening point of 50 to 160° C.
comprising organic materials, e.g. plastics or resins · CPC title
Manufacture of films or sheets · CPC title
Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors · CPC title
Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors · CPC title
Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs · CPC title
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